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Journal Articles

Use of plasma process diagnostic sensors for the monitoring of in situ dry cleaning of plasma enhanced chemical vapor deposition chamber

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Young Min You, Ji Seok Lee, Min Ho Kim, Sang Jeen Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042203 (2024)
https://doi.org/10.1116/6.0003288
Published: June 2024
View articletitled, Use of plasma process diagnostic sensors for the monitoring of in situ dry cleaning of plasma enhanced chemical vapor deposition chamber
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Journal Articles

Degradation of GaN field emitter arrays induced by O2 exposure

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Reza Farsad Asadi, Tao Zheng, Pao-Chuan Shih, Tomás Palacios, Akintunde I. Akinwande, Bruce Gnade
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 014001 (2024)
https://doi.org/10.1116/6.0003314
Published: January 2024
View articletitled, Degradation of GaN field emitter arrays induced by O2 exposure
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Journal Articles

On the origins of the m/z = 19 signals in residual gas analysis

Open Access
Sean Davies, Dane E. Walker, John A. Rees, David L. Seymour
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044203 (2023)
https://doi.org/10.1116/6.0002498
Published: May 2023
View articletitled, On the origins of the m/z = 19 signals in residual gas analysis
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Journal Articles

Absolute pressure and gas species identification with an optically levitated rotor

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Charles P. Blakemore, Denzal Martin, Alexander Fieguth, Akio Kawasaki, Nadav Priel, Alexander D. Rider, Giorgio Gratta
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 024201 (2020)
https://doi.org/10.1116/1.5139638
Published: January 2020
View articletitled, Absolute pressure and gas species identification with an optically levitated rotor
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Journal Articles

Residual gas analysis based on carbon nanotube field emission display

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Jinchan Wang, Xiaobing Zhang, Wei Lei, Mei Xiao, Yunkang Cui, Yunsong Di, Fuming Mao
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 615–617 (2007)
https://doi.org/10.1116/1.2715970
Published: March 2007
View articletitled, Residual gas analysis based on carbon nanotube field emission display
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Journal Articles

Work function of low index crystal facet of tungsten evaluated by the Seppen-Katamuki analysis

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Y. Gotoh, K. Mukai, Y. Kawamura, H. Tsuji, J. Ishikawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 508–512 (2007)
https://doi.org/10.1116/1.2433950
Published: March 2007
View articletitled, Work function of low index crystal facet of tungsten evaluated by the Seppen-Katamuki analysis
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Journal Articles

Field emission properties of plasma treated multiwalled carbon nanotube cathode layers

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J. W. Nam, P. S. Alegaonkar, J. H. Park, J. B. Yoo, D. H. Choe, J. M. Kim, W. S. Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 306–311 (2007)
https://doi.org/10.1116/1.2437154
Published: February 2007
View articletitled, Field emission properties of plasma treated multiwalled carbon nanotube cathode layers
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Journal Articles

Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma

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Russell R. A. Callahan, Gregory B. Raupp, Stephen P. Beaudoin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 725–731 (2001)
https://doi.org/10.1116/1.1366707
Published: May 2001
View articletitled, Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma
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Journal Articles

Auger electron spectroscopy evaluation of voids in aluminum–1% silicon integrated circuit metallization

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R. A. Gasser, Jr., S. G. Johnson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 4, 758–761 (1986)
https://doi.org/10.1116/1.583561
Published: May 1986
View articletitled, Auger electron spectroscopy evaluation of voids in aluminum–1% silicon integrated circuit metallization
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Journal Articles

Identification and elimination of chlorofluorocarbon pump fluid contamination in a plasma etch system

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Eric R. Sirkin, R. D. Powell
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 1, 74–76 (1983)
https://doi.org/10.1116/1.582508
Published: January 1983
View articletitled, Identification and elimination of chlorofluorocarbon pump fluid contamination in a plasma etch system
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