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Journal Articles

Optical and electronic properties of Ge1−xSnx/Si alloys grown by remote plasma-enhanced chemical vapor deposition

Kevin K. Choe, Daniel Felker, Bruce Claflin, Gordon Grzybowski, Christina L. Dugan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 052208 (2024)
https://doi.org/10.1116/6.0003759
Published: August 2024
View article titled, Optical and electronic properties of Ge<sub>1−<em>x</em></sub>Sn<em><sub>x</sub></em>/Si alloys grown by remote plasma-enhanced chemical vapor deposition
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Journal Articles

Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates

Editor’s Pick
B. Claflin, G. J. Grzybowski, S. Zollner, B. R. Rogers, T. A. Cooper, D. C. Look
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 052204 (2024)
https://doi.org/10.1116/6.0003689
Published: August 2024
View article titled, Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates
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Journal Articles

Study on geometry-dependent n+-InGaN regrowth via MOCVD for AlN/GaN ohmic contact application

Editor’s Pick
Yu-Xi Zhou, Jie-Jie Zhu, Jing-Shu Guo, Ling-Jie Qin, Bo-Wen Zhang, Meng-Di Li, Ming-Chen Zhang, Xiao-Hua Ma
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 052201 (2024)
https://doi.org/10.1116/6.0003690
Published: August 2024
View article titled, Study on geometry-dependent n<sup>+</sup>-InGaN regrowth via MOCVD for AlN/GaN ohmic contact application
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Journal Articles

Honeycomb-shaped vertically aligned carbon nanotubes decorated with molybdenum trioxide as an electrochemical sensor for glucose

Editor’s Pick
Lei Hu, Yu-Chiao Huang, Yung-Jui Huang, Pao-Hung Lin, Huan-Chun Wang, Kuei-Yi Lee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 044005 (2024)
https://doi.org/10.1116/6.0003677
Published: July 2024
View article titled, Honeycomb-shaped vertically aligned carbon nanotubes decorated with molybdenum trioxide as an electrochemical sensor for glucose
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Journal Articles

X-ray photoelectron spectroscopy surface oxidation study of remote plasma-enhanced chemical vapor deposition-grown Ge1−xSnx/Si alloys

Kevin Choe, Jeremy Hunter, Christopher Sutphin, Daniel Felker, Bruce Claflin, Gordon Grzybowski, Christina Dugan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042207 (2024)
https://doi.org/10.1116/6.0003688
Published: July 2024
View article titled, X-ray photoelectron spectroscopy surface oxidation study of remote plasma-enhanced chemical vapor deposition-grown Ge<sub>1−x</sub>Sn<sub>x</sub>/Si alloys
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Journal Articles

In situ mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes

Joshua M. Grant, Enbo Yang, Narges Masoumi, Alexander Golden, Joe Margetis, Andrew Chizmeshya, Wei Du, Shui-Qing Yu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 044002 (2024)
https://doi.org/10.1116/6.0003566
Published: June 2024
View article titled, <em>In situ</em> mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes
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Journal Articles

Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods

X. Huang, S. Q. Lim, T. Ratcliff, L. A. Smillie, G. J. Grzybowski, B. B. Claflin, J. M. Warrender, J. S. Williams
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 044001 (2024)
https://doi.org/10.1116/6.0003668
Published: June 2024
View article titled, Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods
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Journal Articles

Use of plasma process diagnostic sensors for the monitoring of in situ dry cleaning of plasma enhanced chemical vapor deposition chamber

Young Min You, Ji Seok Lee, Min Ho Kim, Sang Jeen Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042203 (2024)
https://doi.org/10.1116/6.0003288
Published: June 2024
View article titled, Use of plasma process diagnostic sensors for the monitoring of <em>in situ</em> dry cleaning of plasma enhanced chemical vapor deposition chamber
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Journal Articles

Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen

Ahmad Reza Rastkar, Mehdi Sadri Kandjani
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034006 (2024)
https://doi.org/10.1116/6.0003483
Published: May 2024