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Journal Articles

Film characteristics of atmospheric pressure plasma-treated chitosan solution

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Vera Angela Siao, Christian Lorenz Mahinay, Catherine Joy Dela Cruz, Kathrina Lois Taaca
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 024001 (2025)
https://doi.org/10.1116/6.0004076
Published: January 2025
View articletitled, Film characteristics of atmospheric pressure plasma-treated chitosan solution
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Journal Articles

Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures

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Andrew J. Knoll, Adam Pranda, Hoki Lee, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031802 (2019)
https://doi.org/10.1116/1.5092969
Published: April 2019
View articletitled, Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures
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Journal Articles

Polymer nanocomposites with improved resistance to ionizing radiation

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Vesna Borjanović, Lahorija Bistričić, Lara Mikac, Gary E. McGuire, Ivana Zamboni, Milko Jakšić, Olga Shenderova
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 041803 (2012)
https://doi.org/10.1116/1.4724310
Published: June 2012
View articletitled, Polymer nanocomposites with improved resistance to ionizing radiation
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Journal Articles

Quantitative investigation of hydrogen bonds on Si(100) surfaces prepared by vapor phase epitaxy

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Anja Dobrich, Peter Kleinschmidt, Henning Döscher, Thomas Hannappel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 04D114 (2011)
https://doi.org/10.1116/1.3609253
Published: August 2011
View articletitled, Quantitative investigation of hydrogen bonds on Si(100) surfaces prepared by vapor phase epitaxy
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Journal Articles

Fabrication of poly(ethylene glycol) hydrogel structures for pharmaceutical applications using electron beam and optical lithography

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Misuk Bae, Richard A. Gemeinhart, Ralu Divan, Kamlesh J. Suthar, Derrick C. Mancini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6P24–C6P29 (2010)
https://doi.org/10.1116/1.3517716
Published: November 2010
View articletitled, Fabrication of poly(ethylene glycol) hydrogel structures for pharmaceutical applications using electron beam and optical lithography
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Journal Articles

Physicochemical and electrical characterizations of atomic layer deposition grown HfO 2 on TiN and Pt for metal-insulator-metal application

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C. Jorel, C. Vallée, E. Gourvest, B. Pelissier, M. Kahn, M. Bonvalot, P. Gonon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 378–383 (2009)
https://doi.org/10.1116/1.3021036
Published: February 2009
View articletitled, Physicochemical and electrical characterizations of atomic layer deposition grown HfO 2 on TiN and Pt for metal-insulator-metal application
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Journal Articles

Etching of porous SiOCH materials in fluorocarbon-based plasmas

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N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, N. Rochat
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2772–2784 (2004)
https://doi.org/10.1116/1.1815316
Published: November 2004
View articletitled, Etching of porous SiOCH materials in fluorocarbon-based plasmas
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Journal Articles

Theoretical and experimental investigation of ultrathin oxynitrides and the role of nitrogen at the Si – SiO 2 interface

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A. A. Demkov, R. Liu, Xiaodong Zhang, Heather Loechelt
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 2388–2394 (2000)
https://doi.org/10.1116/1.1288946
Published: September 2000
View articletitled, Theoretical and experimental investigation of ultrathin oxynitrides and the role of nitrogen at the Si – SiO 2 interface
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Journal Articles

Investigation of low temperature SiO2 plasma enhanced chemical vapor deposition

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Shashank C. Deshmukh, Eray S. Aydil
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 738–743 (1996)
https://doi.org/10.1116/1.588707
Published: March 1996
View articletitled, Investigation of low temperature SiO2 plasma enhanced chemical vapor deposition
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Journal Articles

Real time in situ monitoring of surfaces during glow discharge processing: NH3 and H2 plasma passivation of GaAs

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Eray S. Aydil, Zhen H. Zhou, Richard A. Gottscho, Yves J. Chabal
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 13, 258–267 (1995)
https://doi.org/10.1116/1.588361
Published: March 1995
View articletitled, Real time in situ monitoring of surfaces during glow discharge processing: NH3 and H2 plasma passivation of GaAs
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