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Journal Articles

Aperiodic multilayer masks for M3D mitigation in high- and hyper-NA extreme ultraviolet lithography

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W. Ethan Maguire, Bruce W. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062601 (2024)
https://doi.org/10.1116/6.0003927
Published: September 2024
View articletitled, Aperiodic multilayer masks for M3D mitigation in high- and hyper-NA extreme ultraviolet lithography
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Journal Articles

Comparative study on variable axis lens systems based on tapered deflectors

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Qingmao Zhang, Qirui Wang, Delong Chen, Junbiao Liu, Yanjun Zhang, Quantong Li, Zhuming Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042801 (2024)
https://doi.org/10.1116/6.0003605
Published: June 2024
View articletitled, Comparative study on variable axis lens systems based on tapered deflectors
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Journal Articles

Accuracy requirements of the microarrayed Einzel lens

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Lixin Zhang, Yulu Zhang, Weixia Zhao, Junbiao Liu, Bohua Yin, Li Han
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 014203 (2022)
https://doi.org/10.1116/6.0001620
Published: January 2022
View articletitled, Accuracy requirements of the microarrayed Einzel lens
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Journal Articles

Multiple criteria optimization of electrostatic electron lenses using multiobjective genetic algorithms

Open Access
Neda Hesam Mahmoudi Nezhad, Mohamad Ghaffarian Niasar, Ali Mohammadi Gheidari, Pieter Kruit, Cornelis Wouter Hagen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062605 (2021)
https://doi.org/10.1116/6.0001274
Published: November 2021
View articletitled, Multiple criteria optimization of electrostatic electron lenses using multiobjective genetic algorithms
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Journal Articles

Ga-contamination-free scanning transmission electron microscope sample preparation by rectangular-shaped oxygen-ion-beam thinning using projection ion beam optical system

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Hiroyasu Shichi, Satoshi Tomimatsu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 054003 (2020)
https://doi.org/10.1116/6.0000297
Published: September 2020
View articletitled, Ga-contamination-free scanning transmission electron microscope sample preparation by rectangular-shaped oxygen-ion-beam thinning using projection ion beam optical system
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Journal Articles

Lithium ion beams from liquid metal alloy ion sources

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Wolfgang Pilz, Nico Klingner, Lothar Bischoff, Paul Mazarov, Sven Bauerdick
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 021802 (2019)
https://doi.org/10.1116/1.5086271
Published: March 2019
View articletitled, Lithium ion beams from liquid metal alloy ion sources
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Journal Articles

Analysis of multipole fields for a practical wire lens of an aberration corrector

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Tomonori Nakano, Yu Yamazawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 012901 (2019)
https://doi.org/10.1116/1.5065554
Published: December 2018
View articletitled, Analysis of multipole fields for a practical wire lens of an aberration corrector
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Journal Articles

Brightness measurements of the nano-aperture ion source

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Leon van Kouwen, Pieter Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06J901 (2018)
https://doi.org/10.1116/1.5048054
Published: October 2018
View articletitled, Brightness measurements of the nano-aperture ion source
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Journal Articles

Practical design of the electron gun for a microfocus x-ray source

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W. P. Li, P. F. Wang, J. B. Liu, W. X. Zhao, L. Han
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 061604 (2017)
https://doi.org/10.1116/1.5010897
Published: November 2017
View articletitled, Practical design of the electron gun for a microfocus x-ray source
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Journal Articles

Ultralow voltage imaging using a miniature electron beam column

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James Spallas, Dan Meisburger, Lawrence Muray
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KB02 (2016)
https://doi.org/10.1116/1.4965024
Published: October 2016
View articletitled, Ultralow voltage imaging using a miniature electron beam column
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Journal Articles

Novel electron monochromator for high resolution imaging and spectroscopy

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Marian Mankos, Khashayar Shadman, Vladimir Kolarik
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KP01 (2016)
https://doi.org/10.1116/1.4962383
Published: September 2016
View articletitled, Novel electron monochromator for high resolution imaging and spectroscopy
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Journal Articles

Development a projection ion beam instrument that uses a gas ion source for metal-contamination-free microsampling

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Hiroyasu Shichi, Satoshi Tomimatsu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 052203 (2016)
https://doi.org/10.1116/1.4961057
Published: September 2016
View articletitled, Development a projection ion beam instrument that uses a gas ion source for metal-contamination-free microsampling
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Journal Articles

High-brightness miniature column for high-speed multicolumn wafer inspection

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James Spallas, Dan Meisburger, Kurt Werder, Lawrence Muray
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FN03 (2015)
https://doi.org/10.1116/1.4935505
Published: November 2015
View articletitled, High-brightness miniature column for high-speed multicolumn wafer inspection
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Journal Articles

Low-energy scanning electron microscope using a monochromator with double-offset cylindrical lenses

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Takashi Ogawa, Boklae Cho, Sang Jung Ahn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FJ01 (2015)
https://doi.org/10.1116/1.4931933
Published: October 2015
View articletitled, Low-energy scanning electron microscope using a monochromator with double-offset cylindrical lenses
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Journal Articles

Proposed architecture of a multicolumn electron-beam wafer inspection system for high-volume manufacturing

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Dan Meisburger, James Spallas, Kurt Werder, Lawrence Muray
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FN01 (2015)
https://doi.org/10.1116/1.4931589
Published: September 2015
View articletitled, Proposed architecture of a multicolumn electron-beam wafer inspection system for high-volume manufacturing
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Journal Articles

Comparison of crystalline-silicon/amorphous-silicon interface prepared by plasma enhanced chemical vapor deposition and catalytic chemical vapor deposition

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Hideki Matsumura, Koichi Higashimine, Koichi Koyama, Keisuke Ohdaira
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031201 (2015)
https://doi.org/10.1116/1.4915494
Published: March 2015
View articletitled, Comparison of crystalline-silicon/amorphous-silicon interface prepared by plasma enhanced chemical vapor deposition and catalytic chemical vapor deposition
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Journal Articles

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

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Sudharshanan Raghunathan, Obert R. Wood, II, Pawitter Mangat, Erik Verduijn, Vicky Philipsen, Eric Hendrickx, Rik Jonckheere, Kenneth A. Goldberg, Markus P. Benk, Patrick Kearney, Zachary Levinson, Bruce W. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F801 (2014)
https://doi.org/10.1116/1.4901876
Published: November 2014
View articletitled, Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
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Journal Articles

Optical system for a multiple-beam scanning electron microscope

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Momoyo Enyama, Makoto Sakakibara, Sayaka Tanimoto, Hiroya Ohta
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 051801 (2014)
https://doi.org/10.1116/1.4891961
Published: August 2014
View articletitled, Optical system for a multiple-beam scanning electron microscope
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Journal Articles

Deflection properties of an electrostatic electron lens with a shifted electrode

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Aernout Christiaan Zonnevylle, Thomas Verduin, Cornelis W. Hagen, Pieter Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F702 (2013)
https://doi.org/10.1116/1.4826250
Published: October 2013
View articletitled, Deflection properties of an electrostatic electron lens with a shifted electrode
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Journal Articles

Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope

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Tetsuo Harada, Yusuke Tanaka, Takeo Watanabe, Hiroo Kinoshita, Youichi Usui, Tsuyoshi Amano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F605 (2013)
https://doi.org/10.1116/1.4826249
Published: October 2013
View articletitled, Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope
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