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Journal Articles

Direct writing immersion laser lithography on graphene monolayers using two-photon absorption

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Jianran Zhang, Carsten Strobel, Kathrin Estel, Thomas Mikolajick, Robert Kirchner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062604 (2023)
https://doi.org/10.1116/6.0003017
Published: November 2023
View articletitled, Direct writing immersion laser lithography on graphene monolayers using two-photon absorption
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Journal Articles

On the origin and evolution of hotspots in multipatterning processes

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Prem Panneerchelvam, Chad M. Huard, Trey Graves, Alessandro Vaglio Pret, Roel Gronheid, Ankur Agarwal, Mark D. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043201 (2023)
https://doi.org/10.1116/6.0002601
Published: June 2023
View articletitled, On the origin and evolution of hotspots in multipatterning processes
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Journal Articles

Surface property control for 193 nm immersion resist by addition of Si compound

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Chen Tang, Atsushi Sekiguchi, Yosuke Ohta, Yoshihiko Hirai, Masaaki Yasuda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012602 (2023)
https://doi.org/10.1116/6.0002128
Published: January 2023
View articletitled, Surface property control for 193 nm immersion resist by addition of Si compound
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Journal Articles

Evolution of lithography-to-etch bias in multi-patterning processes

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Prem Panneerchelvam, Ankur Agarwal, Chad M. Huard, Alessandro Vaglio Pret, Antonio Mani, Roel Gronheid, Marc Demand, Kaushik Kumar, Sara Paolillo, Frederic Lazzarino
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062601 (2022)
https://doi.org/10.1116/6.0002059
Published: September 2022
View articletitled, Evolution of lithography-to-etch bias in multi-patterning processes
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Journal Articles

Optimized structure of standard sample with programed defects for pattern inspection using electron beams

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Susumu Iida, Takayuki Uchiyama
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06J502 (2018)
https://doi.org/10.1116/1.5048047
Published: October 2018
View articletitled, Optimized structure of standard sample with programed defects for pattern inspection using electron beams
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Journal Articles

Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method

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Insung Kim, JinSeok Heo, Changmin Park, Myeongsu Hwang, Seong-Sue Kim, Jae W. Hahn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041602 (2016)
https://doi.org/10.1116/1.4945806
Published: April 2016
View articletitled, Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method
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Journal Articles

Highly selective removal of poly(methyl methacrylate) from polystyrene-block-poly(methyl methacrylate) by CO/H2 plasma etching

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Tsubasa Imamura, Hiroshi Yamamoto, Mitsuhiro Omura, Itsuko Sakai, Hisataka Hayashi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 061601 (2015)
https://doi.org/10.1116/1.4932541
Published: October 2015
View articletitled, Highly selective removal of poly(methyl methacrylate) from polystyrene-block-poly(methyl methacrylate) by CO/H2 plasma etching
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Journal Articles

Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating

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Tsuyoshi Amano, Tsukasa Abe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FE02 (2015)
https://doi.org/10.1116/1.4931934
Published: September 2015
View articletitled, Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating
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Journal Articles

Implementation of surface energy modification in graphoepitaxy directed self-assembly for hole multiplication

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Jan Doise, Joost Bekaert, Boon Teik Chan, Roel Gronheid, Yi Cao, SungEun Hong, Guanyang Lin, Daniel Fishman, Yuli Chakk, Taisir Marzook
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06F301 (2015)
https://doi.org/10.1116/1.4929884
Published: September 2015
View articletitled, Implementation of surface energy modification in graphoepitaxy directed self-assembly for hole multiplication
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Includes: Supplementary data
Journal Articles

Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography

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Levi Bourke, Richard J. Blaikie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FE03 (2014)
https://doi.org/10.1116/1.4900726
Published: October 2014
View articletitled, Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography
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Journal Articles

Ultrahigh NA, high aspect ratio interference lithography with resonant dielectric underlayers

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Sam Lowrey, Levi Bourke, Boyang Ding, Richard Blaikie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FE01 (2014)
https://doi.org/10.1116/1.4894168
Published: August 2014
View articletitled, Ultrahigh NA, high aspect ratio interference lithography with resonant dielectric underlayers
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Journal Articles

Analysis and optimization approaches for wide-viewing-angle λ/4 plate in polarimetry for immersion lithography

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Juan Dong, Yanqiu Li
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 011602 (2013)
https://doi.org/10.1116/1.4769978
Published: December 2012
View articletitled, Analysis and optimization approaches for wide-viewing-angle λ/4 plate in polarimetry for immersion lithography
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Journal Articles

Talbot effect immersion lithography by self-imaging of very fine grating patterns

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Takashi Sato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FG02 (2012)
https://doi.org/10.1116/1.4767440
Published: November 2012
View articletitled, Talbot effect immersion lithography by self-imaging of very fine grating patterns
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Journal Articles

Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling

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Ramakrishnan Ayothi, Lovejeet Singh, Yoshi Hishiro, Jed W. Pitera, Linda K. Sundberg, Martha I. Sanchez, Luisa Bozano, Kumar Virwani, Hoa D. Truong, Noel Arellano, Karen Petrillo, Gregory M. Wallraff, William D. Hinsberg, Yueming Hua
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06F506 (2012)
https://doi.org/10.1116/1.4767235
Published: November 2012
View articletitled, Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
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Includes: Supplementary data
Journal Articles

Residual-type mask defect printability for extreme ultraviolet lithography

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Tsuyoshi Amano, Susumu Iida, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe, Yuichi Inazuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06F501 (2012)
https://doi.org/10.1116/1.4756934
Published: October 2012
View articletitled, Residual-type mask defect printability for extreme ultraviolet lithography
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Journal Articles

Circular apertures for contact hole patterning in 193 nm immersion lithography

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C. J. Tay, C. Quan, M. L. Ling, G. S. Chua, S. K. Tan, Q. Lin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 021003 (2011)
https://doi.org/10.1116/1.3546100
Published: January 2011
View articletitled, Circular apertures for contact hole patterning in 193 nm immersion lithography
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Journal Articles

Integration of block copolymer directed assembly with 193 immersion lithography

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Chi-Chun Liu, Paul F. Nealey, Alex K. Raub, Philip J. Hakeem, Steve R. J. Brueck, Eungnak Han, Padma Gopalan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6B30–C6B34 (2010)
https://doi.org/10.1116/1.3501348
Published: November 2010
View articletitled, Integration of block copolymer directed assembly with 193 immersion lithography
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Journal Articles

Photopatternable inorganic hardmask

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Alan Telecky, Peng Xie, Jason Stowers, Andrew Grenville, Bruce Smith, Douglas A. Keszler
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6S19–C6S22 (2010)
https://doi.org/10.1116/1.3507889
Published: November 2010
View articletitled, Photopatternable inorganic hardmask
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Journal Articles

Effect of process related and haze defects on 193 nm immersion lithography

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C. J. Tay, C. Quan, M. L. Ling, Q. Lin, G. S. Chua
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 45–51 (2010)
https://doi.org/10.1116/1.3271332
Published: January 2010
View articletitled, Effect of process related and haze defects on 193 nm immersion lithography
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Journal Articles

Defectivity issues in topcoatless photoresists

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Jason Cantone, Youri van Dommelen, Aiqin Jiang, Shannon Dunn, Tom Winter, Karen Petrillo, Rick Johnson, Peggy Lawson, Will Conley, Ryan Callahan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 3014–3019 (2009)
https://doi.org/10.1116/1.3253612
Published: December 2009
View articletitled, Defectivity issues in topcoatless photoresists
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