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Journal Articles

Investigation of the radiation-induced thermal flexure of an x-ray lithography mask during a tilted exposure

V. Nazmov, E. Reznikova, J. Mohr
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 011007 (2011)
https://doi.org/10.1116/1.3524905
Published: January 2011
View article titled, Investigation of the radiation-induced thermal flexure of an x-ray lithography mask during a tilted exposure
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Journal Articles

Progress in extreme ultraviolet interferometric and holographic lithography

A. Isoyan, Y.-C. Cheng, F. Jiang, J. Wallace, F. Cerrina, S. Bollepalli
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2145–2150 (2007)
https://doi.org/10.1116/1.2794069
Published: December 2007
View article titled, Progress in extreme ultraviolet interferometric and holographic lithography
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Journal Articles

Fabrication of a needle array using a Si gray mask for x-ray lithography

Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Masaharu Takahashi, Ryutaro Maeda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2196–2201 (2007)
https://doi.org/10.1116/1.2794314
Published: December 2007
View article titled, Fabrication of a needle array using a Si gray mask for x-ray lithography
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Journal Articles

Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation

Yuichi Utsumi, Takefumi Kishimoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2903–2909 (2005)
https://doi.org/10.1116/1.2131880
Published: December 2005
View article titled, Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation
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Journal Articles

Development, installation, and performance of the x-ray stepper JSAL 5C

Q. Leonard, D. Malueg, J. Wallace, J. W. Taylor, S. Dhuey, F. Cerrina, B. Boerger, R. Selzer, M. Yu, Y. Ma, K. Myers, M. Trybendis, E. Moon, H. I. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2896–2902 (2005)
https://doi.org/10.1116/1.2121711
Published: December 2005
View article titled, Development, installation, and performance of the x-ray stepper JSAL 5C
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Journal Articles

Scaling law in acceleration test of extreme ultraviolet lithography projection optics mirror contamination

Yoshio Gomei, Hiromitsu Takase, Takashi Aoki, Shuichi Matsunari, Shigeru Terashima, Yukinobu Kakutani, Masahito Niibe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2848–2851 (2005)
https://doi.org/10.1116/1.2074847
Published: December 2005
View article titled, Scaling law in acceleration test of extreme ultraviolet lithography projection optics mirror contamination
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Journal Articles

Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation

K. Hamamoto, Y. Tanaka, T. Watanabe, N. Sakaya, M. Hosoya, T. Shoki, H. Hada, N. Hishinuma, H. Sugahara, H. Kinoshita
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 247–251 (2005)
https://doi.org/10.1116/1.1849220
Published: January 2005
View article titled, Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation
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Journal Articles

Minimal zone plates for x-ray lithography

D. Amy, L. Jiang, R. Zheng, M. Feldman, F. Cerrina, S. Dhuey, Q. Leonard, D. Thielman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3570–3574 (2004)
https://doi.org/10.1116/1.1809625
Published: December 2004
View article titled, Minimal zone plates for x-ray lithography
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Journal Articles

Structure quality of high aspect ratio sub-micron polymer structures patterned at the electron storage ring ANKA

S. Achenbach, T. Mappes, J. Mohr
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3196–3201 (2004)
https://doi.org/10.1116/1.1824910
Published: December 2004
View article titled, Structure quality of high aspect ratio sub-micron polymer structures patterned at the electron storage ring ANKA
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Journal Articles

Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry

J. Perlich, F.-M. Kamm, J. Rau, F. Scholze, G. Ulm
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3059–3062 (2004)
https://doi.org/10.1116/1.1809615
Published: December 2004
View article titled, Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry
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Journal Articles

Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, J. Gobrecht
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 99–103 (2004)
https://doi.org/10.1116/1.1640402
Published: January 2004
View article titled, Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography
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Journal Articles

Correction of chromatic and spherical aberration in electron microscopy utilizing the time structure of pulsed excitation sources

G. Schönhense, H. Spiecker
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 2526–2534 (2002)
https://doi.org/10.1116/1.1523373
Published: December 2002
View article titled, Correction of chromatic and spherical aberration in electron microscopy utilizing the time structure of pulsed excitation sources
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Journal Articles

Accurate reflectometry for extreme-ultraviolet lithography at the National Institute of Standards and Technology

S. Grantham, C. Tarrio, T. B. Lucatorto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 3080–3084 (2002)
https://doi.org/10.1116/1.1526351
Published: December 2002
View article titled, Accurate reflectometry for extreme-ultraviolet lithography at the National Institute of Standards and Technology
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Journal Articles

Distortion correction in adaptive membrane masks

X. Zhuang, M. Feldman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 2631–2634 (2001)
https://doi.org/10.1116/1.1408955
Published: November 2001
View article titled, Distortion correction in adaptive membrane masks
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Journal Articles

Evaluation of exposure dose repeatability in synchrotron radiation lithography

Kenji Itoga, Hiroaki Sumitani, Hiroshi Watanabe, Teruhiko Kumada, Itsuo Kodera, Shinichi Satoh, Nobuaki Ogushi, Satoshi Oishi, Ryou Edo, Takeshi Yamamoto, Yutaka Watanabe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 774–779 (2000)
https://doi.org/10.1116/1.591275
Published: March 2000
View article titled, Evaluation of exposure dose repeatability in synchrotron radiation lithography
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Journal Articles

Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces

H. H. Solak, D. He, W. Li, F. Cerrina
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3052–3057 (1999)
https://doi.org/10.1116/1.590953
Published: November 1999
View article titled, Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces
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Journal Articles

Thermal compensation of x-ray mask distortions

M. Feldman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3407–3410 (1999)
https://doi.org/10.1116/1.591020
Published: November 1999
View article titled, Thermal compensation of x-ray mask distortions
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Journal Articles

Synchrotron light as a source for extreme ultraviolet lithography

D. C. Ockwell, N. C. E. Crosland, V. C. Kempson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3043–3046 (1999)
https://doi.org/10.1116/1.590951
Published: November 1999
View article titled, Synchrotron light as a source for extreme ultraviolet lithography
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Journal Articles

Extension of x-ray lithography to 50 nm with a harder spectrum

Mumit Khan, Geng Han, Srinivas B. Bollepalli, Franco Cerrina, Juan Maldonado
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3426–3432 (1999)
https://doi.org/10.1116/1.591024
Published: November 1999
View article titled, Extension of x-ray lithography to 50 nm with a harder spectrum
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Journal Articles

Characterization of pattern geometrical effect on line end shortening in x-ray lithography

M. Yi, Y. Seo, E. Seo, J. Yang, K. Lee, B. K. Choi, O. Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 3515–3520 (1998)
https://doi.org/10.1116/1.590488
Published: November 1998
View article titled, Characterization of pattern geometrical effect on line end shortening in x-ray lithography
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