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Journal Articles

Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography

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Shumin Yang, Jun Zhao, Liansheng Wang, Fangyuan Zhu, Chaofan Xue, Haigang Liu, Huazheng Sang, Yanqing Wu, Renzhong Tai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 021601 (2017)
https://doi.org/10.1116/1.4974930
Published: January 2017
View articletitled, Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography
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Journal Articles

Progress in extreme ultraviolet interferometric and holographic lithography

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A. Isoyan, Y.-C. Cheng, F. Jiang, J. Wallace, F. Cerrina, S. Bollepalli
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2145–2150 (2007)
https://doi.org/10.1116/1.2794069
Published: December 2007
View articletitled, Progress in extreme ultraviolet interferometric and holographic lithography
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Journal Articles

Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

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Patrick P. Naulleau, Christopher N. Anderson, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Dimitra Niakoula, Bruno La Fontaine, Tom Wallow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2132–2135 (2007)
https://doi.org/10.1116/1.2781522
Published: December 2007
View articletitled, Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
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Journal Articles

Scaling law in acceleration test of extreme ultraviolet lithography projection optics mirror contamination

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Yoshio Gomei, Hiromitsu Takase, Takashi Aoki, Shuichi Matsunari, Shigeru Terashima, Yukinobu Kakutani, Masahito Niibe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2848–2851 (2005)
https://doi.org/10.1116/1.2074847
Published: December 2005
View articletitled, Scaling law in acceleration test of extreme ultraviolet lithography projection optics mirror contamination
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Journal Articles

Pulsed field emitted current from different commercial samples in the purpose of a free electron laser application

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R. Ganter, K. Li, M. Dehler, J. Gobrecht, L. Rivkin, A. Wrulich
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 680–681 (2005)
https://doi.org/10.1116/1.1857892
Published: April 2005
View articletitled, Pulsed field emitted current from different commercial samples in the purpose of a free electron laser application
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Journal Articles

At-wavelength alignment and testing of the 0.3 NA MET optic

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Kenneth A. Goldberg, Patrick P. Naulleau, Paul E. Denham, Senajith B. Rekawa, Keith Jackson, Erik H. Anderson, J. Alexander Liddle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2956–2961 (2004)
https://doi.org/10.1116/1.1815303
Published: December 2004
View articletitled, At-wavelength alignment and testing of the 0.3 NA MET optic
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Journal Articles

Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography

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V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, J. Gobrecht
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 99–103 (2004)
https://doi.org/10.1116/1.1640402
Published: January 2004
View articletitled, Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography
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Journal Articles

At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic

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Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson, Phillip Batson, Paul E. Denham, Keith H. Jackson, Eric M. Gullikson, Senajith Rekawa, Jeffrey Bokor
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 2396–2400 (2001)
https://doi.org/10.1116/1.1421545
Published: November 2001
View articletitled, At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic
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Journal Articles

Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system

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Kenneth A. Goldberg, Patrick Naulleau, Phillip Batson, Paul Denham, Erik H. Anderson, Henry Chapman, Jeffrey Bokor
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 2911–2915 (2000)
https://doi.org/10.1116/1.1319703
Published: November 2000
View articletitled, Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system
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Journal Articles

Synchrotron light as a source for extreme ultraviolet lithography

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D. C. Ockwell, N. C. E. Crosland, V. C. Kempson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3043–3046 (1999)
https://doi.org/10.1116/1.590951
Published: November 1999
View articletitled, Synchrotron light as a source for extreme ultraviolet lithography
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Journal Articles

Coherent soft x-ray scattering from InP islands on a semiconductor substrate

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M. Adamcyk, C. Nicoll, T. Pinnington, T. Tiedje, S. Eisebitt, A. Karl, R. Scherer, W. Eberhardt
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 1728–1732 (1999)
https://doi.org/10.1116/1.590816
Published: July 1999
View articletitled, Coherent soft x-ray scattering from InP islands on a semiconductor substrate
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Journal Articles

A proposal for maskless, zone‐plate‐array nanolithography

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Henry I. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 4318–4322 (1996)
https://doi.org/10.1116/1.589044
Published: November 1996
View articletitled, A proposal for maskless, zone‐plate‐array nanolithography
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Journal Articles

Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma source

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A. K. Ray‐Chaudhuri, K. D. Krenz, R. P. Nissen, S. J. Haney, C. H. Fields, W. C. Sweatt, A. A. MacDowell
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 3964–3968 (1996)
https://doi.org/10.1116/1.588624
Published: November 1996
View articletitled, Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma source
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Journal Articles

X‐ray magnetic microscopy and spectroscopy using a third generation synchrotron radiation source

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A. T. Young, H. A. Padmore, N. V. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 3119–3125 (1996)
https://doi.org/10.1116/1.589073
Published: July 1996
View articletitled, X‐ray magnetic microscopy and spectroscopy using a third generation synchrotron radiation source
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Journal Articles

Patterning a 50‐nm period grating using soft x‐ray spatial frequency multiplication

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Max Wei, David T. Attwood, T. K. Gustafson, Erik H. Anderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 3648–3652 (1994)
https://doi.org/10.1116/1.587632
Published: November 1994
View articletitled, Patterning a 50‐nm period grating using soft x‐ray spatial frequency multiplication
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Journal Articles

Soft x‐ray projection lithography using a 1:1 ring field optical system

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A. A. MacDowell, J. E. Bjorkholm, J. Bokor, L. Eichner, R. R. Freeman, W. M. Mansfield, J. Pastalan, L. H. Szeto, D. M. Tennant, O. R. Wood, II, T. E. Jewell, W. K. Waskiewicz, D. L. White, D. L. Windt, W. T. Silfvast, F. Zernike
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 3193–3197 (1991)
https://doi.org/10.1116/1.585315
Published: November 1991
View articletitled, Soft x‐ray projection lithography using a 1:1 ring field optical system
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