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Journal Articles

Nanometer-level alignment to a substrate-embedded coordinate system

Euclid E. Moon, Henry I. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2341–2344 (2008)
https://doi.org/10.1116/1.3010734
Published: December 2008
View article titled, Nanometer-level alignment to a substrate-embedded coordinate system
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Journal Articles

Doppler writing and linewidth control for scanning beam interference lithography

Juan C. Montoya, Chih-Hao Chang, Ralf K. Heilmann, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2640–2645 (2005)
https://doi.org/10.1116/1.2127938
Published: December 2005
View article titled, Doppler writing and linewidth control for scanning beam interference lithography
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Journal Articles

Nanometer-level repeatable metrology using the Nanoruler

Paul T. Konkola, Carl G. Chen, Ralf K. Heilmann, Chulmin Joo, Juan C. Montoya, Chih-Hao Chang, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 21, 3097–3101 (2003)
https://doi.org/10.1116/1.1610003
Published: December 2003
View article titled, Nanometer-level repeatable metrology using the Nanoruler
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Journal Articles

Precision fringe metrology using a Fresnel zone plate

Chulmin Joo, G. S. Pati, Carl G. Chen, Paul T. Konkola, Ralf K. Heilmann, Mark L. Schattenburg, Alexander Liddle, Erik H. Anderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 3075–3079 (2002)
https://doi.org/10.1116/1.1523018
Published: December 2002
View article titled, Precision fringe metrology using a Fresnel zone plate
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Journal Articles

Beam alignment for scanning beam interference lithography

Carl G. Chen, Ralf K. Heilmann, Chulmin Joo, Paul T. Konkola, G. S. Pati, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 3071–3074 (2002)
https://doi.org/10.1116/1.1523402
Published: December 2002
View article titled, Beam alignment for scanning beam interference lithography
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Journal Articles

Generalized scanning beam interference lithography system for patterning gratings with variable period progressions

G. S. Pati, R. K. Heilmann, P. T. Konkola, C. Joo, C. G. Chen, E. Murphy, M. L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 2617–2621 (2002)
https://doi.org/10.1116/1.1520563
Published: December 2002
View article titled, Generalized scanning beam interference lithography system for patterning gratings with variable period progressions
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Journal Articles

Image metrology and system controls for scanning beam interference lithography

Carl G. Chen, Paul T. Konkola, Ralf K. Heilmann, G. S. Pati, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 2335–2341 (2001)
https://doi.org/10.1116/1.1409379
Published: November 2001
View article titled, Image metrology and system controls for scanning beam interference lithography
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Journal Articles

Digital heterodyne interference fringe control system

Ralf K. Heilmann, Paul T. Konkola, Carl G. Chen, G. S. Pati, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 2342–2346 (2001)
https://doi.org/10.1116/1.1410096
Published: November 2001
View article titled, Digital heterodyne interference fringe control system
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Journal Articles

Relativistic corrections in displacement measuring interferometry

Ralf K. Heilmann, Paul T. Konkola, Carl G. Chen, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 3277–3281 (2000)
https://doi.org/10.1116/1.1313584
Published: November 2000
View article titled, Relativistic corrections in displacement measuring interferometry
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Journal Articles

Sub-100 nm metrology using interferometrically produced fiducials

M. L. Schattenburg, C. Chen, P. N. Everett, J. Ferrera, P. Konkola, Henry I. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 2692–2697 (1999)
https://doi.org/10.1116/1.591047
Published: November 1999
View article titled, Sub-100 nm metrology using interferometrically produced fiducials
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