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Journal Articles

Structural, surface, and upconversion luminescence properties of pulsed laser-deposited Y2O3:Ho3+,Yb3+ thin films

Vhahangwele Makumbane, M. Y. A. Yagoub, E. Coetsee, R. E. Kroon, H. C. Swart
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 054004 (2024)
https://doi.org/10.1116/6.0003880
Published: September 2024
View article titled, Structural, surface, and upconversion luminescence properties of pulsed laser-deposited Y<sub>2</sub>O<sub>3</sub>:Ho<sup>3+</sup>,Yb<sup>3+</sup> thin films
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Journal Articles

Matrices to enhance the ion yield of OLED molecules in ToF-SIMS: An interesting alchemist solution

Pierre Hirchenhahn, Claire Guyot, Christelle Laugier, Tony Maindron, Benoît Gilquin, Greg Fisher, Jean-Paul Barnes
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 044003 (2024)
https://doi.org/10.1116/6.0003648
Published: June 2024
View article titled, Matrices to enhance the ion yield of OLED molecules in ToF-SIMS: An interesting alchemist solution
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Journal Articles

Monitoring of rapid thermal anneal with secondary ion mass spectrometry

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Z. X. Jiang, A. Ravi, T. Breeden, K. Khmelnitskiy, A. Duncan, D. Huynh, S. Butler, B. Granados, D. Acker, J. Luebbe, D. Sieloff, S. Bolton, G. Prieto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034007 (2024)
https://doi.org/10.1116/6.0003599
Published: May 2024
View article titled, Monitoring of rapid thermal anneal with secondary ion mass spectrometry
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Journal Articles

In situ plasma pin-up clean process for backside bevel polymer removal, defect reduction, and queue time relaxation

Editor’s Pick
Benjamin B. Ye, Ganquan Song, Jeff J. Ye
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 022202 (2024)
https://doi.org/10.1116/6.0003300
Published: February 2024
View article titled, <em>In situ</em> plasma pin-up clean process for backside bevel polymer removal, defect reduction, and queue time relaxation
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Journal Articles

Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO2 thin films on H-/OH-terminated Si (100) surfaces

Editor’s Pick
Jihye Park, Minji Jeong, Young Joon Cho, Kyung Joong Kim, Truong Ba Tai, Hyeyoung Shin, Jong Chul Lim, Hyo Sik Chang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062801 (2023)
https://doi.org/10.1116/6.0002920
Published: September 2023
View article titled, Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO<sub>2</sub> thin films on H-/OH-terminated Si (100) surfaces
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Includes: Supplementary data
Journal Articles

Comment on “Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model” [J. Vac. Sci. Technol. B 41, 024003 (2023)]

Siegfried Hofmann, JiangYong Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 056002 (2023)
https://doi.org/10.1116/6.0002779
Published: July 2023
View article titled, Comment on “Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model” [J. Vac. Sci. Technol. B 41, 024003 (2023)]
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Journal Articles

Response to “Comment on ‘Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model’” [J. Vac. Sci. Technol. B 41, 024003 (2023)]

Y. Kudriavtsev, R. Asomoza, K. D. Moiseev
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 056001 (2023)
https://doi.org/10.1116/6.0002810
Published: July 2023
View article titled, Response to “Comment on ‘Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model’” [J. Vac. Sci. Technol. B 41, 024003 (2023)]
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Journal Articles

Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)

A. Merkulov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044009 (2023)
https://doi.org/10.1116/6.0002578
Published: June 2023
View article titled, Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)
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Journal Articles

Surface and functional characterization of nanostructured thin films for environmental remediation

Enrica Maria Malannata, Alessandro Auditore, Antonino Licciardello
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044008 (2023)
https://doi.org/10.1116/6.0002611
Published: June 2023
View article titled, Surface and functional characterization of nanostructured thin films for environmental remediation
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Includes: Supplementary data
Journal Articles

Analysis of furnace contamination on superconducting radio frequency niobium using secondary-ion mass spectrometry

Jonathan W. Angle, Eric M. Lechner, Charles E. Reece, Fred A. Stevie, Michael J. Kelley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034005 (2023)
https://doi.org/10.1116/6.0002624
Published: May 2023
View article titled, Analysis of furnace contamination on superconducting radio frequency niobium using secondary-ion mass spectrometry
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Includes: Supplementary data
Journal Articles

Characterization of GaN structures for power electronics by secondary ion mass spectrometry and atomic force microscope approach

Tarek Spelta, Marc Veillerot, Eugénie Martinez, Nicolas Chevalier, Denis Mariolle, Roselyne Templier, Bassem Salem, Pedro Fernandes Paes Pinto Rocha, Laura Vauche, Sarah Boubenia, Bérangère Hyot
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034003 (2023)
https://doi.org/10.1116/6.0002573
Published: April 2023
View article titled, Characterization of GaN structures for power electronics by secondary ion mass spectrometry and atomic force microscope approach
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Journal Articles

Restoration of the original depth distribution from experimental SIMS profile using the depth resolution function in framework of RMR model

Yu. Kudriavtsev, R. Asomoza, K. D. Moiseev
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 024003 (2023)
https://doi.org/10.1116/6.0002302
Published: March 2023
View article titled, Restoration of the original depth distribution from experimental SIMS profile using the depth resolution function in framework of RMR model
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Journal Articles

Improvement of electrical characteristics of flexible AZO/Ag/Cu/AZO transparent conductive films by Cu deposition

Atsushi Nitta, Yuuki Uwatoko, Teppei Nagata, Yukio Yoshimura
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022205 (2023)
https://doi.org/10.1116/6.0002389
Published: March 2023
View article titled, Improvement of electrical characteristics of flexible AZO/Ag/Cu/AZO transparent conductive films by Cu deposition
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Journal Articles

Outgassing properties of 304 stainless steel electropolished by wiping method

Tsuyoshi Fujino, Naoki Fukumuro, Vijay Chouhan, Muneaki Ida, Yoshiaki Ida, Shinji Yae
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 064201 (2022)
https://doi.org/10.1116/6.0002070
Published: October 2022
View article titled, Outgassing properties of 304 stainless steel electropolished by wiping method
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Journal Articles

Improved quantitation of SIMS depth profile measurements of niobium via sample holder design improvements and characterization of grain orientation effects

Jonathan W. Angle, Eric M. Lechner, Ari D. Palczewski, Charles E. Reece, Fred A. Stevie, Michael J. Kelley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 024003 (2022)
https://doi.org/10.1116/6.0001741
Published: March 2022
View article titled, Improved quantitation of SIMS depth profile measurements of niobium via sample holder design improvements and characterization of grain orientation effects
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Journal Articles

New SIMS method to characterize hydrogen in polysilicon films

Xue-feng Lin, Agi Fucsko, Kari Noehring, Elaine Gabriel, Adam Regner, Scott York, David Palsulich
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 014003 (2022)
https://doi.org/10.1116/6.0001472
Published: January 2022
View article titled, New SIMS method to characterize hydrogen in polysilicon films
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Journal Articles

Molecular dynamics simulation for reactive ion etching of Si and SiO2 by SF 5 + ions

Erin Joy Capdos Tinacba, Tomoko Ito, Kazuhiro Karahashi, Michiro Isobe, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 043203 (2021)
https://doi.org/10.1116/6.0001230
Published: July 2021
View article titled, Molecular dynamics simulation for reactive ion etching of Si and SiO<sub>2</sub> by SF 5 + ions
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Journal Articles

Characterization of GeO2 films formed on Ge substrate using high pressure oxidation

Juhyun Bae, Ilsub Chung
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 043201 (2021)
https://doi.org/10.1116/6.0000963
Published: June 2021
View article titled, Characterization of GeO<sub>2</sub> films formed on Ge substrate using high pressure oxidation
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Journal Articles

Characterization of cathode-electrolyte interface in all-solid-state batteries using TOF-SIMS, XPS, and UPS/LEIPS

Shin-ichi Iida, Masahiro Terashima, Kazutoshi Mamiya, Hsun-Yun Chang, Shunsuke Sasaki, Atsuo Ono, Takahito Kimoto, Takuya Miyayama
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 044001 (2021)
https://doi.org/10.1116/6.0001044
Published: May 2021
View article titled, Characterization of cathode-electrolyte interface in all-solid-state batteries using TOF-SIMS, XPS, and UPS/LEIPS
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Journal Articles

Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum

Editor’s Pick
Chiaki Miyajima, Shunya Ito, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 032603 (2021)
https://doi.org/10.1116/6.0001014
Published: May 2021
View article titled, Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum
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