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Journal Articles

Optimization of a continuous hot embossing process for fabrication of micropyramid structures in thermoplastic sheets

Luke Haponow, Jeff Kettle, John Allsop
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 012203 (2021)
https://doi.org/10.1116/6.0000551
Published: December 2020
View article titled, Optimization of a continuous hot embossing process for fabrication of micropyramid structures in thermoplastic sheets
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Journal Articles

Neural network-based model of photoresist reflow

Charmaine Chia, Joel Martis, Stefanie S. Jeffrey, Roger T. Howe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061604 (2019)
https://doi.org/10.1116/1.5116857
Published: October 2019
View article titled, Neural network-based model of photoresist reflow
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Journal Articles

Structural effects on the performance of epoxide-based negative-tone molecular resists

Brandon L. Sharp, Hannah L. Narcross, Peter Ludovice, Laren M. Tolbert, Clifford L. Henderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 011604 (2019)
https://doi.org/10.1116/1.5057741
Published: January 2019
View article titled, Structural effects on the performance of epoxide-based negative-tone molecular resists
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Includes: Supplementary data
Journal Articles

Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists

Hannah Narcross, Brandon L. Sharp, Peter J. Ludovice, Laren M. Tolbert, Clifford L. Henderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JC02 (2018)
https://doi.org/10.1116/1.5057442
Published: November 2018
View article titled, Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists
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Journal Articles

Crosslinkable photoacid generators for ultrahigh loading in epoxide functionalized molecular resists

Hannah Narcross, Brandon L. Sharp, Laren M. Tolbert, Clifford L. Henderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06GE02 (2017)
https://doi.org/10.1116/1.4991894
Published: November 2017
View article titled, Crosslinkable photoacid generators for ultrahigh loading in epoxide functionalized molecular resists
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Journal Articles

Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening

Christian Steinberg, Nour Al-Hussainawi, Marc Papenheim, Andre Mayer, Hella-Christin Scheer, Maria Matschuk, Henrik Pranov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G306 (2017)
https://doi.org/10.1116/1.4991863
Published: October 2017
View article titled, Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening
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Journal Articles

Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography

Hiroki Yamamoto, Seiichi Tagawa, Takahiro Kozawa, Hiroto Kudo, Kazumasa Okamoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041606 (2016)
https://doi.org/10.1116/1.4953068
Published: June 2016
View article titled, Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography
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Journal Articles

Control of edge bulge evolution during photoresist reflow and its application to diamond microlens fabrication

Hangyu Liu, Johannes Herrnsdorf, Erdan Gu, Martin D. Dawson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 021602 (2016)
https://doi.org/10.1116/1.4943558
Published: March 2016
View article titled, Control of edge bulge evolution during photoresist reflow and its application to diamond microlens fabrication
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Journal Articles

Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake

Hidetatsu Miyoshi, Jun Taniguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FD05 (2015)
https://doi.org/10.1116/1.4935558
Published: November 2015
View article titled, Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake
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Journal Articles

Guided wrinkling with nanoimprinted SU-8 surfaces

Christian Steinberg, Daniel Blenskens, Khalid Dhima, Si Wang, Marc Papenheim, Hella-Christin Scheer, Joachim Zajadacz, Klaus Zimmer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FG05 (2014)
https://doi.org/10.1116/1.4898201
Published: October 2014
View article titled, Guided wrinkling with nanoimprinted SU-8 surfaces
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Journal Articles

Thermal roll-to-roll imprinted nanogratings on plastic film

Noriyuki Unno, Tapio Mäkelä, Jun Taniguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FG03 (2014)
https://doi.org/10.1116/1.4897132
Published: October 2014
View article titled, Thermal roll-to-roll imprinted nanogratings on plastic film
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Journal Articles

Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver

Robert Kirchner, Helmut Schift
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F701 (2014)
https://doi.org/10.1116/1.4896480
Published: October 2014
View article titled, Mobility based 3D simulation of selective, viscoelastic polymer reflow using <sc>surface evolver</sc>
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Includes: Supplementary data
Journal Articles

Effect of residual stress on replication fidelity with nanoimprint

Marc Papenheim, Khalid Dhima, Si Wang, Christian Steinberg, Hella-Christin Scheer, Jens Saupe, Maik Schönfeld, Jürgen Grimm
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FG01 (2014)
https://doi.org/10.1116/1.4895794
Published: September 2014
View article titled, Effect of residual stress on replication fidelity with nanoimprint
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Journal Articles

Smoothing mechanisms involved in thermal treatment for linewidth roughness reduction of 193-nm photoresist patterns

Erwine Pargon, Laurent Azarnouche, Marc Fouchier, Kevin Menguelti, Julien Jussot
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 061203 (2013)
https://doi.org/10.1116/1.4825238
Published: October 2013
View article titled, Smoothing mechanisms involved in thermal treatment for linewidth roughness reduction of 193-nm photoresist patterns
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Journal Articles

Flexible substrate and release layer for flexible MEMS devices

Moinuddin Ahmed, Donald P. Butler
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 050602 (2013)
https://doi.org/10.1116/1.4816938
Published: August 2013
View article titled, Flexible substrate and release layer for flexible MEMS devices
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Journal Articles

X-ray enhanced sputter rates in argon cluster ion sputter-depth profiling of polymers

Peter J. Cumpson, Jose F. Portoles, Naoko Sano, Anders J. Barlow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 021208 (2013)
https://doi.org/10.1116/1.4793284
Published: February 2013
View article titled, X-ray enhanced sputter rates in argon cluster ion sputter-depth profiling of polymers
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Journal Articles

Cross-linking control during imprint for hybrid lithography

Khalid Dhima, Christian Steinberg, Saskia Möllenbeck, Andre Mayer, Si Wang, Hella-Christin Scheer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FB08 (2012)
https://doi.org/10.1116/1.4763357
Published: October 2012
View article titled, Cross-linking control during imprint for hybrid lithography
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Journal Articles

High aspect ratio features in poly(methylglutarimide) using electron beam lithography and solvent developers

Golnaz Karbasian, Patrick J. Fay, Huili (Grace) Xing, Debdeep Jena, Alexei O. Orlov, Gregory L. Snider
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FI01 (2012)
https://doi.org/10.1116/1.4750217
Published: September 2012
View article titled, High aspect ratio features in poly(methylglutarimide) using electron beam lithography and solvent developers
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Journal Articles

Viscoelastic properties measurements of thin polymer films from reflow of nanoimprinted patterns

Etienne Rognin, Stefan Landis, Laurent Davoust
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 011602 (2012)
https://doi.org/10.1116/1.3664088
Published: December 2011
View article titled, Viscoelastic properties measurements of thin polymer films from reflow of nanoimprinted patterns
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Journal Articles

Surface plasmon waveguide devices with Tg-bonded Cytop claddings

Charles Chiu, Ewa Lisicka-Skrzek, R. Niall Tait, Pierre Berini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 062601 (2011)
https://doi.org/10.1116/1.3660801
Published: November 2011
View article titled, Surface plasmon waveguide devices with <em>T<sub>g</sub></em>-bonded Cytop claddings
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