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Journal Articles

Scalable fabrication approach and fill factor optimization for single pixel microlens arrays

Featured
Jens Bonitz, Christian Helke, Nils Dittmar, Sebastian Schermer, Micha Haase, Lutz Hofmann, Danny Reuter
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062203 (2024)
https://doi.org/10.1116/6.0004036
Published: October 2024
View article titled, Scalable fabrication approach and fill factor optimization for single pixel microlens arrays
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Journal Articles

Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography

Henock Demessie Yallew, Jana Jágerská, Martin M. Greve
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012601 (2023)
https://doi.org/10.1116/6.0002187
Published: December 2022
View article titled, Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography
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Journal Articles

Amorphous Si/SiO2 distributed Bragg reflectors with transfer printed single-crystalline Si nanomembranes

Minkyu Cho, Jung-Hun Seo, Deyin Zhao, Jaeseong Lee, Kanglin Xiong, Xin Yin, Yonghao Liu, Shih-Chia Liu, Munho Kim, Tong J. Kim, Xudong Wang, Weidong Zhou, Zhenqiang Ma
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 040601 (2016)
https://doi.org/10.1116/1.4945998
Published: April 2016
View article titled, Amorphous Si/SiO<sub>2</sub> distributed Bragg reflectors with transfer printed single-crystalline Si nanomembranes
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Journal Articles

High-density pattern transfer via roll-to-roll ultraviolet nanoimprint lithography using replica mold

Jun Taniguchi, Hiroshi Yoshikawa, Go Tazaki, Toshiyuki Zento
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FB07 (2012)
https://doi.org/10.1116/1.4758922
Published: October 2012
View article titled, High-density pattern transfer via roll-to-roll ultraviolet nanoimprint lithography using replica mold
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Journal Articles

GaN-based light-emitting diodes with embedded air void arrays

Yue Shen, Shuguang Li, De-Shan Kuo, Shoou-Jinn Chang, Kin-Tak Lam, Kuo-Hsun Wen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 041207 (2012)
https://doi.org/10.1116/1.4730028
Published: June 2012
View article titled, GaN-based light-emitting diodes with embedded air void arrays
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Journal Articles

Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systems

Ciaran P. Moore, Richard J. Blaikie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06FH02 (2011)
https://doi.org/10.1116/1.3653511
Published: October 2011
View article titled, Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systems
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Journal Articles

In-process characterization tool for optically produced sub-100-nm structures

M. Z. Shaikh, S. Kieß, M. Grégoire, S. Simon, A. Tausendfreund, M. Zimmermann, G. Goch
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 051807 (2011)
https://doi.org/10.1116/1.3635404
Published: September 2011
View article titled, In-process characterization tool for optically produced sub-100-nm structures
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Journal Articles

Enhanced outcoupling of electroluminescence from ZnS : ErF 3 thin films by a photonic crystal

Evan Law, Mark Davidson, Nigel Shepherd, Paul H. Holloway
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 011003 (2011)
https://doi.org/10.1116/1.3521494
Published: January 2011
View article titled, Enhanced outcoupling of electroluminescence from ZnS : ErF 3 thin films by a photonic crystal
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Journal Articles

Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

Zhaoning Yu, Justin Hwu, Yongdong Liu, Zhenpeng Su, Henry Yang, Hongying Wang, Wei Hu, Yuan Xu, Nobuo Kurataka, Yautzong Hsu, Shifu Lee, Gene Gauzner, Kim Lee, David Kuo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6M130–C6M135 (2010)
https://doi.org/10.1116/1.3507888
Published: December 2010
View article titled, Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications
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Journal Articles

Nanostructure and optical properties of Si O 2 films prepared by reactive midfrenquency magnetron sputtering

Yongzhi Cao, Shen Dong, Tao Sun, Yongda Yan, Qingliang Zhao
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1378–1380 (2009)
https://doi.org/10.1116/1.3065993
Published: May 2009
View article titled, Nanostructure and optical properties of Si O 2 films prepared by reactive midfrenquency magnetron sputtering
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Journal Articles

Use of ion beam assisted deposition and low temperature annealing for the fabrication of low loss, vertically stacked alumina waveguide structures

J. R. Nightingale, R. Goswami, J. Duperre, J. M. Dawson, L. A. Hornak, D. Korakakis
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1813–1816 (2008)
https://doi.org/10.1116/1.2981080
Published: October 2008
View article titled, Use of ion beam assisted deposition and low temperature annealing for the fabrication of low loss, vertically stacked alumina waveguide structures
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Journal Articles

Impact of stray light depending on image quality: An approximation using total integrated scatter

Young-Chang Kim, Peter De Bisschop, Geert Vandenberghe, Luc Van Den Hove, Hanku Cho, Jootae Moon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2803–2807 (2006)
https://doi.org/10.1116/1.2357965
Published: November 2006
View article titled, Impact of stray light depending on image quality: An approximation using total integrated scatter
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Journal Articles

dc thermal plasma synthesis and properties of zinc oxide nanorods

Shih-Chieh Liao, Hsiu-Fen Lin, Sung-Wei Hung, Chen-Ti Hu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1322–1326 (2006)
https://doi.org/10.1116/1.2197513
Published: May 2006
View article titled, dc thermal plasma synthesis and properties of zinc oxide nanorods
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Journal Articles

Ultrahigh-aspect-ratio Si O 2 deeply etched periodic structures with smooth surfaces for photonics applications

K. Hosomi, T. Kikawa, S. Goto, H. Yamada, T. Katsuyama, Y. Arakawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1226–1229 (2006)
https://doi.org/10.1116/1.2194942
Published: April 2006
View article titled, Ultrahigh-aspect-ratio Si O 2 deeply etched periodic structures with smooth surfaces for photonics applications
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Journal Articles

Correction of stray-light-induced proximity effect by complementary double exposure in microlithography

Young-Chang Kim, Peter De Bisschop, Leonardus H. A. Leunissen, Geert Vandenberghe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 170–177 (2006)
https://doi.org/10.1116/1.2151224
Published: January 2006
View article titled, Correction of stray-light-induced proximity effect by complementary double exposure in microlithography
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Journal Articles

Simulation of air bubble scattering effects in 193 nm immersion interferometric lithography

C. H. Lin, L. A. Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2684–2693 (2005)
https://doi.org/10.1116/1.2134716
Published: December 2005
View article titled, Simulation of air bubble scattering effects in 193 nm immersion interferometric lithography
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Journal Articles

Bubbles in immersion lithography

M. Switkes, M. Rothschild, T. A. Shedd, H. B. Burnett, M. S. Yeung
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2409–2412 (2005)
https://doi.org/10.1116/1.2122747
Published: November 2005
View article titled, Bubbles in immersion lithography
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Journal Articles

Dynamically ordered thin film nanoclusters

Wei Zhang, Chi Zhang, Ramki Kalyanaraman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, L5–L8 (2005)
https://doi.org/10.1116/1.1941207
Published: July 2005
View article titled, Dynamically ordered thin film nanoclusters
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Journal Articles

Uniformity measurement of electron emission from carbon nanotubes using electron-beam resist

J. H. Lee, S. H. Lee, W. S. Kim, H. J. Lee, J. N. Heo, T. W. Jeong, C. H. Choi, J. M. Kim, J. H. Park, J. S. Ha, H. J. Lee, J. W. Moon, M. A. Yoo, J. W. Nam, S. H. Cho, T. I. Yoon, B. S. Kim, D. H. Choe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 718–722 (2005)
https://doi.org/10.1116/1.1861036
Published: April 2005
View article titled, Uniformity measurement of electron emission from carbon nanotubes using electron-beam resist
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Journal Articles

Investigation of nodule growth in ion beam sputtered Mo ∕ Si multilayers

E. Quesnel, J. Hue, V. Muffato, C. Pellé, P. Lamy
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2353–2358 (2004)
https://doi.org/10.1116/1.1788677
Published: October 2004
View article titled, Investigation of nodule growth in ion beam sputtered Mo ∕ Si multilayers
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