1-20 of 276
Photomasks
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Investigating pathways for deep-UV photolithography of large-area nanopost-based metasurfaces with high feature-size contrast

Open Access
Skyler Palatnick, Demis John, Maxwell Millar-Blanchaer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062602 (2024)
https://doi.org/10.1116/6.0003947
Published: October 2024
View articletitled, Investigating pathways for deep-UV photolithography of large-area nanopost-based metasurfaces with high feature-size contrast
Open the PDF for Investigating pathways for deep-UV photolithography of large-area nanopost-based metasurfaces with high feature-size contrast in another window
Journal Articles

On the origin and evolution of hotspots in multipatterning processes

Available to Purchase
Prem Panneerchelvam, Chad M. Huard, Trey Graves, Alessandro Vaglio Pret, Roel Gronheid, Ankur Agarwal, Mark D. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043201 (2023)
https://doi.org/10.1116/6.0002601
Published: June 2023
View articletitled, On the origin and evolution of hotspots in multipatterning processes
Open the PDF for On the origin and evolution of hotspots in multipatterning processes in another window
Journal Articles

Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests

Editor’s PickAvailable to Purchase
J. van Veldhoven, C.-C. Wu, A. J. Storm, M. van Putten, J. R. Meijlink, A. G. Ushakov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012603 (2023)
https://doi.org/10.1116/6.0002132
Published: January 2023
View articletitled, Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests
Open the PDF for Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests in another window
Journal Articles

Evolution of lithography-to-etch bias in multi-patterning processes

Editor’s PickAvailable to Purchase
Prem Panneerchelvam, Ankur Agarwal, Chad M. Huard, Alessandro Vaglio Pret, Antonio Mani, Roel Gronheid, Marc Demand, Kaushik Kumar, Sara Paolillo, Frederic Lazzarino
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062601 (2022)
https://doi.org/10.1116/6.0002059
Published: September 2022
View articletitled, Evolution of lithography-to-etch bias in multi-patterning processes
Open the PDF for Evolution of lithography-to-etch bias in multi-patterning processes in another window
Journal Articles

Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling

Available to Purchase
Rajiv Sejpal, Bruce Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062604 (2021)
https://doi.org/10.1116/6.0001298
Published: November 2021
View articletitled, Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling
Open the PDF for Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling in another window
Journal Articles

Cr and CrOx etching using SF6 and O2 plasma

Available to Purchase
Vy Thi Hoang Nguyen, Flemming Jensen, Jörg Hübner, Evgeniy Shkondin, Roy Cork, Kechun Ma, Pele Leussink, Wim De Malsche, Henri Jansen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 032201 (2021)
https://doi.org/10.1116/6.0000922
Published: April 2021
View articletitled, Cr and CrOx etching using SF6 and O2 plasma
Open the PDF for Cr and CrOx etching using SF6 and O2 plasma in another window
Journal Articles

Effectiveness of multipass and multirow writing methods for massively parallel e-beam systems

Available to Purchase
Md Nabid Hasan, Soo-Young Lee, Byung-Sup Ahn, Jin Choi, Joon-Soo Park
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 062601 (2020)
https://doi.org/10.1116/6.0000547
Published: October 2020
View articletitled, Effectiveness of multipass and multirow writing methods for massively parallel e-beam systems
Open the PDF for Effectiveness of multipass and multirow writing methods for massively parallel e-beam systems in another window
Journal Articles

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Available to Purchase
Vu Luong, Vicky Philipsen, Karl Opsomer, Jens Rip, Eric Hendrickx, Marc Heyns, Christophe Detavernier, Christian Laubis, Frank Scholze
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061607 (2019)
https://doi.org/10.1116/1.5125662
Published: November 2019
View articletitled, Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Open the PDF for Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography in another window
Journal Articles

Three-dimensional photolithography using built-in lens mask

Available to Purchase
Toshiki Tanaka, Daiki Sugihara, Masaru Sasago, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G308 (2017)
https://doi.org/10.1116/1.4995693
Published: November 2017
View articletitled, Three-dimensional photolithography using built-in lens mask
Open the PDF for Three-dimensional photolithography using built-in lens mask in another window
Journal Articles

Chromium oxide as a hard mask material better than metallic chromium

Available to Purchase
Ferhat Aydinoglu, Faycal Saffih, Ripon Kumar Dey, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06GB01 (2017)
https://doi.org/10.1116/1.4998480
Published: October 2017
View articletitled, Chromium oxide as a hard mask material better than metallic chromium
Open the PDF for Chromium oxide as a hard mask material better than metallic chromium in another window
Journal Articles

Point spread function and total process function measured for a variable-shaped electron beam system

Available to Purchase
Michael Asteiner, Christian Schlemmer, Peter Speckbacher, Karl E. Hoffmann
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041601 (2016)
https://doi.org/10.1116/1.4944658
Published: March 2016
View articletitled, Point spread function and total process function measured for a variable-shaped electron beam system
Open the PDF for Point spread function and total process function measured for a variable-shaped electron beam system in another window
Journal Articles

Highly stable carbon nanotube cathode for electron beam application

Available to Purchase
Jung Su Kang, Ji Hwan Hong, Min Tae Chung, Kyu Chang Park
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 02G104 (2016)
https://doi.org/10.1116/1.4941931
Published: February 2016
View articletitled, Highly stable carbon nanotube cathode for electron beam application
Open the PDF for Highly stable carbon nanotube cathode for electron beam application in another window
Journal Articles

Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake

Available to Purchase
Hidetatsu Miyoshi, Jun Taniguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FD05 (2015)
https://doi.org/10.1116/1.4935558
Published: November 2015
View articletitled, Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake
Open the PDF for Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake in another window
Journal Articles

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Available to Purchase
Markus P. Benk, Kenneth A. Goldberg, Antoine Wojdyla, Christopher N. Anderson, Farhad Salmassi, Patrick P. Naulleau, Michael Kocsis
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FE01 (2015)
https://doi.org/10.1116/1.4929509
Published: August 2015
View articletitled, Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope
Open the PDF for Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope in another window
Journal Articles

Interactions of higher order tip effects in critical dimension-AFM linewidth metrology

Available to Purchase
Ronald Dixson, Boon Ping Ng, Xavier Bonnaud, Ndubuisi Orji
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031806 (2015)
https://doi.org/10.1116/1.4919090
Published: April 2015
View articletitled, Interactions of higher order tip effects in critical dimension-AFM linewidth metrology
Open the PDF for Interactions of higher order tip effects in critical dimension-AFM linewidth metrology in another window
Journal Articles

Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

Free
Mihir Upadhyaya, Adarsh Basavalingappa, Henry Herbol, Gregory Denbeaux, Vibhu Jindal, Jenah Harris-Jones, Il-Yong Jang, Kenneth A. Goldberg, Iacopo Mochi, Sajan Marokkey, Wolfgang Demmerle, Thomas V. Pistor
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 021602 (2015)
https://doi.org/10.1116/1.4913315
Published: February 2015
View articletitled, Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects
Open the PDF for Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects in another window
Journal Articles

Optical proximity correction using holographic imaging technique

Available to Purchase
Artak Isoyan, Lawrence S. Melvin, III
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FK02 (2014)
https://doi.org/10.1116/1.4901417
Published: November 2014
View articletitled, Optical proximity correction using holographic imaging technique
Open the PDF for Optical proximity correction using holographic imaging technique in another window
Journal Articles

Built-in lens mask lithography (challenge for high-definition lens-less lithography)

Available to Purchase
Naoki Ueda, Masaru Sasago, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F702 (2014)
https://doi.org/10.1116/1.4900604
Published: November 2014
View articletitled, Built-in lens mask lithography (challenge for high-definition lens-less lithography)
Open the PDF for Built-in lens mask lithography (challenge for high-definition lens-less lithography) in another window
Journal Articles

Electron scattering analysis based on electron ray-tracing in extreme ultraviolet photomask

Available to Purchase
Jin Choi, Byung Sup Ahn, Chan Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 041601 (2014)
https://doi.org/10.1116/1.4878943
Published: May 2014
View articletitled, Electron scattering analysis based on electron ray-tracing in extreme ultraviolet photomask
Open the PDF for Electron scattering analysis based on electron ray-tracing in extreme ultraviolet photomask in another window
Journal Articles

Resist reflow minimization via viscosity control by exposure

Available to Purchase
Khalid Dhima, Christian Steinberg, Andre Mayer, Si Wang, Marc Papenheim, Hella-Christin Scheer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06FB05 (2013)
https://doi.org/10.1116/1.4832155
Published: November 2013
View articletitled, Resist reflow minimization via viscosity control by exposure
Open the PDF for Resist reflow minimization via viscosity control by exposure in another window