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Journal Articles

Scalable fabrication approach and fill factor optimization for single pixel microlens arrays

Featured
Jens Bonitz, Christian Helke, Nils Dittmar, Sebastian Schermer, Micha Haase, Lutz Hofmann, Danny Reuter
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062203 (2024)
https://doi.org/10.1116/6.0004036
Published: October 2024
View article titled, Scalable fabrication approach and fill factor optimization for single pixel microlens arrays
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Journal Articles

CMOS field emission devices based on {111} silicon surfaces

Michael Bachmann, Andreas Pahlke, Carolin Axt, Bastian Hinze, Walter Hansch
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 02B105 (2014)
https://doi.org/10.1116/1.4860953
Published: January 2014
View article titled, CMOS field emission devices based on {111} silicon surfaces
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Journal Articles

Fabrication of sub-100-nm metal-oxide-semiconductor field-effect transistors with asymmetrical source/drain using I-line double patterning technique

Horng-Chih Lin, Tzu-I Tsai, Tien-Sheng Chao, Min-Feng Jian, Tiao-Yuan Huang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 021007 (2011)
https://doi.org/10.1116/1.3551527
Published: January 2011
View article titled, Fabrication of sub-100-nm metal-oxide-semiconductor field-effect transistors with asymmetrical source/drain using I-line double patterning technique
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Journal Articles

Wafer-scale nanopatterning using electrodeposition

Leung Kway Lee, Pei-Cheng Ku
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 849–853 (2010)
https://doi.org/10.1116/1.3466883
Published: July 2010
View article titled, Wafer-scale nanopatterning using electrodeposition
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Journal Articles

Large-area, infrared nanophotonic materials fabricated using interferometric lithography

Wenjun Fan, Shuang Zhang, K. J. Malloy, S. R. J. Brueck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2700–2704 (2005)
https://doi.org/10.1116/1.2132334
Published: December 2005
View article titled, Large-area, infrared nanophotonic materials fabricated using interferometric lithography
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Journal Articles

Novel fabrication technique for 0.1 μm T-shaped gate with i-line negative resist and poly(methylmethacrylate)

Yoshiharu Anda, Toshinobu Matsuno, Mitsuru Tanabe, Tomoya Uda, Manabu Yanagihara, Katsunori Nishii, Kaoru Inoue, Nobumitsu Hirose, Toshiaki Matsui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 320–322 (1999)
https://doi.org/10.1116/1.590558
Published: March 1999
View article titled, Novel fabrication technique for 0.1 μm T-shaped gate with <em>i</em>-line negative resist and poly(methylmethacrylate)
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Journal Articles

Intrafield linewidth variances in 0.25 μm i‐line lithography

Hua‐Yu Liu, Crid Yu, Bob Gleason
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 13, 2909–2913 (1995)
https://doi.org/10.1116/1.588277
Published: November 1995
View article titled, Intrafield linewidth variances in 0.25 μm i‐line lithography
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Journal Articles

An increased effective depth of focus at contact mask for nonvolatile memories using an enhanced planarization scheme

C. Cork, M. Bacchetta
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 3773–3777 (1994)
https://doi.org/10.1116/1.587440
Published: November 1994
View article titled, An increased effective depth of focus at contact mask for nonvolatile memories using an enhanced planarization scheme
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Journal Articles

Investigation of single sideband optical lithography using oblique incidence illumination

Emi Tamechika, Seitaro Matsuo, Kazuhiko Komatsu, Yoshinobu Takeuchi, Yoshiaki Mimura, Katsuhiro Harada
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 10, 3027–3031 (1992)
https://doi.org/10.1116/1.585965
Published: November 1992
View article titled, Investigation of single sideband optical lithography using oblique incidence illumination
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Journal Articles

Phase‐shifting mask and top‐imaging resist for subhalf‐micron i‐line and deep‐ultraviolet lithography

S. Tedesco, B. Picard, M. Chevalier, B. Dal’zotto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 3166–3171 (1991)
https://doi.org/10.1116/1.585310
Published: November 1991
View article titled, Phase‐shifting mask and top‐imaging resist for subhalf‐micron <em>i</em>‐line and deep‐ultraviolet lithography
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Journal Articles

Two‐layer resist fabrication by new portable conformable masking i‐line lithography

M. Endo, M. Sasago, Y. Hirai, A. Ueno, N. Nomura
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 55–58 (1989)
https://doi.org/10.1116/1.584695
Published: January 1989
View article titled, Two‐layer resist fabrication by new portable conformable masking <em>i</em>‐line lithography
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