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Journal Articles

Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching

Dong Zhang, Wenhan Hu, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 053001 (2024)
https://doi.org/10.1116/6.0003711
Published: August 2024
View article titled, Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching
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Journal Articles

Honeycomb-shaped vertically aligned carbon nanotubes decorated with molybdenum trioxide as an electrochemical sensor for glucose

Editor’s Pick
Lei Hu, Yu-Chiao Huang, Yung-Jui Huang, Pao-Hung Lin, Huan-Chun Wang, Kuei-Yi Lee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 044005 (2024)
https://doi.org/10.1116/6.0003677
Published: July 2024
View article titled, Honeycomb-shaped vertically aligned carbon nanotubes decorated with molybdenum trioxide as an electrochemical sensor for glucose
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Journal Articles

Effect of beam and gate offset size on x-ray focal spot resolution of a cold cathode electron beam

Jaydip Sawant, Ketan Bhotkar, Yi Yin Yu, Kyu Chang Park
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 032202 (2024)
https://doi.org/10.1116/6.0003390
Published: April 2024
View article titled, Effect of beam and gate offset size on x-ray focal spot resolution of a cold cathode electron beam
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Journal Articles

Room temperature inductively coupled plasma etching of InP with Cl2 mixtures using SiO2 and photoresist masks

Editor’s Pick
Qingyue Li, Claire Deeb, Hélène Debregeas, Jean-Luc Pelouard
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 022205 (2024)
https://doi.org/10.1116/6.0003295
Published: February 2024
View article titled, Room temperature inductively coupled plasma etching of InP with Cl<sub>2</sub> mixtures using SiO<sub>2</sub> and photoresist masks
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Journal Articles

Barrier/seed system for electroless metallization on complex surfaces using (aminomethylaminoethyl)phenethyltrimethoxysilane self-assembled films

J. K. L. Peters, G. D. Ashby, H. D. Hallen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 042209 (2023)
https://doi.org/10.1116/6.0002519
Published: July 2023
View article titled, Barrier/seed system for electroless metallization on complex surfaces using (aminomethylaminoethyl)phenethyltrimethoxysilane self-assembled films
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Journal Articles

On the origin and evolution of hotspots in multipatterning processes

Prem Panneerchelvam, Chad M. Huard, Trey Graves, Alessandro Vaglio Pret, Roel Gronheid, Ankur Agarwal, Mark D. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043201 (2023)
https://doi.org/10.1116/6.0002601
Published: June 2023
View article titled, On the origin and evolution of hotspots in multipatterning processes
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Journal Articles

Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication

Editor’s Pick
Chen Zhu, Edward C. Kinzel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 033601 (2023)
https://doi.org/10.1116/6.0002557
Published: May 2023
View article titled, Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication
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Journal Articles

Chemical mechanical planarization for Ta-based superconducting quantum devices

Editor’s Pick
Ekta Bhatia, Soumen Kar, Jakub Nalaskowski, Tuan Vo, Stephen Olson, Hunter Frost, John Mucci, Brian Martinick, Pui Yee Hung, Ilyssa Wells, Sandra Schujman, Satyavolu S. Papa Rao
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 033202 (2023)
https://doi.org/10.1116/6.0002586
Published: April 2023
View article titled, Chemical mechanical planarization for Ta-based superconducting quantum devices
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Journal Articles

Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests

Editor’s Pick
J. van Veldhoven, C.-C. Wu, A. J. Storm, M. van Putten, J. R. Meijlink, A. G. Ushakov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012603 (2023)
https://doi.org/10.1116/6.0002132
Published: January 2023
View article titled, Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests
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Journal Articles

Exploring electromechanical utility of GaAs interdigitated transducers; using finite-element-method-based parametric analysis and experimental comparison

Brian D. Rummel, Leonid Miroshnik, Andrew B. Li, Grant D. Heilman, Ganesh Balakrishnan, Talid Sinno, Sang M. Han
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 013203 (2023)
https://doi.org/10.1116/6.0002169
Published: December 2022
View article titled, Exploring electromechanical utility of GaAs interdigitated transducers; using finite-element-method-based parametric analysis and experimental comparison
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Includes: Supplementary data
Journal Articles

Evolution of lithography-to-etch bias in multi-patterning processes

Editor’s Pick
Prem Panneerchelvam, Ankur Agarwal, Chad M. Huard, Alessandro Vaglio Pret, Antonio Mani, Roel Gronheid, Marc Demand, Kaushik Kumar, Sara Paolillo, Frederic Lazzarino
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062601 (2022)
https://doi.org/10.1116/6.0002059
Published: September 2022
View article titled, Evolution of lithography-to-etch bias in multi-patterning processes
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Journal Articles

Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist

D. J. Thoen, V. Murugesan, A. Pascual Laguna, K. Karatsu, A. Endo, J. J. A. Baselmans
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 052603 (2022)
https://doi.org/10.1116/6.0001918
Published: September 2022
View article titled, Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist
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Journal Articles

Analysis of diffraction-based wafer alignment rejection for thick aluminum process

Liang Li, Chao Chen, Hui Zeng, Shiyi Hu, Libin Zhang, Yajuan Su, Yayi Wei, Tianchun Ye, Yun Wang, Jing Xue
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022603 (2022)
https://doi.org/10.1116/6.0001666
Published: March 2022
View article titled, Analysis of diffraction-based wafer alignment rejection for thick aluminum process
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Journal Articles

Patterning characteristic control of sol-gel-derived random-structure oligomeric silsesquioxanes having a diazonaphthoquinone derivative

Mitsuhito Suwa, Masao Kamogawa, Manami Fujii, Takuya Nishiyama, Hiromitsu Kozuka
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022602 (2022)
https://doi.org/10.1116/6.0001717
Published: March 2022
View article titled, Patterning characteristic control of sol-gel-derived random-structure oligomeric silsesquioxanes having a diazonaphthoquinone derivative
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Journal Articles

Gate offset and emitter design effects of triode cold cathode electron beams on focal spot sizes for x-ray imaging techniques

Editor’s Pick
Yi Yin Yu, Kyu Chang Park
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022204 (2022)
https://doi.org/10.1116/6.0001588
Published: February 2022
View article titled, Gate offset and emitter design effects of triode cold cathode electron beams on focal spot sizes for x-ray imaging techniques
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Journal Articles

Spectroscopic, structural, and strain-dependent analysis of suspended bulk WSe2 sheets

Avra S. Bandyopadhyay, Anupama B. Kaul
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022202 (2022)
https://doi.org/10.1116/6.0001371
Published: February 2022
View article titled, Spectroscopic, structural, and strain-dependent analysis of suspended bulk WSe<sub>2</sub> sheets
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Includes: Supplementary data
Journal Articles

Method to create cuprate tunnel junctions with atomically sharp interfaces

Anthony T. Bollinger, Xi He, Xiaotao Xu, Xiaoyan Shi, Ivan Božović
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 015001 (2022)
https://doi.org/10.1116/6.0001487
Published: December 2021
View article titled, Method to create cuprate tunnel junctions with atomically sharp interfaces
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Journal Articles

Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling

Rajiv Sejpal, Bruce Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062604 (2021)
https://doi.org/10.1116/6.0001298
Published: November 2021
View article titled, Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling
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