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Journal Articles

Interfacial reactivity in the Co/CuO samples as investigated by x-ray photoelectron spectroscopy

A. R. Chourasia, D. R. Chopra
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062806 (2023)
https://doi.org/10.1116/6.0002922
Published: November 2023
View article titled, Interfacial reactivity in the Co/CuO samples as investigated by x-ray photoelectron spectroscopy
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Journal Articles

Effect of atomic-scale microstructures on TiZrV non-evaporable getter film activation

Qingzhi Shi, Sihui Wang, Pengcheng Wang, Yongsheng Ma, Biao Tan, Shiyuan Shi, Tao Huang, Tao Huang, Fei Sun, Lixin Wang, Xiaoguang Zhao, Shuping Chen, Meitong Lu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 064202 (2023)
https://doi.org/10.1116/6.0002992
Published: November 2023
View article titled, Effect of atomic-scale microstructures on TiZrV non-evaporable getter film activation
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Journal Articles

Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process

Paule Durin, Olha Sysova, Alexandre Téolis, Stéphane Trombotto, Samar Hajjar-Garreau, Thierry Delair, Isabelle Servin, Névine Rochat, Raluca Tiron, Corinne Gablin, Olivier Soppera, Aziz Benamrouche, Thomas Géhin, Didier Léonard, Jean-Louis Leclercq, Yann Chevolot
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062204 (2023)
https://doi.org/10.1116/6.0002934
Published: October 2023
View article titled, Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process
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Includes: Supplementary data
Journal Articles

Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy

Kento Takenaka, Koji Takahara, Tomoki Eguchi, Hirosuke Sumida, Satoru Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044204 (2023)
https://doi.org/10.1116/6.0002662
Published: June 2023
View article titled, Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy
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Journal Articles

Fabrication of plasma-reduced silver coupled with titanium dioxide nanoparticles for visible light-driven photocatalysis

Arantxa Danielle S. Montallana, Joven Paolo D. Angeles, Jinn P. Chu, Matthew P. Sherburne, Magdaleno R. Vasquez, Jr., Motoi Wada
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 042204 (2023)
https://doi.org/10.1116/6.0002510
Published: June 2023
View article titled, Fabrication of plasma-reduced silver coupled with titanium dioxide nanoparticles for visible light-driven photocatalysis
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Journal Articles

Sputtering produced by vacuum electrospray droplet ions with different sizes and charges

Satoshi Ninomiya, Lee Chuin Chen, Kenzo Hiraoka
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 032807 (2023)
https://doi.org/10.1116/6.0002529
Published: April 2023
View article titled, Sputtering produced by vacuum electrospray droplet ions with different sizes and charges
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Includes: Supplementary data
Journal Articles

Thickness dependent field emission study of LaB6 coated Si nanowire arrays

Amol Deore, Krishna Jagtap, Onkar Bhorade, Angela Vella, Mahendra More
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022806 (2023)
https://doi.org/10.1116/6.0002464
Published: March 2023
View article titled, Thickness dependent field emission study of LaB<sub>6</sub> coated Si nanowire arrays
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Includes: Supplementary data
Journal Articles

Chemical and electrical modifications of few-layer graphene films via sub-10 keV electron beam irradiation

Karla Moyano, Carlos Reinoso, Steven Núñez, Beatriz Pérez, Cristian Santacruz, César Costa, Esteban Irribarra
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022804 (2023)
https://doi.org/10.1116/6.0002123
Published: March 2023
View article titled, Chemical and electrical modifications of few-layer graphene films via sub-10 keV electron beam irradiation
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Journal Articles

Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)

Deepak Kumar, Krishnaroop Chaudhuri, Joseph W. Brill, Jonathan T. Pham, J. Todd Hastings
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012604 (2023)
https://doi.org/10.1116/6.0002118
Published: January 2023
View article titled, Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)
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Journal Articles

Bulk and surface chemical compositions and microstructure properties of CaF2:Y3+ material

Mubarak Y. A. Yagoub, Hendrik C. Swart, Elizabeth Coetsee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 014001 (2023)
https://doi.org/10.1116/6.0002279
Published: January 2023
View article titled, Bulk and surface chemical compositions and microstructure properties of CaF<sub>2</sub>:Y<sup>3+</sup> material
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Journal Articles

Role of dose optimization in Ru atomic layer deposition for low resistivity films

Victor Wang, Michael Breeden, Nickolas Ashburn, Matthew Bergschneider, Jacob Spiegelman, Harsono Simka, Kyeongjae Cho, Andrew C. Kummel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012201 (2023)
https://doi.org/10.1116/6.0002153
Published: December 2022
View article titled, Role of dose optimization in Ru atomic layer deposition for low resistivity films
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Includes: Supplementary data
Journal Articles

Influence of the Cl2 etching on the Al2O3/GaN metal–oxide–semiconductor interface

T. Meyer, S. Boubenia, C. Petit-Etienne, B. Salem, E. Pargon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062208 (2022)
https://doi.org/10.1116/6.0002133
Published: November 2022
View article titled, Influence of the Cl<sub>2</sub> etching on the Al<sub>2</sub>O<sub>3</sub>/GaN metal–oxide–semiconductor interface
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Journal Articles

Persistent iodine contamination resulting from thermal evaporation of inorganic perovskites

Quinn C. Burlingame, Alan B. Kaplan, Tianran Liu, Yueh-Lin Loo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 060601 (2022)
https://doi.org/10.1116/6.0002174
Published: October 2022
View article titled, Persistent iodine contamination resulting from thermal evaporation of inorganic perovskites
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Journal Articles

Outgassing properties of 304 stainless steel electropolished by wiping method

Tsuyoshi Fujino, Naoki Fukumuro, Vijay Chouhan, Muneaki Ida, Yoshiaki Ida, Shinji Yae
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 064201 (2022)
https://doi.org/10.1116/6.0002070
Published: October 2022
View article titled, Outgassing properties of 304 stainless steel electropolished by wiping method
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Journal Articles

Simplified CVD route to near-zero thickness silicon nitride films

Barry Arkles, Chad Brick, Jonathan Goff, Alain E. Kaloyeros
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 040601 (2022)
https://doi.org/10.1116/6.0001820
Published: June 2022
View article titled, Simplified CVD route to near-zero thickness silicon nitride films
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Journal Articles

Plasma atomic layer etching for titanium nitride at low temperatures

Dahee Shim, Jihyun Kim, Yongjae Kim, Heeyeop Chae
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022208 (2022)
https://doi.org/10.1116/6.0001602
Published: February 2022
View article titled, Plasma atomic layer etching for titanium nitride at low temperatures
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Journal Articles

Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride

Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Yuko Hanaoka, Masaru Izawa, Kenji Ishikawa, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022201 (2022)
https://doi.org/10.1116/6.0001660
Published: February 2022
View article titled, Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride
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Journal Articles

Nanometer-scale etching of copper thin films in high-density plasma of an ethylenediamine/acetic acid/argon gas mixture

Eun Taek Lim, Sung Yong Park, Ji Soo Lee, Seung Hyun Kim, Chee Won Chung
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 010604 (2022)
https://doi.org/10.1116/6.0001592
Published: January 2022
View article titled, Nanometer-scale etching of copper thin films in high-density plasma of an ethylenediamine/acetic acid/argon gas mixture
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Journal Articles

New SIMS method to characterize hydrogen in polysilicon films

Xue-feng Lin, Agi Fucsko, Kari Noehring, Elaine Gabriel, Adam Regner, Scott York, David Palsulich
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 014003 (2022)
https://doi.org/10.1116/6.0001472
Published: January 2022
View article titled, New SIMS method to characterize hydrogen in polysilicon films
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Journal Articles

Influences of etching chemical parameters on AlGaN/GaN electrical degradation in power devices

Frédéric Le Roux, Nicolas Possémé, Pauline Burtin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 063201 (2021)
https://doi.org/10.1116/6.0001130
Published: October 2021
View article titled, Influences of etching chemical parameters on AlGaN/GaN electrical degradation in power devices
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