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Journal Articles

Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers

Hryhorii Stanchu, Abdulla Said, Oluwatobi Olorunsola, Sudip Acharya, Sylvester Amoah, Mohammad Zamani-Alavijeh, Fernando M. de Oliveira, Santosh Karki Chhetri, Jin Hu, Yuriy I. Mazur, Shui-Qing Yu, Gregory Salamo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052208 (2023)
https://doi.org/10.1116/6.0002957
Published: September 2023
View article titled, Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers
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Journal Articles

Plasma processing and annealing for defect management at SiO2/Si interface

Shota Nunomura, Takayoshi Tsutsumi, Isao Sakata, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052202 (2023)
https://doi.org/10.1116/6.0002822
Published: August 2023
View article titled, Plasma processing and annealing for defect management at SiO<sub>2</sub>/Si interface
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Journal Articles

Practical guide for in-house solid-state nanopore fabrication and characterization

Anumol Dominic, Muhammad Sajeer Parambath, Simran Nasa, Manoj Varma
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043204 (2023)
https://doi.org/10.1116/6.0002682
Published: July 2023
View article titled, Practical guide for in-house solid-state nanopore fabrication and characterization
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Journal Articles

Deposition and morphology of direct current plasma-polymerized aniline

Sidney M. Palardonio, Magdaleno R. Vasquez, Jr.
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034201 (2023)
https://doi.org/10.1116/6.0002497
Published: March 2023
View article titled, Deposition and morphology of direct current plasma-polymerized aniline
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Journal Articles

Understanding plasma enhanced chemical vapor deposition mechanisms in tetraethoxysilane-based plasma

Hu Li, Koichi Ishii, Shun Sasaki, Mao Kamiyama, Akinori Oda, Kazuki Denpoh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022208 (2023)
https://doi.org/10.1116/6.0002409
Published: March 2023
View article titled, Understanding plasma enhanced chemical vapor deposition mechanisms in tetraethoxysilane-based plasma
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Includes: Supplementary data
Journal Articles

Solar-thermal cold-wall chemical vapor deposition reactor design and characterization for graphene synthesis

Abdalla Alghfeli, Mostafa Abuseada, Timothy S. Fisher
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 064205 (2022)
https://doi.org/10.1116/6.0002091
Published: November 2022
View article titled, Solar-thermal cold-wall chemical vapor deposition reactor design and characterization for graphene synthesis
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Journal Articles

Spectro-ellipsometric probing of wetting, nucleation, and dot/island formation during photo-excited chemical vapor deposition of Ge on SiO2 substrate

Housei Akazawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062204 (2022)
https://doi.org/10.1116/6.0002067
Published: October 2022
View article titled, Spectro-ellipsometric probing of wetting, nucleation, and dot/island formation during photo-excited chemical vapor deposition of Ge on SiO<sub>2</sub> substrate
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Journal Articles

Selectively patterned Mg-doped GaN by SiNx-driven hydrogen injection

Hyun-Soo Lee, Mohammad Wahidur Rahman, Darpan Verma, Violet M. Poole, Roberto C. Myers, Matthew D. McCluskey, Siddharth Rajan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062201 (2022)
https://doi.org/10.1116/6.0002029
Published: October 2022
View article titled, Selectively patterned Mg-doped GaN by SiN<sub>x</sub>-driven hydrogen injection
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Journal Articles

Observation of interfacial strain relaxation and electron beam damage thresholds in Al0.3In0.7N/GaN heterostructures by transmission electron microscopy

Keisuke Motoki, Zachary Engel, Christopher M. Matthews, Habib Ahmad, Timothy M. McCrone, Kohei Harada, W. Alan Doolittle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 052210 (2022)
https://doi.org/10.1116/6.0001974
Published: September 20