1-20 of 22
Lens array
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Scalable fabrication approach and fill factor optimization for single pixel microlens arrays

Featured
Jens Bonitz, Christian Helke, Nils Dittmar, Sebastian Schermer, Micha Haase, Lutz Hofmann, Danny Reuter
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062203 (2024)
https://doi.org/10.1116/6.0004036
Published: October 2024
View article titled, Scalable fabrication approach and fill factor optimization for single pixel microlens arrays
Open the PDF for Scalable fabrication approach and fill factor optimization for single pixel microlens arrays in another window
Journal Articles

Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication

Editor’s Pick
Chen Zhu, Edward C. Kinzel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 033601 (2023)
https://doi.org/10.1116/6.0002557
Published: May 2023
View article titled, Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication
Open the PDF for Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication in another window
Journal Articles

Transmission electron imaging in the Delft multibeam scanning electron microscope 1

Yan Ren, Pieter Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KF02 (2016)
https://doi.org/10.1116/1.4966216
Published: October 2016
View article titled, Transmission electron imaging in the Delft multibeam scanning electron microscope 1
Open the PDF for Transmission electron imaging in the Delft multibeam scanning electron microscope 1 in another window
Journal Articles

High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps

Nachiappan Chidambaram, Robert Kirchner, Mirco Altana, Helmut Schift
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K401 (2016)
https://doi.org/10.1116/1.4961250
Published: August 2016
View article titled, High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps
Open the PDF for High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps in another window
Journal Articles

Development of optical system with rotational misalignment adjustment for multi-optical-probe confocal microscopy

Jiseok Lim, Myungki Jung, Seo Young Hwang, Shinill Kang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06F702 (2012)
https://doi.org/10.1116/1.4767639
Published: November 2012
View article titled, Development of optical system with rotational misalignment adjustment for multi-optical-probe confocal microscopy
Open the PDF for Development of optical system with rotational misalignment adjustment for multi-optical-probe confocal microscopy in another window
Journal Articles

Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography

Tobias Senn, Oliver Kutz, Christian Weniger, Junming Li, Max Schoengen, Heike Löchel, Johannes Wolf, Philipp Göttert, Bernd Löchel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 061601 (2011)
https://doi.org/10.1116/1.3644474
Published: October 2011
View article titled, Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography
Open the PDF for Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography in another window
Journal Articles

High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application

G. Kreindl, T. Glinsner, R. Miller, D. Treiblmayr, R. Födisch
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6M57–C6M62 (2010)
https://doi.org/10.1116/1.3518914
Published: December 2010
View article titled, High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application
Open the PDF for High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application in another window
Journal Articles

Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept

Paul Petric, Chris Bevis, Mark McCord, Allen Carroll, Alan Brodie, Upendra Ummethala, Luca Grella, Anthony Cheung, Regina Freed
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6C6–C6C13 (2010)
https://doi.org/10.1116/1.3511436
Published: November 2010
View article titled, Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept
Open the PDF for Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept in another window
Journal Articles

Multibeam scanning electron microscope: Experimental results

A. Mohammadi-Gheidari, C. W. Hagen, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6G5–C6G10 (2010)
https://doi.org/10.1116/1.3498749
Published: November 2010
View article titled, Multibeam scanning electron microscope: Experimental results
Open the PDF for Multibeam scanning electron microscope: Experimental results in another window
Journal Articles

Electron optics of microlenses with inclined beams

Y. Zhang, J. E. Barth, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 655–660 (2008)
https://doi.org/10.1116/1.2897321
Published: April 2008
View article titled, Electron optics of microlenses with inclined beams
Open the PDF for Electron optics of microlenses with inclined beams in another window
Journal Articles

High throughput defect detection with multiple parallel electron beams

H. M. P. van Himbergen, M. D. Nijkerk, P. W. H. de Jager, T. C. Hosman, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2521–2525 (2007)
https://doi.org/10.1116/1.2789449
Published: December 2007
View article titled, High throughput defect detection with multiple parallel electron beams
Open the PDF for High throughput defect detection with multiple parallel electron beams in another window
Journal Articles

Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Patrick P. Naulleau, Christopher N. Anderson, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Dimitra Niakoula, Bruno La Fontaine, Tom Wallow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2132–2135 (2007)
https://doi.org/10.1116/1.2781522
Published: December 2007
View article titled, Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
Open the PDF for Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool in another window
Journal Articles

High brightness 100-electron-beam source for high-resolution applications

Yanxia Zhang, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2239–2244 (2007)
https://doi.org/10.1116/1.2794073
Published: December 2007
View article titled, High brightness 100-electron-beam source for high-resolution applications
Open the PDF for High brightness 100-electron-beam source for high-resolution applications in another window
Journal Articles

Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool

Christopher N. Anderson, Patrick P. Naulleau, Paul Denham, Drew Kemp, Senajith Rekawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2151–2154 (2007)
https://doi.org/10.1116/1.2804610
Published: December 2007
View article titled, Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool
Open the PDF for Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool in another window
Journal Articles

Inspection of all beams in multielectron beam system

Sayaka Tanimoto, Masakazu Sugaya, Akihiro Furukawa, Yasunari Sohda, Masaki Hosoda, Yasuhiro Someda, Masato Muraki, Kenji Tamamori, Futoshi Hirose, Kenichi Nagae, Kazuhiko Kato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 380–386 (2007)
https://doi.org/10.1116/1.2647279
Published: March 2007
View article titled, Inspection of all beams in multielectron beam system
Open the PDF for Inspection of all beams in multielectron beam system in another window
Journal Articles

Optical properties of a multibeam column with a single-electron source

Osamu Kamimura, Sayaka Tanimoto, Hiroya Ohta, Yoshinori Nakayama, Makoto Sakakibara, Yasunari Sohda, Masato Muraki, Susumu Gotoh, Masaki Hosoda, Yasuhiro Someda, Kenji Tamamori, Futoshi Hirose, Kenichi Nagae, Kazuhiko Kato, Masahiko Okunuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 140–146 (2007)
https://doi.org/10.1116/1.2429674
Published: January 2007
View article titled, Optical properties of a multibeam column with a single-electron source
Open the PDF for Optical properties of a multibeam column with a single-electron source in another window
Journal Articles

Integrated multi-electron-beam blanker array for sub- 10 ‐ nm electron beam induced deposition

Yanxia Zhang, C. T. H Heerkens, M. J. van Bruggen, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2857–2860 (2006)
https://doi.org/10.1116/1.2366677
Published: November 2006
View article titled, Integrated multi-electron-beam blanker array for sub- 10 ‐ nm electron beam induced deposition
Open the PDF for Integrated multi-electron-beam blanker array for sub- 10 ‐ nm electron beam induced deposition in another window
Journal Articles

Coulomb blur in a multi-electron-beam system

Yasunari Sohda, Osamu Kamimura, Hiroya Ohta
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2761–2764 (2006)
https://doi.org/10.1116/1.2382948
Published: November 2006
View article titled, Coulomb blur in a multi-electron-beam system
Open the PDF for Coulomb blur in a multi-electron-beam system in another window
Journal Articles

Development of a multi-electron-beam source for sub- 10 nm electron beam induced deposition

M. J. van Bruggen, B. van Someren, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2833–2839 (2005)
https://doi.org/10.1116/1.2091087
Published: December 2005
View article titled, Development of a multi-electron-beam source for sub- 10 nm electron beam induced deposition
Open the PDF for Development of a multi-electron-beam source for sub- 10 nm electron beam induced deposition in another window
Journal Articles

New concept for high-throughput multielectron beam direct write system

Masato Muraki, Susumu Gotoh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 3061–3066 (2000)
https://doi.org/10.1116/1.1320798
Published: November 2000
View article titled, New concept for high-throughput multielectron beam direct write system
Open the PDF for New concept for high-throughput multielectron beam direct write system in another window