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Journal Articles

Micromirror fabrication for co-packaged optics using 3D nanoimprint technology

Fumi Nakamura, Kenta Suzuki, Akihiro Noriki, Takeru Amano

J. Vac. Sci. Technol. B 40, 063203 (2022)

https://doi.org/10.1116/6.0002119

Published: November 2022

View articletitled, Micromirror fabrication for co-packaged optics using 3D nanoimprint technology

Journal Articles

Ultra-compact, high-yield intra-cavity contacts for GaAs/AlGaAs-based vertical-cavity surface-emitting lasers

Chin-Han Lin, Brian J. Thibeault, Yan Zheng, Mark J. W. Rodwell, Larry A. Coldren, Alok Mehta, Anis Husain

J. Vac. Sci. Technol. B 31, 011205 (2013)

https://doi.org/10.1116/1.4769856

Published: December 2012

View articletitled, Ultra-compact, high-yield intra-cavity contacts for GaAs/AlGaAs-based vertical-cavity surface-emitting lasers

Journal Articles

Electron beam direct write of chalcogenide glass integrated optics

Galen B. Hoffman, Ronald M. Reano

J. Vac. Sci. Technol. B 30, 06F301 (2012)

https://doi.org/10.1116/1.4748567

Published: August 2012

View articletitled, Electron beam direct write of chalcogenide glass integrated optics

Journal Articles

Photonic crystal structures with ultrahigh aspect ratio in lithium niobate fabricated by focused ion beam milling

Guangyuan Si, Aaron J. Danner, Siew Lang Teo, Ee Jin Teo, Jinghua Teng, Andrew A. Bettiol

J. Vac. Sci. Technol. B 29, 021205 (2011)

https://doi.org/10.1116/1.3557027

Published: March 2011

View articletitled, Photonic crystal structures with ultrahigh aspect ratio in lithium niobate fabricated by focused ion beam milling

Journal Articles

Advanced silicon processing for active planar photonic devices

Michael Shearn, Kenneth Diest, Xiankai Sun, Avi Zadok, Harry Atwater, Amnon Yariv, Axel Scherer

J. Vac. Sci. Technol. B 27, 3180–3182 (2009)

https://doi.org/10.1116/1.3256649

Published: December 2009

View articletitled, Advanced silicon processing for active planar photonic devices

Journal Articles

In Ga As P ∕ In P buried-heterostructure laser diodes grown on InP using molecular beam epitaxy and metal-organic chemical vapor deposition

G. W. Pickrell, H. L. Zhang, H. W. Ren, D. Zhang, Q. Xue, K. A. Anselm, W. Y. Hwang

J. Vac. Sci. Technol. B 26, 1157–1159 (2008)

https://doi.org/10.1116/1.2837840

Published: May 2008

View articletitled, In Ga As P ∕ In P buried-heterostructure laser diodes grown on InP using molecular beam epitaxy and metal-organic chemical vapor deposition

Journal Articles

Low bias reactive ion etching of GaAs with a Si Cl 4 ∕ N 2 ∕ O 2 time-multiplexed process

S. Golka, S. Schartner, W. Schrenk, G. Strasser

J. Vac. Sci. Technol. B 25, 839–844 (2007)

https://doi.org/10.1116/1.2737439

Published: May 2007

View articletitled, Low bias reactive ion etching of GaAs with a Si Cl 4 ∕ N 2 ∕ O 2 time-multiplexed process

Journal Articles

Wafer-scale fabrication of polymer distributed feedback lasers

M. B. Christiansen, M. Schøler, S. Balslev, R. B. Nielsen, D. H. Petersen, A. Kristensen

J. Vac. Sci. Technol. B 24, 3252–3257 (2006)

https://doi.org/10.1116/1.2387154

Published: December 2006

View articletitled, Wafer-scale fabrication of polymer distributed feedback lasers

Journal Articles

Replication of diffractive-optical arrays via photocurable nanoimprint lithography

Matthias D. Galus, Euclid Moon, Henry I. Smith, Rajesh Menon

J. Vac. Sci. Technol. B 24, 2960–2963 (2006)

https://doi.org/10.1116/1.2363401

Published: November 2006

View articletitled, Replication of diffractive-optical arrays via photocurable nanoimprint lithography

Journal Articles

Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

B. Bilenberg, M. Hansen, D. Johansen, V. Özkapici, C. Jeppesen, P. Szabo, I. M. Obieta, O. Arroyo, J. O. Tegenfeldt, A. Kristensen

J. Vac. Sci. Technol. B 23, 2944–2949 (2005)

https://doi.org/10.1116/1.2091089

Published: December 2005

View articletitled, Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

Journal Articles

Plasma silicon oxide–silica xerogel based planar optical waveguides

Shom S. Ponoth, Navnit T. Agarwal, Peter D. Persans, Joel L. Plawsky

J. Vac. Sci. Technol. B 22, 902–908 (2004)

https://doi.org/10.1116/1.1701847

Published: April 2004

View articletitled, Plasma silicon oxide–silica xerogel based planar optical waveguides

Journal Articles

Fabrication of three-dimensional mode converters for silicon-based integrated optics

M. Fritze, J. Knecht, C. Bozler, C. Keast, J. Fijol, S. Jacobson, P. Keating, J. LeBlanc, E. Fike, B. Kessler, M. Frish, C. Manolatou

J. Vac. Sci. Technol. B 21, 2897–2902 (2003)

https://doi.org/10.1116/1.1625967

Published: December 2003

View articletitled, Fabrication of three-dimensional mode converters for silicon-based integrated optics

Journal Articles

Selective and deep plasma etching of SiO 2 : Comparison between different fluorocarbon gases ( CF 4 , C 2 F 6 , CHF 3 ) mixed with CH 4 or H 2 and influence of the residence time

F. Gaboriau, G. Cartry, M-C. Peignon, Ch. Cardinaud

J. Vac. Sci. Technol. B 20, 1514–1521 (2002)

https://doi.org/10.1116/1.1495502

Published: August 2002

View articletitled, Selective and deep plasma etching of SiO 2 : Comparison between different fluorocarbon gases ( CF 4 , C 2 F 6 , CHF 3 ) mixed with CH 4 or H 2 and influence of the residence time

Journal Articles

Determination of the indices of refraction of molecular-beam-epitaxy-grown ZnSe/ZnCdSe multiple-quantum-well structures

F. C. Peiris, U. Bindley, J. K. Furdyna

J. Vac. Sci. Technol. B 19, 1497–1500 (2001)

https://doi.org/10.1116/1.1386381

Published: July 2001

View articletitled, Determination of the indices of refraction of molecular-beam-epitaxy-grown ZnSe/ZnCdSe multiple-quantum-well structures

Journal Articles

Precise and efficient ex situ technique for determining compositions and growth rates in molecular-beam epitaxy grown semiconductor alloys

F. C. Peiris, S. Lee, U. Bindley, J. K. Furdyna

J. Vac. Sci. Technol. B 18, 1443–1447 (2000)

https://doi.org/10.1116/1.591400

Published: May 2000

View articletitled, Precise and efficient ex situ technique for determining compositions and growth rates in molecular-beam epitaxy grown semiconductor alloys

Journal Articles

Buried heterostructure complex-coupled distributed feedback 1.55 μm lasers fabricated using dry etching processes and quaternary layer overgrowth

D. Söderström, S. Lourdudoss, C.-F. Carlström, S. Anand, M. Kahn, M. Kamp

J. Vac. Sci. Technol. B 17, 2622–2625 (1999)

https://doi.org/10.1116/1.591035

Published: November 1999

View articletitled, Buried heterostructure complex-coupled distributed feedback 1.55 μm lasers fabricated using dry etching processes and quaternary layer overgrowth

Journal Articles

Focused ion beam implantation for opto- and microelectronic devices

H. König, N. Mais, E. Höfling, J. P. Reithmaier, A. Forchel, H. Müssig, H. Brugger

J. Vac. Sci. Technol. B 16, 2562–2566 (1998)

https://doi.org/10.1116/1.590210

Published: July 1998

View articletitled, Focused ion beam implantation for opto- and microelectronic devices

Journal Articles

Fabrication and investigation of nanostructures and their application in new laser devices

U. A. Griesinger, S. Kronmüller, M. Geiger, D. Ottenwälder, F. Scholz, H. Schweizer

J. Vac. Sci. Technol. B 14, 4058–4061 (1996)

https://doi.org/10.1116/1.588644

Published: November 1996

View articletitled, Fabrication and investigation of nanostructures and their application in new laser devices

Journal Articles

Resist planarization over topography using ion implantation

Vincent V. Wong, Anto Yasaka, Henry I. Smith

J. Vac. Sci. Technol. B 13, 2797–2800 (1995)

https://doi.org/10.1116/1.588268

Published: November 1995

View articletitled, Resist planarization over topography using ion implantation

Journal Articles

First‐order gain‐coupled (Ga,In)As/(Al,Ga)As distributed feedback lasers by focused ion beam implantation and in situ overgrowth

Andreas Orth, Johann Peter Reithmaier, Frank Faller, Alfred Forchel

J. Vac. Sci. Technol. B 13, 2714–2717 (1995)

https://doi.org/10.1116/1.588250

Published: November 1995

View articletitled, First‐order gain‐coupled (Ga,In)As/(Al,Ga)As distributed feedback lasers by focused ion beam implantation and in situ overgrowth

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Micromirror fabrication for co-packaged optics using 3D nanoimprint technology

Ultra-compact, high-yield intra-cavity contacts for GaAs/AlGaAs-based vertical-cavity surface-emitting lasers

Electron beam direct write of chalcogenide glass integrated optics

Photonic crystal structures with ultrahigh aspect ratio in lithium niobate fabricated by focused ion beam milling

Advanced silicon processing for active planar photonic devices

In Ga As P ∕ In P buried-heterostructure laser diodes grown on InP using molecular beam epitaxy and metal-organic chemical vapor deposition

Low bias reactive ion etching of GaAs with a Si Cl 4 ∕ N 2 ∕ O 2 time-multiplexed process

Wafer-scale fabrication of polymer distributed feedback lasers

Replication of diffractive-optical arrays via photocurable nanoimprint lithography

Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

Plasma silicon oxide–silica xerogel based planar optical waveguides

Fabrication of three-dimensional mode converters for silicon-based integrated optics

Selective and deep plasma etching of SiO 2 : Comparison between different fluorocarbon gases ( CF 4 , C 2 F 6 , CHF 3 ) mixed with CH 4 or H 2 and influence of the residence time

Determination of the indices of refraction of molecular-beam-epitaxy-grown ZnSe/ZnCdSe multiple-quantum-well structures

Precise and efficient ex situ technique for determining compositions and growth rates in molecular-beam epitaxy grown semiconductor alloys

Buried heterostructure complex-coupled distributed feedback 1.55 μm lasers fabricated using dry etching processes and quaternary layer overgrowth

Focused ion beam implantation for opto- and microelectronic devices

Fabrication and investigation of nanostructures and their application in new laser devices

Resist planarization over topography using ion implantation

First‐order gain‐coupled (Ga,In)As/(Al,Ga)As distributed feedback lasers by focused ion beam implantation and in situ overgrowth

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