1-20 of 320
Organic compounds
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen

Ahmad Reza Rastkar, Mehdi Sadri Kandjani
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034006 (2024)
https://doi.org/10.1116/6.0003483
Published: May 2024
View article titled, Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen
Open the PDF for Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen in another window
Journal Articles

Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride

Editor’s Pick
Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Yuko Hanaoka, Masaru Izawa, Kenji Ishikawa, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022201 (2022)
https://doi.org/10.1116/6.0001660
Published: February 2022
View article titled, Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride
Open the PDF for Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride in another window
Journal Articles

Selective volatile organic compound gas sensor based on carbon nanotubes functionalized with ZnO nanoparticles

Jiaxi Xiang, Anuj Singhal, Ralu Divan, Liliana Stan, Yuzi Liu, Igor Paprotny
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 042803 (2021)
https://doi.org/10.1116/6.0000992
Published: July 2021
View article titled, Selective volatile organic compound gas sensor based on carbon nanotubes functionalized with ZnO nanoparticles
Open the PDF for Selective volatile organic compound gas sensor based on carbon nanotubes functionalized with ZnO nanoparticles in another window
Includes: Supplementary data
Journal Articles

Mechanically reliable hybrid organosilicate glasses for advanced interconnects

Karsu Ipek Kilic, Reinhold H. Dauskardt
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 060601 (2020)
https://doi.org/10.1116/6.0000517
Published: October 2020
View article titled, Mechanically reliable hybrid organosilicate glasses for advanced interconnects
Open the PDF for Mechanically reliable hybrid organosilicate glasses for advanced interconnects in another window
Journal Articles

Using electrochemistry-total internal reflection imaging ellipsometry to monitor biochemical oxygen demand with polyaniline modified electrode

Jia Shen, Wei Liu, Yu Niu, Meng Li, Gang Jin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 024001 (2020)
https://doi.org/10.1116/1.5129606
Published: January 2020
View article titled, Using electrochemistry-total internal reflection imaging ellipsometry to monitor biochemical oxygen demand with polyaniline modified electrode
Open the PDF for Using electrochemistry-total internal reflection imaging ellipsometry to monitor biochemical oxygen demand with polyaniline modified electrode in another window
Includes: Supplementary data
Journal Articles

Plasma polymerization of styrene using an argon-fed atmospheric pressure plasma jet

Paolo Edward C. Tan, Christian Lorenz S. Mahinay, Ivan B. Culaba, Oliver Kevin M. Streeter, Miguel Ricardo A. Hilario
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 04I102 (2018)
https://doi.org/10.1116/1.5030840
Published: June 2018
View article titled, Plasma polymerization of styrene using an argon-fed atmospheric pressure plasma jet
Open the PDF for Plasma polymerization of styrene using an argon-fed atmospheric pressure plasma jet in another window
Journal Articles

Real-space pseudopotential calculations for simulating noncontact atomic force microscopy images

Dingxin Fan, Yuki Sakai, James R. Chelikowsky
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 04H102 (2018)
https://doi.org/10.1116/1.5029827
Published: May 2018
View article titled, Real-space pseudopotential calculations for simulating noncontact atomic force microscopy images
Open the PDF for Real-space pseudopotential calculations for simulating noncontact atomic force microscopy images in another window
Includes: Supplementary data
Journal Articles

Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes

Editor’s Pick
Hiroyuki Miyazoe, Nathan Marchack, Robert L. Bruce, Yu Zhu, Masahiro Nakamura, Eric Miller, Sivananda Kanakasabapathy, Takefumi Suzuki, Azumi Ito, Hirokazu Matsumoto, Sebastian U. Engelmann, Eric A. Joseph
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 032201 (2018)
https://doi.org/10.1116/1.5019016
Published: April 2018
View article titled, Nitride etching with hydrofluorocarbons III: Comparison of C<sub>4</sub>H<sub>9</sub>F and CH<sub>3</sub>F for low-k′ nitride spacer etch processes
Open the PDF for Nitride etching with hydrofluorocarbons III: Comparison of C<sub>4</sub>H<sub>9</sub>F and CH<sub>3</sub>F for low-k′ nitride spacer etch processes in another window
Journal Articles

Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking

Satoshi Enomoto, Takahiro Kozawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 031601 (2018)
https://doi.org/10.1116/1.5023061
Published: April 2018
View article titled, Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking
Open the PDF for Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking in another window
Journal Articles

Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications

Nathan Marchack, Hiroyuki Miyazoe, Robert L. Bruce, Hsinyu Tsai, Masahiro Nakamura, Takefumi Suzuki, Azumi Ito, Hirokazu Matsumoto, Sebastian U. Engelmann, Eric A. Joseph
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 031801 (2018)
https://doi.org/10.1116/1.5020069
Published: March 2018
View article titled, Nitride etching with hydrofluorocarbons. II. Evaluation of C<sub>4</sub>H<sub>9</sub>F for tight pitch Si<sub>3</sub>N<sub>4</sub> patterning applications
Open the PDF for Nitride etching with hydrofluorocarbons. II. Evaluation of C<sub>4</sub>H<sub>9</sub>F for tight pitch Si<sub>3</sub>N<sub>4</sub> patterning applications in another window
Journal Articles

Molecular ionization probability in cluster-SIMS

Andreas Wucher
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 03F123 (2018)
https://doi.org/10.1116/1.5018305
Published: March 2018
View article titled, Molecular ionization probability in cluster-SIMS
Open the PDF for Molecular ionization probability in cluster-SIMS in another window
Journal Articles

Relationships between crater and sputtered material characteristics in large gas cluster sputtering of polymers: Results from molecular dynamics simulations

Arnaud Delcorte, Konstantin Moshkunov, Mathieu Debongnie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 03F109 (2018)
https://doi.org/10.1116/1.5012981
Published: February 2018
View article titled, Relationships between crater and sputtered material characteristics in large gas cluster sputtering of polymers: Results from molecular dynamics simulations
Open the PDF for Relationships between crater and sputtered material characteristics in large gas cluster sputtering of polymers: Results from molecular dynamics simulations in another window
Journal Articles

Mitigating e-beam-induced hydrocarbon deposition on graphene for atomic-scale scanning transmission electron microscopy studies

Ondrej Dyck, Songkil Kim, Sergei V. Kalinin, Stephen Jesse
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 011801 (2018)
https://doi.org/10.1116/1.5003034
Published: December 2017
View article titled, Mitigating e-beam-induced hydrocarbon deposition on graphene for atomic-scale scanning transmission electron microscopy studies
Open the PDF for Mitigating e-beam-induced hydrocarbon deposition on graphene for atomic-scale scanning transmission electron microscopy studies in another window
Includes: Supplementary data
Journal Articles

Positive-tone crosslinked molecular resist based on acid-catalyzed depolymerization

Brandon L. Sharp, Hannah L. Narcross, Laren M. Tolbert, Clifford L. Henderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06GE03 (2017)
https://doi.org/10.1116/1.4991904
Published: November 2017
View article titled, Positive-tone crosslinked molecular resist based on acid-catalyzed depolymerization
Open the PDF for Positive-tone crosslinked molecular resist based on acid-catalyzed depolymerization in another window
Includes: Supplementary data
Journal Articles

Isofocal dose based proximity effect correction tolerance to the effective process blur

Gerald G. Lopez, Mohsen Azadi, Meredith G. Metzler, Nikola Belic, Ulrich Hofmann
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G505 (2017)
https://doi.org/10.1116/1.4995421
Published: November 2017
View article titled, Isofocal dose based proximity effect correction tolerance to the effective process blur
Open the PDF for Isofocal dose based proximity effect correction tolerance to the effective process blur in another window
Journal Articles

Fabrication of nickel stamp using e-beam evaporation and electroforming for electroreduction of carbon dioxide

Yangchun Lan, Wuyang Zhuge, Dehu Cui, Xing Cheng
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G802 (2017)
https://doi.org/10.1116/1.4991784
Published: October 2017
View article titled, Fabrication of nickel stamp using e-beam evaporation and electroforming for electroreduction of carbon dioxide
Open the PDF for Fabrication of nickel stamp using e-beam evaporation and electroforming for electroreduction of carbon dioxide in another window
Journal Articles

Synthesis and self-assembly of low χ block copolymers with large periodicity

Caleb L. Breaux, Clifford L. Henderson, Haibo Li, Bing Li, Mark Neisser
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06GI02 (2017)
https://doi.org/10.1116/1.4991874
Published: October 2017
View article titled, Synthesis and self-assembly of low χ block copolymers with large periodicity
Open the PDF for Synthesis and self-assembly of low χ block copolymers with large periodicity in another window
Journal Articles

Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods

Eri Kikuchi, Yota Ishito, Shinya Matsubara, Takahiro Nakamura, Masayuki Abe, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G303 (2017)
https://doi.org/10.1116/1.4990844
Published: September 2017
View article titled, Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods
Open the PDF for Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods in another window
Journal Articles

Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence

Chun Nien, Li-Cheng Chang, Jia-Hao Ye, Vin-Cent Su, Chao-Hsin Wu, Chieh-Hsiung Kuan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 051603 (2017)
https://doi.org/10.1116/1.5001686
Published: September 2017
View article titled, Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence
Open the PDF for Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence in another window
Journal Articles

Nanoimprint lithography tone reversal process using poly(methyl methacrylate) and hydrogen silsesquioxane

Long Chang, Dmitri Litvinov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 041603 (2017)
https://doi.org/10.1116/1.4993562
Published: July 2017
View article titled, Nanoimprint lithography tone reversal process using poly(methyl methacrylate) and hydrogen silsesquioxane
Open the PDF for Nanoimprint lithography tone reversal process using poly(methyl methacrylate) and hydrogen silsesquioxane in another window