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Journal Articles

Line wiggling due to plasma-induced film stress and prevention by surface roughness modification

Amelia Turnquist, Naoyuki Kofuji, Joseph Sebastian, Hiroshi Kou, Takahiro Arai, Hideaki Fukuda, Yoann Tomczak, Yiting Sun, Daniele Piumi, David De Roest
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 012203 (2025)
https://doi.org/10.1116/6.0004116
Published: January 2025
View article titled, Line wiggling due to plasma-induced film stress and prevention by surface roughness modification
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Journal Articles

Fabrication of double-grooved gratings using coplanar multibeam holographic lithography with a phase mask

Featured
Shiyang Li, Shuhu Huan, Tao Ren, Ying Liu, Yilin Hong, Shaojun Fu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062603 (2024)
https://doi.org/10.1116/6.0003946
Published: November 2024
View article titled, Fabrication of double-grooved gratings using coplanar multibeam holographic lithography with a phase mask
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Journal Articles

Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching

Dong Zhang, Wenhan Hu, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 053001 (2024)
https://doi.org/10.1116/6.0003711
Published: August 2024
View article titled, Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching
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Journal Articles

Lithography mask thermal and stress effect for the machine overlay compensation

Dinghai Rui, Libin Zhang, Hao Shen, Huwen Ding, Shuang Liu, Yayi Wei, Yajuan Su
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042601 (2024)
https://doi.org/10.1116/6.0003693
Published: July 2024
View article titled, Lithography mask thermal and stress effect for the machine overlay compensation
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Journal Articles

Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch

Renqiang Kang, Aixi Pan, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 033002 (2024)
https://doi.org/10.1116/6.0003516
Published: April 2024
View article titled, Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch
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Journal Articles

Cryogenic etching of positively tapered silicon pillars with controllable profiles

Xiaoli Zhu, Aixi Pan, Babak Shokouhi, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 032206 (2024)
https://doi.org/10.1116/6.0003372
Published: April 2024
View article titled, Cryogenic etching of positively tapered silicon pillars with controllable profiles
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Journal Articles

High-efficiency metalenses for zone-plate-array lithography

Henry I. Smith, Mark Mondol, Feng Zhang, Timothy Savas, Michael Walsh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062601 (2023)
https://doi.org/10.1116/6.0003024
Published: September 2023
View article titled, High-efficiency metalenses for zone-plate-array lithography
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Journal Articles

Generalized performance optimization for massively-parallel electron-beam systems

Soo-Young Lee, Md Nabid Hasan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 042603 (2023)
https://doi.org/10.1116/6.0002653
Published: June 2023
View article titled, Generalized performance optimization for massively-parallel electron-beam systems
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Journal Articles

Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)

Deepak Kumar, Krishnaroop Chaudhuri, Joseph W. Brill, Jonathan T. Pham, J. Todd Hastings
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012604 (2023)
https://doi.org/10.1116/6.0002118
Published: January 2023
View article titled, Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)
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Journal Articles

Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography

Henock Demessie Yallew, Jana Jágerská, Martin M. Greve
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012601 (2023)
https://doi.org/10.1116/6.0002187
Published: December 2022
View article titled, Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography
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Journal Articles

Micromirror fabrication for co-packaged optics using 3D nanoimprint technology

Editor’s Pick
Fumi Nakamura, Kenta Suzuki, Akihiro Noriki, Takeru Amano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 063203 (2022)
https://doi.org/10.1116/6.0002119
Published: November 2022
View article titled, Micromirror fabrication for co-packaged optics using 3D nanoimprint technology
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Journal Articles

Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography

Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062602 (2022)
https://doi.org/10.1116/6.0002099
Published: November 2022
View article titled, Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography
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Includes: Supplementary data
Journal Articles

Volatile vapor knife of immersion lithography hood using solutal Marangoni effect

Editor’s Pick
Junil Ryu, Gilgu Lee, Won Ki Lee, Jong Min Yoon, Namil Koo, Hyoungsoo Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 052601 (2022)
https://doi.org/10.1116/5.0100753
Published: September 2022
View article titled, Volatile vapor knife of immersion lithography hood using solutal Marangoni effect
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Journal Articles

Theoretical research on suppression ratio of dynamic gas lock for extreme ultraviolet lithography contamination control

Jiazheng Sun, Kuibo Wang, Xiaobin Wu, Yan Luo, Jinbin Ding
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 042603 (2022)
https://doi.org/10.1116/6.0001852
Published: June 2022
View article titled, Theoretical research on suppression ratio of dynamic gas lock for extreme ultraviolet lithography contamination control
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Journal Articles

Stochastic defect removal coating for high-performance extreme ultraviolet lithography

Young Joo Choi, Ran Namgung, Jun Soo Kim, Dae Seok Song, Hyeon Park, Shin-hyo Bae, Min-Ki Chon, Min Soo Kim, Hyun-Ji Song, Hyun-Woo Kim, Suk Koo Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 042602 (2022)
https://doi.org/10.1116/6.0001723
Published: May 2022
View article titled, Stochastic defect removal coating for high-performance extreme ultraviolet lithography
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Journal Articles

Atomic-resolution lithography with an on-chip scanning tunneling microscope

Editor’s Pick
Afshin Alipour, Emma L. Fowler, S. O. Reza Moheimani, James H. G. Owen, John N. Randall
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 030603 (2022)
https://doi.org/10.1116/6.0001826
Published: April 2022
View article titled, Atomic-resolution lithography with an on-chip scanning tunneling microscope
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Journal Articles

Analysis of diffraction-based wafer alignment rejection for thick aluminum process

Liang Li, Chao Chen, Hui Zeng, Shiyi Hu, Libin Zhang, Yajuan Su, Yayi Wei, Tianchun Ye, Yun Wang, Jing Xue
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022603 (2022)
https://doi.org/10.1116/6.0001666
Published: March 2022
View article titled, Analysis of diffraction-based wafer alignment rejection for thick aluminum process
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Journal Articles

Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research

Mario Baum, Christoph Meinecke, Thomas Blaudeck, Christian Helke, Danny Reuter, Karla Hiller, Sascha Hermann, Stefan E. Schulz, Harald Kuhn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062805 (2021)
https://doi.org/10.1116/6.0001299
Published: November 2021
View article titled, Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research
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Journal Articles

100 keV vacuum sealed field emission gun for high resolution electron microscopy

Mohamed M. El-Gomati, Torquil Wells, Xiaoping Zha, Richard Sykes, Christopher J. Russo, Richard Henderson, Greg McMullan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062804 (2021)
https://doi.org/10.1116/6.0001275
Published: November 2021
View article titled, 100 keV vacuum sealed field emission gun for high resolution electron microscopy
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Journal Articles

Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers

Nadine Gerges, Camille Petit-Etienne, Marie Panabière, Jumana Boussey, Yann Ferrec, Cécile Gourgon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062602 (2021)
https://doi.org/10.1116/6.0001273
Published: October 2021
View article titled, Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers
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