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Journal Articles

Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability

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Mandy Grube, Benjamin Schille, Matthias Schirmer, Maik Gerngroß, Uwe Hübner, Paul Voigt, Sascha Brose
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 012602 (2021)
https://doi.org/10.1116/6.0000542
Published: January 2021
View articletitled, Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability
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Journal Articles

E-beam lithography using dry powder resist of hydrogen silsesquioxane having long shelf life

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Jiashi Shen, Ferhat Aydinoglu, Mohammad Soltani, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 021601 (2019)
https://doi.org/10.1116/1.5079657
Published: February 2019
View articletitled, E-beam lithography using dry powder resist of hydrogen silsesquioxane having long shelf life
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Journal Articles

Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat

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Daron A. Westly, Donald M. Tennant, Yukinori Aida, Hirofumi Ohki, Takashi Ohkubo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06FJ02 (2011)
https://doi.org/10.1116/1.3660788
Published: December 2011
View articletitled, Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat
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Journal Articles

Path to achieve sub-10-nm half-pitch using electron beam lithography

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A. Tavakkoli K. G., S. N. Piramanayagam, M. Ranjbar, R. Sbiaa, T. C. Chong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 011035 (2011)
https://doi.org/10.1116/1.3532938
Published: January 2011
View articletitled, Path to achieve sub-10-nm half-pitch using electron beam lithography
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Journal Articles

High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors

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Richard A. Lawson, Laren M. Tolbert, Clifford L. Henderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6S12–C6S18 (2010)
https://doi.org/10.1116/1.3511790
Published: November 2010
View articletitled, High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors
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Journal Articles

Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography

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Vadim Sidorkin, Emile van der Drift, Huub Salemink
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2049–2053 (2008)
https://doi.org/10.1116/1.2987965
Published: December 2008
View articletitled, Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography
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Journal Articles

The effects of molecular weight on the exposure characteristics of poly(methylmethacrylate) developed at low temperatures

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M. Yan, S. Choi, K. R. V. Subramanian, I. Adesida
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2306–2310 (2008)
https://doi.org/10.1116/1.3002562
Published: December 2008
View articletitled, The effects of molecular weight on the exposure characteristics of poly(methylmethacrylate) developed at low temperatures
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Journal Articles

Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation

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Raghunath Murali, Devin Brown, Kevin P. Martin, James D. Meindl
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2064–2067 (2007)
https://doi.org/10.1116/1.2794070
Published: December 2007
View articletitled, Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation
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Journal Articles

Influence of temperature on HSQ electron-beam lithography

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M. Häffner, A. Haug, A. Heeren, M. Fleischer, H. Peisert, T. Chassé, D. P. Kern
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2045–2048 (2007)
https://doi.org/10.1116/1.2794324
Published: December 2007
View articletitled, Influence of temperature on HSQ electron-beam lithography
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Journal Articles

Process optimization and proximity effect correction for gray scale e-beam lithography

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Raghunath Murali, Devin K. Brown, Kevin P. Martin, James D. Meindl
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2936–2939 (2006)
https://doi.org/10.1116/1.2357962
Published: November 2006
View articletitled, Process optimization and proximity effect correction for gray scale e-beam lithography
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Journal Articles

Synthesis, characterization, and investigation of a conformationally immobile calix[6]arene as a negative electron beam resist

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Gabriel H. Monreal, Sara J. Staggs, Michael T. Blanda, Wilhelmus J. Geerts, Heather C. Galloway, Gregory F. Spencer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 1998–2002 (2005)
https://doi.org/10.1116/1.2038027
Published: September 2005
View articletitled, Synthesis, characterization, and investigation of a conformationally immobile calix[6]arene as a negative electron beam resist
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Journal Articles

Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography

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Ivan Junarsa, Mark P. Stoykovich, Paul F. Nealey, Yuansheng Ma, Franco Cerrina, Harun H. Solak
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 138–143 (2005)
https://doi.org/10.1116/1.1849213
Published: January 2005
View articletitled, Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography
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Journal Articles

Inspection of templates for imprint lithography

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Harald F. Hess, Don Pettibone, David Adler, Kirk Bertsche, Kevin J. Nordquist, David P. Mancini, William J. Dauksher, Douglas J. Resnick
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3300–3305 (2004)
https://doi.org/10.1116/1.1813456
Published: December 2004
View articletitled, Inspection of templates for imprint lithography
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Journal Articles

Delay-time and aging effects on contrast and sensitivity of hydrogen silsesquioxane

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Falco C. M. J. M. van Delft
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 2932–2936 (2002)
https://doi.org/10.1116/1.1524980
Published: December 2002
View articletitled, Delay-time and aging effects on contrast and sensitivity of hydrogen silsesquioxane
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Journal Articles

Imaging dissolution rate monitor: Mapping the photoresist response

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Monroe Sullivan, James W. Taylor
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 11, 2818–2822 (1993)
https://doi.org/10.1116/1.586608
Published: November 1993
View articletitled, Imaging dissolution rate monitor: Mapping the photoresist response
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Journal Articles

Contrast and sensitivity enhancement of resists for high‐resolution lithography

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Kaolin Grace Chiong, Karen Petrillo, Fritz J. Hohn, Alan D. Wilson, Wayne M. Moreau
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 2238–2244 (1988)
https://doi.org/10.1116/1.584089
Published: November 1988
View articletitled, Contrast and sensitivity enhancement of resists for high‐resolution lithography
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Journal Articles

The percolation approach to the development of pulsed laser exposed positive photoresists

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A. L. Bogdanov, K. A. Valiev, L. V. Velikov, D. Yu. Zaroslov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 5, 391–395 (1987)
https://doi.org/10.1116/1.583911
Published: January 1987
View articletitled, The percolation approach to the development of pulsed laser exposed positive photoresists
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