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Journal Articles

Line wiggling due to plasma-induced film stress and prevention by surface roughness modification

Amelia Turnquist, Naoyuki Kofuji, Joseph Sebastian, Hiroshi Kou, Takahiro Arai, Hideaki Fukuda, Yoann Tomczak, Yiting Sun, Daniele Piumi, David De Roest
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 012203 (2025)
https://doi.org/10.1116/6.0004116
Published: January 2025
View article titled, Line wiggling due to plasma-induced film stress and prevention by surface roughness modification
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Journal Articles

Efficient mask optimization for enhanced digital maskless lithography quality by improved particle swarm optimization algorithm

Shengzhou Huang, Dongjie Wu, Yuanzhuo Tang, Bowen Ren, Jiani Pan, Zhaowei Tian, Zhi Li, Jinjin Huang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 052603 (2024)
https://doi.org/10.1116/6.0003919
Published: September 2024
View article titled, Efficient mask optimization for enhanced digital maskless lithography quality by improved particle swarm optimization algorithm
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Journal Articles

Fabrication of microstructures on curved hydrogel substrates

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M. Chen, X. Ding, L. Que, X. Liang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 052804 (2022)
https://doi.org/10.1116/6.0002071
Published: September 2022
View article titled, Fabrication of microstructures on curved hydrogel substrates
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Journal Articles

Optimization of photoresist plating mold fabrication for metal mask patterning

Doreen Hii, Daryosh Vatanparvar, Andrei M. Shkel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 022601 (2021)
https://doi.org/10.1116/6.0000879
Published: March 2021
View article titled, Optimization of photoresist plating mold fabrication for metal mask patterning
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Journal Articles

High-brightness source of energetic He atoms

Venu S. Jonnalagadda, Navjot S. Randhawa, Apeksha Awale, Pratik Motwani, John C. Wolfe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 012601 (2020)
https://doi.org/10.1116/1.5124838
Published: December 2019
View article titled, High-brightness source of energetic He atoms
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Journal Articles

Isotropic silicon etch characteristics in a purely inductively coupled SF6 plasma

Parashara Panduranga, Aly Abdou, Zhong Ren, Rasmus H. Pedersen, Maziar P. Nezhad
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061206 (2019)
https://doi.org/10.1116/1.5116021
Published: November 2019
View article titled, Isotropic silicon etch characteristics in a purely inductively coupled SF<sub>6</sub> plasma
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Journal Articles

Increase of space width roughness in directed self-assembly patterning arising from shrinking stress in the remaining poly(methyl methacrylate)

Makoto Satake, Naoyuki Kofuji, Kenji Maeda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 051208 (2019)
https://doi.org/10.1116/1.5115164
Published: September 2019
View article titled, Increase of space width roughness in directed self-assembly patterning arising from shrinking stress in the remaining poly(methyl methacrylate)
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Journal Articles

Improving the resolution and throughput of achromatic Talbot lithography

Dimitrios Kazazis, Li-Ting Tseng, Yasin Ekinci
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06J501 (2018)
https://doi.org/10.1116/1.5048506
Published: September 2018
View article titled, Improving the resolution and throughput of achromatic Talbot lithography
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Journal Articles

Bottom profile degradation mechanism in high aspect ratio feature etching based on pattern transfer observation

Nobuyuki Negishi, Masatoshi Miyake, Ken'etsu Yokogawa, Masatoshi Oyama, Tadamitsu Kanekiyo, Masaru Izawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 051205 (2017)
https://doi.org/10.1116/1.4998943
Published: August 2017
View article titled, Bottom profile degradation mechanism in high aspect ratio feature etching based on pattern transfer observation
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Journal Articles

Alternative method to fabricate microdevices on a freestanding Si3N4 window

Zhenhai Wang, Fan Yang, Danhong Han, Gang Li, Jingjing Xu, Shengyong Xu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 041601 (2017)
https://doi.org/10.1116/1.4984103
Published: May 2017
View article titled, Alternative method to fabricate microdevices on a freestanding Si<sub>3</sub>N<sub>4</sub> window
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Journal Articles

Etch stop improvement using a roof mask structure in a magnetic material etched by CO/NH3 plasma

Makoto Satake, Masaki Yamada, Eiji Matsumoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 061806 (2016)
https://doi.org/10.1116/1.4967804
Published: November 2016
View article titled, Etch stop improvement using a roof mask structure in a magnetic material etched by CO/NH<sub>3</sub> plasma
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Journal Articles

Impact of parallelism on data volumes for a multibeam mask writer

Narendra Chaudhary, Yao Luo, Serap A. Savari
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KF01 (2016)
https://doi.org/10.1116/1.4963151
Published: September 2016
View article titled, Impact of parallelism on data volumes for a multibeam mask writer
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Journal Articles

Fabrication of low grass, smooth sidewall InGaAsP by methane–hydrogen inductively coupled plasma RIE through a metal lift-off mask patterned by e-beam lithography

Viswas Sadasivan, Shikha Dagar, Utpal Das
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 051210 (2015)
https://doi.org/10.1116/1.4929437
Published: August 2015
View article titled, Fabrication of low grass, smooth sidewall InGaAsP by methane–hydrogen inductively coupled plasma RIE through a metal lift-off mask patterned by e-beam lithography
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Journal Articles

Etching of Ag and Au films in CH4-based plasmas at low temperature

Tae-Seop Choi, Dennis W. Hess
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 012202 (2015)
https://doi.org/10.1116/1.4902332
Published: November 2014
View article titled, Etching of Ag and Au films in CH<sub>4</sub>-based plasmas at low temperature
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Journal Articles

Optical proximity correction using holographic imaging technique

Artak Isoyan, Lawrence S. Melvin, III
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FK02 (2014)
https://doi.org/10.1116/1.4901417
Published: November 2014
View article titled, Optical proximity correction using holographic imaging technique
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Journal Articles

Built-in lens mask lithography (challenge for high-definition lens-less lithography)

Naoki Ueda, Masaru Sasago, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F702 (2014)
https://doi.org/10.1116/1.4900604
Published: November 2014
View article titled, Built-in lens mask lithography (challenge for high-definition lens-less lithography)
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Journal Articles

Faceted sidewall etching of n-GaN on sapphire by photoelectrochemical wet processing

Yuanzheng Yue, Xiaodong Yan, Wenjun Li, Huili Grace Xing, Debdeep Jena, Patrick Fay
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 061201 (2014)
https://doi.org/10.1116/1.4896592
Published: September 2014
View article titled, Faceted sidewall etching of n-GaN on sapphire by photoelectrochemical wet processing
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Journal Articles

Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control

Joshua B. Ballard, James H. G. Owen, William Owen, Justin R. Alexander, Ehud Fuchs, John N. Randall, James R. Von Ehr, Stephen McDonnell, Don D. Dick, Robert M. Wallace, Yves J. Chabal, Maia R. Bischof, David L. Jaeger, Richard F. Reidy, Joseph Fu, Pradeep Namboodiri, Kai Li, Richard M. Silver
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 041804 (2014)
https://doi.org/10.1116/1.4890484
Published: July 2014
View article titled, Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control
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Includes: Supplementary data
Journal Articles

Pattern-integrated interference lithography: Vector modeling and 1D, 2D, and 3D device structures

Matthieu C. R. Leibovici, Thomas K. Gaylord
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F501 (2013)
https://doi.org/10.1116/1.4826560
Published: October 2013
View article titled, Pattern-integrated interference lithography: Vector modeling and 1D, 2D, and 3D device structures
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Journal Articles

Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step

Wen Lv, Shiyuan Liu, Qi Xia, Xiaofei Wu, Yijiang Shen, Edmund Y. Lam
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 041605 (2013)
https://doi.org/10.1116/1.4813781
Published: July 2013
View article titled, Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step
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