1-20 of 21
Laser interferometry
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Statistical comparison of field height correction by Z-stage movement versus height-correction hardware in a modern electron-beam lithography tool

Available to Purchase
Michael P. Young
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JA02 (2018)
https://doi.org/10.1116/1.5048117
Published: October 2018
View articletitled, Statistical comparison of field height correction by Z-stage movement versus height-correction hardware in a modern electron-beam lithography tool
Open the PDF for Statistical comparison of field height correction by Z-stage movement versus height-correction hardware in a modern electron-beam lithography tool in another window
Journal Articles

Electron beam lithography using fixed beam moving stage

Available to Purchase
Iman Khodadad, Nathan Nelson-Fitzpatrick, Kevin Burcham, Arsen Hajian, Simarjeet S. Saini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 051601 (2017)
https://doi.org/10.1116/1.4997018
Published: August 2017
View articletitled, Electron beam lithography using fixed beam moving stage
Open the PDF for Electron beam lithography using fixed beam moving stage in another window
Journal Articles

Stitching error reduction in electron beam lithography with in-situ feedback using self-developing resist

Available to Purchase
Ripon Kumar Dey, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F409 (2013)
https://doi.org/10.1116/1.4831769
Published: November 2013
View articletitled, Stitching error reduction in electron beam lithography with in-situ feedback using self-developing resist
Open the PDF for Stitching error reduction in electron beam lithography with in-situ feedback using self-developing resist in another window
Journal Articles

Multispecies focused ion beam lithography system and its applications

Available to Purchase
Sven Bauerdick, Lars Bruchhaus, Paul Mazarov, Achim Nadzeyka, Ralf Jede, Joel Fridmann, Jason E. Sanabia, Brent Gila, Bill R. Appleton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F404 (2013)
https://doi.org/10.1116/1.4824327
Published: October 2013
View articletitled, Multispecies focused ion beam lithography system and its applications
Open the PDF for Multispecies focused ion beam lithography system and its applications in another window
Journal Articles

High density submicron features using a laser pattern generator and double patterning

Available to Purchase
Mikhail E. Gaevski, G. Patrick Watson, Anthony E. Novembre
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2742–2744 (2009)
https://doi.org/10.1116/1.3263192
Published: December 2009
View articletitled, High density submicron features using a laser pattern generator and double patterning
Open the PDF for High density submicron features using a laser pattern generator and double patterning in another window
Journal Articles

Sub-10-nm nanolithography with a scanning helium beam

Available to Purchase
Vadim Sidorkin, Emile van Veldhoven, Emile van der Drift, Paul Alkemade, Huub Salemink, Diederik Maas
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, L18–L20 (2009)
https://doi.org/10.1116/1.3182742
Published: July 2009
View articletitled, Sub-10-nm nanolithography with a scanning helium beam
Open the PDF for Sub-10-nm nanolithography with a scanning helium beam in another window
Journal Articles

Development of three-axis desktop milling machine

Available to Purchase
Q. Y. Wang, F. Z. Fang, X. T. Hu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1278–1284 (2009)
https://doi.org/10.1116/1.3056173
Published: May 2009
View articletitled, Development of three-axis desktop milling machine
Open the PDF for Development of three-axis desktop milling machine in another window
Journal Articles

Projection maskless patterning for nanotechnology applications

Available to Purchase
Elmar Platzgummer, Hans Loeschner, Gerhard Gross
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2059–2063 (2008)
https://doi.org/10.1116/1.2993260
Published: December 2008
View articletitled, Projection maskless patterning for nanotechnology applications
Open the PDF for Projection maskless patterning for nanotechnology applications in another window
Journal Articles

Three-dimensional digital scanner based on micromachined micromirror for the metrological measurement of the human ear canal

Available to Purchase
M. Prasciolu, R. Malureanu, S. Cabrini, D. Cojoc, L. Businaro, A. Carpentiero, R. Kumar, E. Di Fabrizio
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2990–2994 (2005)
https://doi.org/10.1116/1.2121734
Published: December 2005
View articletitled, Three-dimensional digital scanner based on micromachined micromirror for the metrological measurement of the human ear canal
Open the PDF for Three-dimensional digital scanner based on micromachined micromirror for the metrological measurement of the human ear canal in another window
Journal Articles

Reaching for the bottom: The evolution of EIPBN

Available to Purchase
Henry I. Smith, R. Fabian Pease
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2882–2884 (2004)
https://doi.org/10.1116/1.1828088
Published: December 2004
View articletitled, Reaching for the bottom: The evolution of EIPBN
Open the PDF for Reaching for the bottom: The evolution of EIPBN in another window
Journal Articles

Accurate in depth profiling of As and P shallow implants by secondary ion mass spectroscopy

Available to Purchase
E. de Chambost, A. Merkulov, M. Schuhmacher, P. Peres
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 341–345 (2004)
https://doi.org/10.1116/1.1634957
Published: February 2004
View articletitled, Accurate in depth profiling of As and P shallow implants by secondary ion mass spectroscopy
Open the PDF for Accurate in depth profiling of As and P shallow implants by secondary ion mass spectroscopy in another window
Journal Articles

Metrology of electron‐beam lithography systems using holographically produced reference samples

Available to Purchase
Erik H. Anderson, Volker Boegli, Mark L. Schattenburg, Dieter Kern, Henry I. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 3606–3611 (1991)
https://doi.org/10.1116/1.585854
Published: November 1991
View articletitled, Metrology of electron‐beam lithography systems using holographically produced reference samples
Open the PDF for Metrology of electron‐beam lithography systems using holographically produced reference samples in another window
Journal Articles

A new approach to high fidelity e‐beam and ion‐beam lithography based on an in situ global‐fiducial grid

Available to Purchase
Henry I. Smith, Scott D. Hector, M. L. Schattenburg, Erik H. Anderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 2992–2995 (1991)
https://doi.org/10.1116/1.585355
Published: November 1991
View articletitled, A new approach to high fidelity e‐beam and ion‐beam lithography based on an in situ global‐fiducial grid
Open the PDF for A new approach to high fidelity e‐beam and ion‐beam lithography based on an in situ global‐fiducial grid in another window
Journal Articles

Dry‐etch monitoring of III–V heterostructures using laser reflectometry and optical emission spectroscopy

Available to Purchase
P. Collot, T. Diallo, J. Canteloup
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 2497–2502 (1991)
https://doi.org/10.1116/1.585681
Published: September 1991
View articletitled, Dry‐etch monitoring of III–V heterostructures using laser reflectometry and optical emission spectroscopy
Open the PDF for Dry‐etch monitoring of III–V heterostructures using laser reflectometry and optical emission spectroscopy in another window
Journal Articles

A vertical stepper for synchrotron x‐ray lithography

Available to Purchase
S. Ishihara, M. Kanai, A. Une, M. Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1652–1656 (1989)
https://doi.org/10.1116/1.584508
Published: November 1989
View articletitled, A vertical stepper for synchrotron x‐ray lithography
Open the PDF for A vertical stepper for synchrotron x‐ray lithography in another window
Journal Articles

Direct writing through resist exposure using a focused ion beam system

Available to Purchase
Y. Ochiai, Y. Kojima, S. Matsui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 1055–1061 (1988)
https://doi.org/10.1116/1.584297
Published: July 1988
View articletitled, Direct writing through resist exposure using a focused ion beam system
Open the PDF for Direct writing through resist exposure using a focused ion beam system in another window
Journal Articles

Reactive ion etching of GaAs with high aspect ratios with Cl2–CH4–H2–Ar mixtures

Available to Purchase
N. Vodjdani, P. Parrens
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 5, 1591–1598 (1987)
https://doi.org/10.1116/1.583634
Published: November 1987
View articletitled, Reactive ion etching of GaAs with high aspect ratios with Cl2–CH4–H2–Ar mixtures
Open the PDF for Reactive ion etching of GaAs with high aspect ratios with Cl2–CH4–H2–Ar mixtures in another window
Journal Articles

Automatic electron beam metrology system for development of very large‐scale integrated devices

Available to Purchase
Genya Matsuoka, Mikio Ichihasi, Hisaya Murakoshi, Kenichi Yamamoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 5, 79–83 (1987)
https://doi.org/10.1116/1.583932
Published: January 1987
View articletitled, Automatic electron beam metrology system for development of very large‐scale integrated devices
Open the PDF for Automatic electron beam metrology system for development of very large‐scale integrated devices in another window
Journal Articles

A hydraulic X–Y stage system for application in electron beam exposure systems

Available to Purchase
R. J. Nielsen, J. H. Bruning, R. M. Richman, C. J. Biddick, J. Giacchi, G. J. W. Kossyk, D. R. Bush, S. J. Barna, D. S. Alles
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 5, 57–60 (1987)
https://doi.org/10.1116/1.583927
Published: January 1987
View articletitled, A hydraulic X–Y stage system for application in electron beam exposure systems
Open the PDF for A hydraulic X–Y stage system for application in electron beam exposure systems in another window
Journal Articles

High speed precision X‐Y stage

Available to Purchase
John Reeds, S. Hansen, O. Otto, Allen M. Carroll, Donald J. McCarthy, Jack Radley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 3, 112–116 (1985)
https://doi.org/10.1116/1.583190
Published: January 1985
View articletitled, High speed precision X‐Y stage
Open the PDF for High speed precision X‐Y stage in another window