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Journal Articles

Optimization and mechanism investigation of pulse etching modes for aluminum line patterning in CMOS image sensor chip manufacturing

Jiacheng Wang, Yongkang Cao, Zhaoyang Chen, Dongchen Che, Xiangyu Wang, Kaidong Xu, Shiwei Zhuang

J. Vac. Sci. Technol. B 43, 042209 (2025)

https://doi.org/10.1116/6.0004515

Published: July 2025

View articletitled, Optimization and mechanism investigation of pulse etching modes for aluminum line patterning in CMOS image sensor chip manufacturing

Journal Articles

TiN and TaN cointegration for 300 mm superconducting back end of line

T. Chêne, R. Segaud, F. Nemouchi, P. Gergaud, S. Minoret, F. Gustavo, J. Garrione, T. Chevolleau

J. Vac. Sci. Technol. B 43, 022216 (2025)

https://doi.org/10.1116/6.0004316

Published: March 2025

View articletitled, TiN and TaN cointegration for 300 mm superconducting back end of line

Journal Articles

Observation of low-resistance Al and Ni p-type ohmic contacts to dilute GeC and GeCSn alloys

Jibesh K. Saha, Saif A. A. Taqy, Pallab K. Sarkar, Imteaz Rahaman, Augustus W. Arbogast, Tuhin Dey, Andrei Dolocan, Md. Reaz Rahman Munna, Khorshed Alam, Daniel Wasserman, Seth R. Bank, Mark A. Wistey

J. Vac. Sci. Technol. B 42, 062211 (2024)

https://doi.org/10.1116/6.0003739

Published: December 2024

View articletitled, Observation of low-resistance Al and Ni p-type ohmic contacts to dilute GeC and GeCSn alloys

Journal Articles

Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence

Nikki Ebadollahi, Pradeep N. Namboodiri, Christian Pederson, Vijin K. Veetil, Marcelo I. Davanco, Kartik A. Srinivasan, Aaron M. Katzenmeyer, Matthew Pelton, Joshua M. Pomeroy

J. Vac. Sci. Technol. B 42, 062208 (2024)

https://doi.org/10.1116/6.0004055

Published: November 2024

View articletitled, Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence

Journal Articles

Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning

Yasser Pordeli, Céline Steenge, Erwin J. W. Berenschot, Ray J. E. Hueting, Andrea Migliorini, Stuart S. P. Parkin, Niels R. Tas

J. Vac. Sci. Technol. B 42, 062805 (2024)

https://doi.org/10.1116/6.0004024

Published: November 2024

View articletitled, Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning

Journal Articles

Enhancing performance of microbolometers by utilizing low-temperature polycrystalline silicon

Taeseung Jung, Seungyeob Kim, Sangho Lee, Jinho Ahn, Sanghun Jeon

J. Vac. Sci. Technol. B 42, 063202 (2024)

https://doi.org/10.1116/6.0003901

Published: October 2024

View articletitled, Enhancing performance of microbolometers by utilizing low-temperature polycrystalline silicon

Journal Articles

Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness

Naoki Takano, Hiromasa Niinomi, Tomoya Oshikiri, Masaru Nakagawa

J. Vac. Sci. Technol. B 42, 042603 (2024)

https://doi.org/10.1116/6.0003779

Published: July 2024

View articletitled, Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness

Journal Articles

Characteristics of a hybrid radio frequency capacitively and inductively coupled plasma using hydrogen gas

Yasunori Ohtsu, Tatsuo Tabaru, Julian Schulze

J. Vac. Sci. Technol. B 42, 044204 (2024)

https://doi.org/10.1116/5.0213602

Published: July 2024

View articletitled, Characteristics of a hybrid radio frequency capacitively and inductively coupled plasma using hydrogen gas

Journal Articles

Emission enhancement of GaN field emitter arrays in an N₂ environment

Reza Farsad Asadi, Tao Zheng, Pao-Chuan Shih, Tomás Palacios, Akintunde I. Akinwande, Bruce Gnade

J. Vac. Sci. Technol. B 42, 044004 (2024)

https://doi.org/10.1116/6.0003704

Published: July 2024

View articletitled, Emission enhancement of GaN field emitter arrays in an N2 environment

Journal Articles

X-ray photoelectron spectroscopy surface oxidation study of remote plasma-enhanced chemical vapor deposition-grown Ge_1−xSn_x/Si alloys

Kevin Choe, Jeremy Hunter, Christopher Sutphin, Daniel Felker, Bruce Claflin, Gordon Grzybowski, Christina Dugan

J. Vac. Sci. Technol. B 42, 042207 (2024)

https://doi.org/10.1116/6.0003688

Published: July 2024

View articletitled, X-ray photoelectron spectroscopy surface oxidation study of remote plasma-enhanced chemical vapor deposition-grown Ge1−xSnx/Si alloys

Journal Articles

Numerical analysis of high vacuum packaging efficiency for narrow structured devices

Zhengwei Mei, Siwei Wang, Wenyu Lin, Xudi Wang, Yuqing Wang

J. Vac. Sci. Technol. B 42, 044202 (2024)

https://doi.org/10.1116/6.0003641

Published: June 2024

View articletitled, Numerical analysis of high vacuum packaging efficiency for narrow structured devices

Journal Articles

Electronic and optical properties of lithium-doped boron nitride nanoribbons using density functional theory

Farzaneh Safdarian, Farzad Ahmadian, Rohollah Zare Hasan Abad, Hojat Allah Badehian

J. Vac. Sci. Technol. B 42, 042201 (2024)

https://doi.org/10.1116/6.0003635

Published: May 2024

View articletitled, Electronic and optical properties of lithium-doped boron nitride nanoribbons using density functional theory

Journal Articles

Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen

Ahmad Reza Rastkar, Mehdi Sadri Kandjani

J. Vac. Sci. Technol. B 42, 034006 (2024)

https://doi.org/10.1116/6.0003483

Published: May 2024

View articletitled, Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen

Journal Articles

Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch

Renqiang Kang, Aixi Pan, Bo Cui

J. Vac. Sci. Technol. B 42, 033002 (2024)

https://doi.org/10.1116/6.0003516

Published: April 2024

View articletitled, Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch

Journal Articles

Sodium adsorption on nanometer-thick TiO₂ channel thin-film transistors for enhanced drain currents

Ryo Miyazawa, Haruto Suzuki, Hibiki Takeda, Masanori Miura, Bashir Ahmmad, Fumihiko Hirose

J. Vac. Sci. Technol. B 42, 022213 (2024)

https://doi.org/10.1116/6.0003217

Published: March 2024

View articletitled, Sodium adsorption on nanometer-thick TiO2 channel thin-film transistors for enhanced drain currents

Journal Articles

Fabrication of slanted gratings by using glancing angle deposition

Hongwen Wu, Aixi Pan, Chenxu Zhu, Bo Cui

J. Vac. Sci. Technol. B 42, 023002 (2024)

https://doi.org/10.1116/6.0003479

Published: March 2024

View articletitled, Fabrication of slanted gratings by using glancing angle deposition

Journal Articles

Mid-infrared emission of germanium-tin films produced by sputtering

William W. Hernández-Montero, Carlos Zúñiga-Islas

J. Vac. Sci. Technol. B 42, 022210 (2024)

https://doi.org/10.1116/6.0003237

Published: March 2024

View articletitled, Mid-infrared emission of germanium-tin films produced by sputtering

Journal Articles

Degradation of GaN field emitter arrays induced by O₂ exposure

Reza Farsad Asadi, Tao Zheng, Pao-Chuan Shih, Tomás Palacios, Akintunde I. Akinwande, Bruce Gnade

J. Vac. Sci. Technol. B 42, 014001 (2024)

https://doi.org/10.1116/6.0003314

Published: January 2024

View articletitled, Degradation of GaN field emitter arrays induced by O2 exposure

Journal Articles

Development of “GaSb-on-silicon” metamorphic substrates for optoelectronic device growth

Fatih F. Ince, Mega Frost, Darryl Shima, Thomas J. Rotter, Sadhvikas Addamane, Chadwick L. Canedy, Stephanie Tomasulo, Chul Soo Kim, William W. Bewley, Igor Vurgaftman, Jerry R. Meyer, Ganesh Balakrishnan

J. Vac. Sci. Technol. B 42, 012205 (2024)

https://doi.org/10.1116/6.0003211

Published: January 2024

View articletitled, Development of “GaSb-on-silicon” metamorphic substrates for optoelectronic device growth

Journal Articles

Effect of annealing on focused ion beam induced surface damages in silicon analyzed by micro-Raman spectroscopy

Yoshiharu Goshima, Shinsuke Kashiwagi, Takahiro Namazu

J. Vac. Sci. Technol. B 41, 054001 (2023)

https://doi.org/10.1116/6.0002895

Published: September 2023

View articletitled, Effect of annealing on focused ion beam induced surface damages in silicon analyzed by micro-Raman spectroscopy

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Optimization and mechanism investigation of pulse etching modes for aluminum line patterning in CMOS image sensor chip manufacturing

TiN and TaN cointegration for 300 mm superconducting back end of line

Observation of low-resistance Al and Ni p-type ohmic contacts to dilute GeC and GeCSn alloys

Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence

Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning

Enhancing performance of microbolometers by utilizing low-temperature polycrystalline silicon

Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness

Characteristics of a hybrid radio frequency capacitively and inductively coupled plasma using hydrogen gas

Emission enhancement of GaN field emitter arrays in an N₂ environment

X-ray photoelectron spectroscopy surface oxidation study of remote plasma-enhanced chemical vapor deposition-grown Ge_1−xSn_x/Si alloys

Numerical analysis of high vacuum packaging efficiency for narrow structured devices

Electronic and optical properties of lithium-doped boron nitride nanoribbons using density functional theory

Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen

Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch

Sodium adsorption on nanometer-thick TiO₂ channel thin-film transistors for enhanced drain currents

Fabrication of slanted gratings by using glancing angle deposition

Mid-infrared emission of germanium-tin films produced by sputtering

Degradation of GaN field emitter arrays induced by O₂ exposure

Development of “GaSb-on-silicon” metamorphic substrates for optoelectronic device growth

Effect of annealing on focused ion beam induced surface damages in silicon analyzed by micro-Raman spectroscopy

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