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Journal Articles

Enhancement of secondary ion yield on gas cluster ion beam-secondary ion mass spectrometry with nonaromatic matrices: Dependence on matrix species and molecular weight

Hayate Yoshizawa, Makiko Fujii, Toshio Seki, Jiro Matsuo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 024002 (2025)
https://doi.org/10.1116/6.0004062
Published: January 2025
View articletitled, Enhancement of secondary ion yield on gas cluster ion beam-secondary ion mass spectrometry with nonaromatic matrices: Dependence on matrix species and molecular weight
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Journal Articles

Filtering the beam from an ionic liquid ion source

Alexander C. G. Storey, Aydin Sabouri, Rohit Khanna, Usama Ahmed, Carla Sofia Perez-Martinez
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 064201 (2024)
https://doi.org/10.1116/6.0004029
Published: December 2024
View articletitled, Filtering the beam from an ionic liquid ion source
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Journal Articles

Ultralow impact energy dynamic secondary ion mass spectrometry with nonfully oxidizing surface conditions

A. Merkulov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 064005 (2024)
https://doi.org/10.1116/6.0004064
Published: December 2024
View articletitled, Ultralow impact energy dynamic secondary ion mass spectrometry with nonfully oxidizing surface conditions
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Journal Articles

Role of the oxidation conditions on the orientation of TiNxOy grown by atomic layer deposition: Impact on the optical and electrical properties

Kou Ihara, Julien Cardin, Maxime Leménager, Xavier Portier, Hind Bousbia, Christophe Labbé
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 054001 (2024)
https://doi.org/10.1116/6.0003646
Published: August 2024
View articletitled, Role of the oxidation conditions on the orientation of TiNxOy grown by atomic layer deposition: Impact on the optical and electrical properties
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Journal Articles

Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates

Editor’s Pick
B. Claflin, G. J. Grzybowski, S. Zollner, B. R. Rogers, T. A. Cooper, D. C. Look
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 052204 (2024)
https://doi.org/10.1116/6.0003689
Published: August 2024
View articletitled, Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates
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Journal Articles

Monitoring of rapid thermal anneal with secondary ion mass spectrometry

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Z. X. Jiang, A. Ravi, T. Breeden, K. Khmelnitskiy, A. Duncan, D. Huynh, S. Butler, B. Granados, D. Acker, J. Luebbe, D. Sieloff, S. Bolton, G. Prieto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034007 (2024)
https://doi.org/10.1116/6.0003599
Published: May 2024
View articletitled, Monitoring of rapid thermal anneal with secondary ion mass spectrometry
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Journal Articles

Effects of ion implantation with arsenic and boron in germanium-tin layers

Editor’s Pick
Sylvester Amoah, Hryhorii Stanchu, Grey Abernathy, Serhii Kryvyi, Fernando M. De Oliveira, Yuriy I. Mazur, Shangda Li, Shang Liu, Jifeng Liu, Wei Du, Baohua Li, Gregory Salamo, Shui-Qing Yu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034002 (2024)
https://doi.org/10.1116/6.0003565
Published: April 2024
View articletitled, Effects of ion implantation with arsenic and boron in germanium-tin layers
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Includes: Supplementary data
Journal Articles

Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process

Paule Durin, Olha Sysova, Alexandre Téolis, Stéphane Trombotto, Samar Hajjar-Garreau, Thierry Delair, Isabelle Servin, Névine Rochat, Raluca Tiron, Corinne Gablin, Olivier Soppera, Aziz Benamrouche, Thomas Géhin, Didier Léonard, Jean-Louis Leclercq, Yann Chevolot
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062204 (2023)
https://doi.org/10.1116/6.0002934
Published: October 2023
View articletitled, Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process
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Includes: Supplementary data
Journal Articles

Permeation of oxygen and water into a plasma-enhanced chemical vapor deposited silicon nitride film as function of deposition pressure

Masayuki Shiochi, Hiroshi Fujimoto, Hin Wai Mo, Keiko Inoue, Yusaku Tanahashi, Hiroyuki Hosomi, Takashi Miyamoto, Hiroshi Miyazaki, Chihaya Adachi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 060601 (2023)
https://doi.org/10.1116/6.0003050
Published: October 2023
View articletitled, Permeation of oxygen and water into a plasma-enhanced chemical vapor deposited silicon nitride film as function of deposition pressure
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Includes: Supplementary data
Journal Articles

Plasma processing and annealing for defect management at SiO2/Si interface

Shota Nunomura, Takayoshi Tsutsumi, Isao Sakata, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052202 (2023)
https://doi.org/10.1116/6.0002822
Published: August 2023
View articletitled, Plasma processing and annealing for defect management at SiO2/Si interface
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Journal Articles

Response to “Comment on ‘Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model’” [J. Vac. Sci. Technol. B 41, 024003 (2023)]

Y. Kudriavtsev, R. Asomoza, K. D. Moiseev
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 056001 (2023)
https://doi.org/10.1116/6.0002810
Published: July 2023
View articletitled, Response to “Comment on ‘Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model’” [J. Vac. Sci. Technol. B 41, 024003 (2023)]
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Journal Articles

Surface modification of s235 steel, molybdenum, and tungsten using electron beam scanning and electric discharge machining

Piotr Konarski, Joachim Ażgin, Aleksander Zawada, Sung-Hui Feng, Ching-Hsiang Chien, Dong-Yea Sheu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044205 (2023)
https://doi.org/10.1116/6.0002605
Published: June 2023
View articletitled, Surface modification of s235 steel, molybdenum, and tungsten using electron beam scanning and electric discharge machining
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Includes: Supplementary data
Journal Articles

Analysis of furnace contamination on superconducting radio frequency niobium using secondary-ion mass spectrometry

Jonathan W. Angle, Eric M. Lechner, Charles E. Reece, Fred A. Stevie, Michael J. Kelley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034005 (2023)
https://doi.org/10.1116/6.0002624
Published: May 2023
View articletitled, Analysis of furnace contamination on superconducting radio frequency niobium using secondary-ion mass spectrometry
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Includes: Supplementary data
Journal Articles

Sputtering produced by vacuum electrospray droplet ions with different sizes and charges

Satoshi Ninomiya, Lee Chuin Chen, Kenzo Hiraoka
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 032807 (2023)
https://doi.org/10.1116/6.0002529
Published: April 2023
View articletitled, Sputtering produced by vacuum electrospray droplet ions with different sizes and charges
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Includes: Supplementary data
Journal Articles

Effect of the kinetic energy on particle ejection process from carbon nanotubes bombarded by kilo-electron-volt C60

Sviatoslav Hrabar, Michał Kański, Soukaina Louerdi, Zbigniew Postawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 032803 (2023)
https://doi.org/10.1116/6.0002575
Published: April 2023
View articletitled, Effect of the kinetic energy on particle ejection process from carbon nanotubes bombarded by kilo-electron-volt C60
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Includes: Supplementary data
Journal Articles

Characterization of GaN structures for power electronics by secondary ion mass spectrometry and atomic force microscope approach

Tarek Spelta, Marc Veillerot, Eugénie Martinez, Nicolas Chevalier, Denis Mariolle, Roselyne Templier, Bassem Salem, Pedro Fernandes Paes Pinto Rocha, Laura Vauche, Sarah Boubenia, Bérangère Hyot
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034003 (2023)
https://doi.org/10.1116/6.0002573
Published: April 2023
View articletitled, Characterization of GaN structures for power electronics by secondary ion mass spectrometry and atomic force microscope approach
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Journal Articles

Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum

Kohei Chiba, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 032601 (2022)
https://doi.org/10.1116/6.0001747
Published: April 2022
View articletitled, Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum
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Includes: Supplementary data
Journal Articles

Improved quantitation of SIMS depth profile measurements of niobium via sample holder design improvements and characterization of grain orientation effects

Jonathan W. Angle, Eric M. Lechner, Ari D. Palczewski, Charles E. Reece, Fred A. Stevie, Michael J. Kelley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 024003 (2022)
https://doi.org/10.1116/6.0001741
Published: March 2022
View articletitled, Improved quantitation of SIMS depth profile measurements of niobium via sample holder design improvements and characterization of grain orientation effects
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Journal Articles

New SIMS method to characterize hydrogen in polysilicon films

Xue-feng Lin, Agi Fucsko, Kari Noehring, Elaine Gabriel, Adam Regner, Scott York, David Palsulich
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 014003 (2022)
https://doi.org/10.1116/6.0001472
Published: January 2022
View articletitled, New SIMS method to characterize hydrogen in polysilicon films
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Journal Articles

Maintaining atomically smooth GaAs surfaces after high-temperature processing for precise interdiffusion analysis and materials engineering

Leonid Miroshnik, Brian D. Rummel, Andrew B. Li, Ganesh Balakrishnan, Talid Sinno, Sang M. Han
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062212 (2021)
https://doi.org/10.1116/6.0001399
Published: November 2021
View articletitled, Maintaining atomically smooth GaAs surfaces after high-temperature processing for precise interdiffusion analysis and materials engineering
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Includes: Supplementary data