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Journal Articles

Focused ion beams from GaBiLi liquid metal alloy ion sources for nanofabrication and ion imaging

Achim Nadzeyka, Torsten Richter, Paul Mazarov, Fabian Meyer, Alexander Ost, Lars Bruchhaus

J. Vac. Sci. Technol. B 41, 062802 (2023)

https://doi.org/10.1116/6.0002918

Published: October 2023

View article titled, Focused ion beams from GaBiLi liquid metal alloy ion sources for nanofabrication and ion imaging

Journal Articles

Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization

Ziam Ghaznavi, Nicholas Butcher, Dragan Djurdjanovic, S. V. Sreenivasan

J. Vac. Sci. Technol. B 41, 022802 (2023)

https://doi.org/10.1116/6.0002261

Published: February 2023

View article titled, Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization

Includes: Supplementary data

Journal Articles

Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser

Vineeth Sasidharan, Alexander Neumann, S. R. J. Brueck

J. Vac. Sci. Technol. B 39, 062603 (2021)

https://doi.org/10.1116/6.0001377

Published: November 2021

View article titled, Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser

Journal Articles

Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research

Mario Baum, Christoph Meinecke, Thomas Blaudeck, Christian Helke, Danny Reuter, Karla Hiller, Sascha Hermann, Stefan E. Schulz, Harald Kuhn

J. Vac. Sci. Technol. B 39, 062805 (2021)

https://doi.org/10.1116/6.0001299

Published: November 2021

View article titled, Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research

Journal Articles

Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures

Yang H. Ban, Roger T. Bonnecaze

J. Vac. Sci. Technol. B 39, 012601 (2021)

https://doi.org/10.1116/6.0000648

Published: December 2020

View article titled, Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures

Journal Articles

High-throughput nanomanufacturing of synthetic antiferromagnet-polymer nanoparticles with high magnetic moment, very low remanence, and high magnetic susceptibility for biomedical applications

Ivan Nekrashevich, Long Chang, Dmitri Litvinov

J. Vac. Sci. Technol. B 37, 022801 (2019)

https://doi.org/10.1116/1.5067280

Published: January 2019

View article titled, High-throughput nanomanufacturing of synthetic antiferromagnet-polymer nanoparticles with high magnetic moment, very low remanence, and high magnetic susceptibility for biomedical applications

Journal Articles

Double nanoimprint lithography: A technology for effectively reducing feature size

Xiaohao Ma, Dandan Deng, Dehu Cui

J. Vac. Sci. Technol. B 35, 06G304 (2017)

https://doi.org/10.1116/1.4991631

Published: October 2017

View article titled, Double nanoimprint lithography: A technology for effectively reducing feature size

Journal Articles

Employing refractive beam shaping in a Lloyd's interference lithography system for uniform periodic nanostructure formation

Yung-Jr Hung, Han-Jung Chang, Ping-Chien Chang, Jia-Jin Lin, Tzu-Chieh Kao

J. Vac. Sci. Technol. B 35, 030601 (2017)

https://doi.org/10.1116/1.4980134

Published: April 2017

View article titled, Employing refractive beam shaping in a Lloyd's interference lithography system for uniform periodic nanostructure formation

Journal Articles

Sub-10 nm plasma nanopatterning of InGaAs with nearly vertical and smooth sidewalls for advanced n-fin field effect transistors on silicon

Fares Chouchane, Bassem Salem, Guillaume Gay, Mickael Martin, Erwine Pargon, Franck Bassani, Sandrine Arnaud, Sylvain David, Reynald Alcotte, Sébastien Labau, Jérémy Moeyart, Thierry Baron

J. Vac. Sci. Technol. B 35, 021206 (2017)

https://doi.org/10.1116/1.4975796

Published: February 2017

View article titled, Sub-10 nm plasma nanopatterning of InGaAs with nearly vertical and smooth sidewalls for advanced n-fin field effect transistors on silicon

Journal Articles

Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography

Shumin Yang, Jun Zhao, Liansheng Wang, Fangyuan Zhu, Chaofan Xue, Haigang Liu, Huazheng Sang, Yanqing Wu, Renzhong Tai

J. Vac. Sci. Technol. B 35, 021601 (2017)

https://doi.org/10.1116/1.4974930

Published: January 2017

View article titled, Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography

Journal Articles

Novel soft stamp development for direct micro- and nano-patterning of macroscopic curved surfaces

Su Hui Lim, Hong Yee Low, Wui Siew Tan

J. Vac. Sci. Technol. B 34, 011602 (2016)

https://doi.org/10.1116/1.4938075

Published: January 2016

View article titled, Novel soft stamp development for direct micro- and nano-patterning of macroscopic curved surfaces

Includes: Supplementary data

Journal Articles

Nanopatterning process based on epitaxial masking for the fabrication of electronic and spintronic devices made of La_0.67Sr_0.33MnO₃/LaAlO₃/SrTiO₃ heterostructures with in situ interfaces

Francesca Telesio, Luca Pellegrino, Ilaria Pallecchi, Daniele Marré, Emanuela Esposito, Emiliano di Gennaro, Amit Khare, Fabio Miletto Granozio

J. Vac. Sci. Technol. B 34, 011208 (2016)

https://doi.org/10.1116/1.4938484

Published: December 2015

View article titled, Nanopatterning process based on epitaxial masking for the fabrication of electronic and spintronic devices made of La0.67Sr0.33MnO3/LaAlO3/SrTiO3 heterostructures with in situ interfaces

Journal Articles

Direct fabrication of high aspect-ratio metal oxide nanopatterns via sequential infiltration synthesis in lithographically defined SU-8 templates

Chang-Yong Nam, Aaron Stein, Kim Kisslinger

J. Vac. Sci. Technol. B 33, 06F201 (2015)

https://doi.org/10.1116/1.4929508

Published: August 2015

View article titled, Direct fabrication of high aspect-ratio metal oxide nanopatterns via sequential infiltration synthesis in lithographically defined SU-8 templates

Journal Articles

Nanoscaffold's stiffness affects primary cortical cell network formation

Sijia Xie, Bart Schurink, Floor Wolbers, Regina Luttge, Gerco Hassink

J. Vac. Sci. Technol. B 32, 06FD03 (2014)

https://doi.org/10.1116/1.4900420

Published: October 2014

View article titled, Nanoscaffold's stiffness affects primary cortical cell network formation

Journal Articles

Thermal roll-to-roll imprinted nanogratings on plastic film

Noriyuki Unno, Tapio Mäkelä, Jun Taniguchi

J. Vac. Sci. Technol. B 32, 06FG03 (2014)

https://doi.org/10.1116/1.4897132

Published: October 2014

View article titled, Thermal roll-to-roll imprinted nanogratings on plastic film

Journal Articles

Study of multilayer systems in electron beam lithography

Robert Peters, Taras Fito, Luis Gutierrez-Rivera, Steven Dew, Maria Stepanova

J. Vac. Sci. Technol. B 31, 06F407 (2013)

https://doi.org/10.1116/1.4827813

Published: November 2013

View article titled, Study of multilayer systems in electron beam lithography

Includes: Supplementary data

Journal Articles

Control of the structure and density of silver nanoparticles obtained by laser-induced chemical deposition from liquids

Carlos A. Jarro, Matthew Bresin, J. Todd Hastings

J. Vac. Sci. Technol. B 31, 06F303 (2013)

https://doi.org/10.1116/1.4824328

Published: October 2013

View article titled, Control of the structure and density of silver nanoparticles obtained by laser-induced chemical deposition from liquids

Journal Articles

Fabrication of hierarchical nanostructures using free-standing trilayer membrane

Ke Du, Yuyang Liu, Ishan Wathuthanthri, Chang-Hwan Choi

J. Vac. Sci. Technol. B 31, 06FF04 (2013)

https://doi.org/10.1116/1.4821655

Published: September 2013

View article titled, Fabrication of hierarchical nanostructures using free-standing trilayer membrane

Journal Articles

Cross-linking control during imprint for hybrid lithography

Khalid Dhima, Christian Steinberg, Saskia Möllenbeck, Andre Mayer, Si Wang, Hella-Christin Scheer

J. Vac. Sci. Technol. B 30, 06FB08 (2012)

https://doi.org/10.1116/1.4763357

Published: October 2012

View article titled, Cross-linking control during imprint for hybrid lithography

Journal Articles

High resolution patterning on nonplanar substrates with large height variation using electron beam lithography

Vishva Ray, Yukinori Aida, Ryo Funakoshi, Hitoshi Kato, Stella W. Pang

J. Vac. Sci. Technol. B 30, 06F303 (2012)

https://doi.org/10.1116/1.4755819

Published: October 2012

View article titled, High resolution patterning on nonplanar substrates with large height variation using electron beam lithography

NARROW

Topics

Focused ion beams from GaBiLi liquid metal alloy ion sources for nanofabrication and ion imaging

Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization

Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser

Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research

Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures

High-throughput nanomanufacturing of synthetic antiferromagnet-polymer nanoparticles with high magnetic moment, very low remanence, and high magnetic susceptibility for biomedical applications

Double nanoimprint lithography: A technology for effectively reducing feature size

Employing refractive beam shaping in a Lloyd's interference lithography system for uniform periodic nanostructure formation

Sub-10 nm plasma nanopatterning of InGaAs with nearly vertical and smooth sidewalls for advanced n-fin field effect transistors on silicon

Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography

Novel soft stamp development for direct micro- and nano-patterning of macroscopic curved surfaces

Nanopatterning process based on epitaxial masking for the fabrication of electronic and spintronic devices made of La_0.67Sr_0.33MnO₃/LaAlO₃/SrTiO₃ heterostructures with in situ interfaces

Direct fabrication of high aspect-ratio metal oxide nanopatterns via sequential infiltration synthesis in lithographically defined SU-8 templates

Nanoscaffold's stiffness affects primary cortical cell network formation

Thermal roll-to-roll imprinted nanogratings on plastic film

Study of multilayer systems in electron beam lithography

Control of the structure and density of silver nanoparticles obtained by laser-induced chemical deposition from liquids

Fabrication of hierarchical nanostructures using free-standing trilayer membrane

Cross-linking control during imprint for hybrid lithography

High resolution patterning on nonplanar substrates with large height variation using electron beam lithography

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