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Journal Articles

Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling

Rajiv Sejpal, Bruce Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062604 (2021)
https://doi.org/10.1116/6.0001298
Published: November 2021
View article titled, Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling
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Journal Articles

Built-in lens mask lithography (challenge for high-definition lens-less lithography)

Naoki Ueda, Masaru Sasago, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F702 (2014)
https://doi.org/10.1116/1.4900604
Published: November 2014
View article titled, Built-in lens mask lithography (challenge for high-definition lens-less lithography)
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Journal Articles

Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography

Sangsul Lee, Inhwan Lee, Jong Gul Doh, Jae Uk Lee, Seongchul Hong, Jinho Ahn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 021606 (2013)
https://doi.org/10.1116/1.4793298
Published: February 2013
View article titled, Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography
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Journal Articles

Scanned-spot-array extreme ultraviolet imaging for high-volume maskless lithography

Kenneth C. Johnson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 051606 (2012)
https://doi.org/10.1116/1.4752112
Published: September 2012
View article titled, Scanned-spot-array extreme ultraviolet imaging for high-volume maskless lithography
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Journal Articles

Circular apertures for contact hole patterning in 193 nm immersion lithography

C. J. Tay, C. Quan, M. L. Ling, G. S. Chua, S. K. Tan, Q. Lin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 021003 (2011)
https://doi.org/10.1116/1.3546100
Published: January 2011
View article titled, Circular apertures for contact hole patterning in 193 nm immersion lithography
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Journal Articles

Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks

Iacopo Mochi, Kenneth A. Goldberg, Sungmin Huh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6E11–C6E16 (2010)
https://doi.org/10.1116/1.3498756
Published: November 2010
View article titled, Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks
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Journal Articles

Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography

A. Erdmann, F. Shao, P. Evanschitzky, T. Fühner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6J1–C6J7 (2010)
https://doi.org/10.1116/1.3497024
Published: October 2010
View article titled, Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography
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Journal Articles

Effect of process related and haze defects on 193 nm immersion lithography

C. J. Tay, C. Quan, M. L. Ling, Q. Lin, G. S. Chua
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 45–51 (2010)
https://doi.org/10.1116/1.3271332
Published: January 2010
View article titled, Effect of process related and haze defects on 193 nm immersion lithography
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Journal Articles

Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography

Chang Young Jeong, Sangsul Lee, Hyun-Duck Shin, Tae Geun Kim, Jinho Ahn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2922–2926 (2009)
https://doi.org/10.1116/1.3246358
Published: December 2009
View article titled, Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography
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Journal Articles

Pushing extreme ultraviolet lithography development beyond 22 nm half pitch

Patrick P. Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth A. Goldberg, Michael Goldstein, Brian Hoef, Gideon Jones, Chawon Koh, Bruno La Fontaine, Warren Montgomery, Tom Wallow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2911–2915 (2009)
https://doi.org/10.1116/1.3237092
Published: December 2009
View article titled, Pushing extreme ultraviolet lithography development beyond 22 nm half pitch
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Journal Articles

Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas

H. Y. Jung, Y. R. Park, H. J. Lee, N.-E. Lee, C. Y. Jeong, Jinho Ahn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2361–2365 (2009)
https://doi.org/10.1116/1.3253532
Published: November 2009
View article titled, Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas
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Journal Articles

Forbidden pitch improvement using modified illumination in lithography

M. L. Ling, C. J. Tay, C. Quan, G. S. Chua, Q. Lin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 85–91 (2009)
https://doi.org/10.1116/1.3054286
Published: January 2009
View article titled, Forbidden pitch improvement using modified illumination in lithography
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Journal Articles

Absorber stack with transparent conductive oxide layer for extreme ultraviolet lithography

Hee Young Kang, Chang Kwon Hwangbo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 58–60 (2009)
https://doi.org/10.1116/1.3043471
Published: January 2009
View article titled, Absorber stack with transparent conductive oxide layer for extreme ultraviolet lithography
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Journal Articles

Pattern specific optical models

Edita Tejnil, Konstantinos Adam, Michael C. Lam, Gabriel Berger
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2441–2446 (2008)
https://doi.org/10.1116/1.2991518
Published: December 2008
View article titled, Pattern specific optical models
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Journal Articles

Optimization of resolution-enhancement technology and dual-layer bottom-antireflective coatings in hypernumerical aperture lithography

Yanqiu Li, Yuan Zhou
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 534–540 (2008)
https://doi.org/10.1116/1.2870220
Published: March 2008
View article titled, Optimization of resolution-enhancement technology and dual-layer bottom-antireflective coatings in hypernumerical aperture lithography
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Journal Articles

Potential of phase-shifted optical proximity correction for 65 nm T-shaped pattern in high numerical aperture lithography

Songbo Gao, Yanqiu Li
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 84–88 (2008)
https://doi.org/10.1116/1.2823020
Published: January 2008
View article titled, Potential of phase-shifted optical proximity correction for 65 nm T-shaped pattern in high numerical aperture lithography
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Journal Articles

Fabrication of 3D-photonic crystals via UV-nanoimprint lithography

Thomas Glinsner, Paul Lindner, Michael Mühlberger, Iris Bergmair, Rainer Schöftner, Kurt Hingerl, Holger Schmid, Ernst-Bernhard Kley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2337–2340 (2007)
https://doi.org/10.1116/1.2798733
Published: December 2007
View article titled, Fabrication of 3D-photonic crystals via UV-nanoimprint lithography
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Journal Articles

Experimental demonstration of dark field illumination using contact hole features

Michael M. Crouse, Emil Schmitt-Weaver, Steven G. Hansen, Robert Routh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2453–2460 (2007)
https://doi.org/10.1116/1.2800323
Published: December 2007
View article titled, Experimental demonstration of dark field illumination using contact hole features
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Journal Articles

Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Ted Liang, Erdem Ultanir, Guojing Zhang, Seh-Jin Park, Erik Anderson, Eric Gullikson, Patrick Naulleau, Farhad Salmassi, Paul Mirkarimi, Eberhard Spiller, Sherry Baker
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2098–2103 (2007)
https://doi.org/10.1116/1.2779044
Published: December 2007
View article titled, Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks
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Journal Articles

Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics

Farhad Salmassi, Eric M. Gullikson, Erik H. Anderson, Patrick P. Naulleau
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2055–2058 (2007)
https://doi.org/10.1116/1.2798725
Published: December 2007
View article titled, Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics
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