1-20 of 854
Electron-beam lithography
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

High-efficiency metalenses for zone-plate-array lithography

Henry I. Smith, Mark Mondol, Feng Zhang, Timothy Savas, Michael Walsh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062601 (2023)
https://doi.org/10.1116/6.0003024
Published: September 2023
View article titled, High-efficiency metalenses for zone-plate-array lithography
Open the PDF for High-efficiency metalenses for zone-plate-array lithography in another window
Journal Articles

Fabrication of plasmonic Au nanostructures on dielectric supports using 10 keV electron beam lithography and tests for SERS biodetection

Haseeb Ahmed, Min Wu, Maria Stepanova
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022202 (2023)
https://doi.org/10.1116/6.0002108
Published: February 2023
View article titled, Fabrication of plasmonic Au nanostructures on dielectric supports using 10 keV electron beam lithography and tests for SERS biodetection
Open the PDF for Fabrication of plasmonic Au nanostructures on dielectric supports using 10 keV electron beam lithography and tests for SERS biodetection in another window
Includes: Supplementary data
Journal Articles

Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays

Aixi Pan, Medhat Samaan, Zheng Yan, Wenhan Hu, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 023001 (2023)
https://doi.org/10.1116/6.0002276
Published: January 2023
View article titled, Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays
Open the PDF for Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays in another window
Journal Articles

A novel thermionic crystal electron emission effect similar to Kikuchi lines

Victor Katsap
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 010602 (2023)
https://doi.org/10.1116/6.0002375
Published: January 2023
View article titled, A novel thermionic crystal electron emission effect similar to Kikuchi lines
Open the PDF for A novel thermionic crystal electron emission effect similar to Kikuchi lines in another window
Journal Articles

Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography

S. Ghotbi, S. Mohammadi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 013202 (2023)
https://doi.org/10.1116/6.0002295
Published: December 2022
View article titled, Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography
Open the PDF for Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography in another window
Journal Articles

Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography

Henock Demessie Yallew, Jana Jágerská, Martin M. Greve
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012601 (2023)
https://doi.org/10.1116/6.0002187
Published: December 2022
View article titled, Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography
Open the PDF for Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography in another window
Journal Articles

Trilayer process for T-gate and Γ-gate lithography using ternary developer and proximity effect correction superposition

Leonidas E. Ocola, James Bucchignano, Simon Dawes, Andrei Fustochenko
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062605 (2022)
https://doi.org/10.1116/6.0002121
Published: November 2022
View article titled, Trilayer process for <em>T</em>-gate and Γ-gate lithography using ternary developer and proximity effect correction superposition
Open the PDF for Trilayer process for <em>T</em>-gate and Γ-gate lithography using ternary developer and proximity effect correction superposition in another window
Includes: Supplementary data
Journal Articles

Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step

R. Dawant, S. Ecoffey, D. Drouin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062603 (2022)
https://doi.org/10.1116/6.0002116
Published: November 2022
View article titled, Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step
Open the PDF for Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step in another window
Journal Articles

Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist

D. J. Thoen, V. Murugesan, A. Pascual Laguna, K. Karatsu, A. Endo, J. J. A. Baselmans
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 052603 (2022)
https://doi.org/10.1116/6.0001918
Published: September 2022
View article titled, Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist
Open the PDF for Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist in another window
Journal Articles

Accuracy requirements of the microarrayed Einzel lens

Lixin Zhang, Yulu Zhang, Weixia Zhao, Junbiao Liu, Bohua Yin, Li Han
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 014203 (2022)
https://doi.org/10.1116/6.0001620
Published: January 2022
View article titled, Accuracy requirements of the microarrayed Einzel lens
Open the PDF for Accuracy requirements of the microarrayed Einzel lens in another window
Journal Articles

Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing

Raphaël Dawant, Robyn Seils, Serge Ecoffey, Rainer. Schmid, Dominique Drouin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 012601 (2022)
https://doi.org/10.1116/6.0001278
Published: December 2021
View article titled, Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing
Open the PDF for Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing in another window
Journal Articles

Subradiant resonances in Au and Ag bipartite lattices in the visible spectrum

Aran Warren, Maan M. Alkaisi, Ciaran P. Moore
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 063601 (2021)
https://doi.org/10.1116/6.0001270
Published: October 2021
View article titled, Subradiant resonances in Au and Ag bipartite lattices in the visible spectrum
Open the PDF for Subradiant resonances in Au and Ag bipartite lattices in the visible spectrum in another window
Journal Articles

Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system

Bin Sun, Thomas Grap, Thorben Frahm, Stefan Scholz, Joachim Knoch
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052601 (2021)
https://doi.org/10.1116/6.0001161
Published: August 2021
View article titled, Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system
Open the PDF for Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system in another window
Journal Articles

Estimation of critical dimension and line edge roughness using a neural network

Dehua Li, Soo-Young Lee, Jin Choi, Seom-Beom Kim, Chan-Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 032602 (2021)
https://doi.org/10.1116/6.0000806
Published: May 2021
View article titled, Estimation of critical dimension and line edge roughness using a neural network
Open the PDF for Estimation of critical dimension and line edge roughness using a neural network in another window
Journal Articles

Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability

Mandy Grube, Benjamin Schille, Matthias Schirmer, Maik Gerngroß, Uwe Hübner, Paul Voigt, Sascha Brose
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 012602 (2021)
https://doi.org/10.1116/6.0000542
Published: January 2021
View article titled, Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability
Open the PDF for Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability in another window
Journal Articles

Nanofabrication of silicon surfaces for reduced virus adhesion

Ao Guo, Y. Carol Shieh, Ralu Divan, Rong R. Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 012801 (2021)
https://doi.org/10.1116/6.0000548
Published: January 2021
View article titled, Nanofabrication of silicon surfaces for reduced virus adhesion
Open the PDF for Nanofabrication of silicon surfaces for reduced virus adhesion in another window
Includes: Supplementary data
Journal Articles

Fabrication of topological insulator nanostructures

Sivakumar Vishnuvardhan Mambakkam, Stephanie Law
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 055001 (2020)
https://doi.org/10.1116/6.0000341
Published: July 2020
View article titled, Fabrication of topological insulator nanostructures
Open the PDF for Fabrication of topological insulator nanostructures in another window
Journal Articles

High current density electron emission from an electrodeposited metal nanowire array

Tanouir Aloui, Matthew P. Kirley, Erik Vick, Allan Hilton, Pedro Colon, William Kim, Charles B. Parker, Jason J. Amsden, Jeffrey T. Glass, Kristin H. Gilchrist
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 043204 (2020)
https://doi.org/10.1116/6.0000135
Published: July 2020
View article titled, High current density electron emission from an electrodeposited metal nanowire array
Open the PDF for High current density electron emission from an electrodeposited metal nanowire array in another window
Journal Articles

Monolithically fabricated sample for the calibration of the tip-sample thermal conductance in scanning thermal microscopy

Zarina Umatova, Yuan Zhang, Rory Lambert, Phillip S. Dobson, Jonathan M. R. Weaver
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 043202 (2020)
https://doi.org/10.1116/6.0000034
Published: May 2020
View article titled, Monolithically fabricated sample for the calibration of the tip-sample thermal conductance in scanning thermal microscopy
Open the PDF for Monolithically fabricated sample for the calibration of the tip-sample thermal conductance in scanning thermal microscopy in another window
Journal Articles

Integrated in situ self-aligned double patterning process with fluorocarbon as spacer layer

Bingdong Chang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 032601 (2020)
https://doi.org/10.1116/6.0000089
Published: April 2020
View article titled, Integrated <em>in situ</em> self-aligned double patterning process with fluorocarbon as spacer layer
Open the PDF for Integrated <em>in situ</em> self-aligned double patterning process with fluorocarbon as spacer layer in another window