1-20 of 118
Ultraviolet optics
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Pattern quality and defect evaluation based on cross correlation and power spectral density methods

Libin Zhang, Le Ma, Rui Chen, Jianfang He, Xiaojing Su, Lisong Dong, Yajuan Su, Yayi Wei
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 052902 (2018)
https://doi.org/10.1116/1.5040391
Published: August 2018
View article titled, Pattern quality and defect evaluation based on cross correlation and power spectral density methods
Open the PDF for Pattern quality and defect evaluation based on cross correlation and power spectral density methods in another window
Journal Articles

Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking

Satoshi Enomoto, Takahiro Kozawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 031601 (2018)
https://doi.org/10.1116/1.5023061
Published: April 2018
View article titled, Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking
Open the PDF for Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking in another window
Journal Articles

In situ transformation and cleaning of tin-drop contamination on mirrors for extreme ultraviolet light

Norbert Böwering, Christian Meier
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 021602 (2018)
https://doi.org/10.1116/1.5016821
Published: February 2018
View article titled, <em>In situ</em> transformation and cleaning of tin-drop contamination on mirrors for extreme ultraviolet light
Open the PDF for <em>In situ</em> transformation and cleaning of tin-drop contamination on mirrors for extreme ultraviolet light in another window
Journal Articles

Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

Roberto Fallica, Dimitrios Kazazis, Robert Kirchner, Anja Voigt, Iacopo Mochi, Helmut Schift, Yasin Ekinci
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 061603 (2017)
https://doi.org/10.1116/1.5003476
Published: November 2017
View article titled, Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
Open the PDF for Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography in another window
Journal Articles

Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography

Suchit Bhattarai, Andrew R. Neureuther, Patrick P. Naulleau
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 061602 (2017)
https://doi.org/10.1116/1.4991054
Published: November 2017
View article titled, Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography
Open the PDF for Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography in another window
Journal Articles

Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography

Nikolay Chkhalo, Vladimir Polkovnikov, Nikolay Salashchenko, Mikhail Toropov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 062002 (2017)
https://doi.org/10.1116/1.4995369
Published: October 2017
View article titled, Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography
Open the PDF for Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography in another window
Journal Articles

Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme ultraviolet lithography

Vishal Desai, Mac Mellish, Stephen Bennett, Nathaniel C. Cady
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 021603 (2017)
https://doi.org/10.1116/1.4975797
Published: February 2017
View article titled, Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme ultraviolet lithography
Open the PDF for Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme ultraviolet lithography in another window
Journal Articles

Study of alternate hardmasks for extreme ultraviolet patterning

Anuja De Silva, Indira Seshadri, Abraham Arceo, Karen Petrillo, Luciana Meli, Brock Mendoza, Yiping Yao, Michael Belyansky, Scott Halle, Nelson M. Felix
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KG03 (2016)
https://doi.org/10.1116/1.4966960
Published: November 2016
View article titled, Study of alternate hardmasks for extreme ultraviolet patterning
Open the PDF for Study of alternate hardmasks for extreme ultraviolet patterning in another window
Journal Articles

Comparative study of resists and lithographic tools using the Lumped Parameter Model

Roberto Fallica, Robert Kirchner, Yasin Ekinci, Dominique Mailly
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K702 (2016)
https://doi.org/10.1116/1.4967183
Published: November 2016
View article titled, Comparative study of resists and lithographic tools using the Lumped Parameter Model
Open the PDF for Comparative study of resists and lithographic tools using the Lumped Parameter Model in another window
Journal Articles

Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling

Kenneth C. Johnson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041608 (2016)
https://doi.org/10.1116/1.4954988
Published: July 2016
View article titled, Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling
Open the PDF for Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling in another window
Journal Articles

Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating

Tsuyoshi Amano, Tsukasa Abe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FE02 (2015)
https://doi.org/10.1116/1.4931934
Published: September 2015
View article titled, Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating
Open the PDF for Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating in another window
Journal Articles

Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography

Xiaolei Liu, Sikun Li, Xiangzhao Wang, Heng Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 051603 (2015)
https://doi.org/10.1116/1.4930240
Published: September 2015
View article titled, Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography
Open the PDF for Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography in another window
Journal Articles

Protection of extreme ultraviolet lithography masks. I. Thermophoretic protection factors at low pressure for diffusing nanoscale particles

Leonard E. Klebanoff, Anthony S. Geller, John R. Torczynski, Michael A. Gallis, Daniel J. Rader, Frank C. Chilese, Rudy F. Garcia, Gil Delgado
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031601 (2015)
https://doi.org/10.1116/1.4916210
Published: March 2015
View article titled, Protection of extreme ultraviolet lithography masks. I. Thermophoretic protection factors at low pressure for diffusing nanoscale particles
Open the PDF for Protection of extreme ultraviolet lithography masks. I. Thermophoretic protection factors at low pressure for diffusing nanoscale particles in another window
Journal Articles

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Sudharshanan Raghunathan, Obert R. Wood, II, Pawitter Mangat, Erik Verduijn, Vicky Philipsen, Eric Hendrickx, Rik Jonckheere, Kenneth A. Goldberg, Markus P. Benk, Patrick Kearney, Zachary Levinson, Bruce W. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F801 (2014)
https://doi.org/10.1116/1.4901876
Published: November 2014
View article titled, Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Open the PDF for Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images in another window
Journal Articles

Electron scattering analysis based on electron ray-tracing in extreme ultraviolet photomask

Jin Choi, Byung Sup Ahn, Chan Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 041601 (2014)
https://doi.org/10.1116/1.4878943
Published: May 2014
View article titled, Electron scattering analysis based on electron ray-tracing in extreme ultraviolet photomask
Open the PDF for Electron scattering analysis based on electron ray-tracing in extreme ultraviolet photomask in another window
Journal Articles

Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy

Jae Uk Lee, Seongchul Hong, Jinho Ahn, Jonggul Doh, SeeJun Jeong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 031601 (2014)
https://doi.org/10.1116/1.4873697
Published: April 2014
View article titled, Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy
Open the PDF for Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy in another window
Journal Articles

Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system

Wei Li, Victor Martinez Esquiroz, Lukasz Urbanski, Dinesh Patel, Carmen S. Menoni, Mario C. Marconi, Aaron Stein, Weilun Chao, Erik H. Anderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F604 (2013)
https://doi.org/10.1116/1.4826344
Published: October 2013
View article titled, Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system
Open the PDF for Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system in another window
Journal Articles

Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing

Li Wang, Daniel Fan, Vitaliy A. Guzenko, Yasin Ekinci
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F602 (2013)
https://doi.org/10.1116/1.4822016
Published: September 2013
View article titled, Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
Open the PDF for Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing in another window
Journal Articles

Defect tolerant extreme ultraviolet lithography technique

Lukasz Urbanski, Wei Li, Jorge J. Rocca, Carmen S. Menoni, Mario C. Marconi, Artak Isoyan, Aaron Stein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06F502 (2012)
https://doi.org/10.1116/1.4758758
Published: October 2012
View article titled, Defect tolerant extreme ultraviolet lithography technique
Open the PDF for Defect tolerant extreme ultraviolet lithography technique in another window
Journal Articles

Scanned-spot-array extreme ultraviolet imaging for high-volume maskless lithography

Kenneth C. Johnson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 051606 (2012)
https://doi.org/10.1116/1.4752112
Published: September 2012
View article titled, Scanned-spot-array extreme ultraviolet imaging for high-volume maskless lithography
Open the PDF for Scanned-spot-array extreme ultraviolet imaging for high-volume maskless lithography in another window