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Journal Articles

Optical metasurface fabricated using 3D nanoimprint lithography

Editor’s Pick
Jiacheng Ye, Yunxiang Wang, Zhexiang Tang, Zerui Liu, Hongming Zhang, Ting-Hao Hsu, Sushmit Hossain, Nishat Tasnim Hiramony, Wei Wu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062212 (2024)
https://doi.org/10.1116/6.0004039
Published: December 2024
View article titled, Optical metasurface fabricated using 3D nanoimprint lithography
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Journal Articles

Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning

Featured
Yasser Pordeli, Céline Steenge, Erwin J. W. Berenschot, Ray J. E. Hueting, Andrea Migliorini, Stuart S. P. Parkin, Niels R. Tas
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062805 (2024)
https://doi.org/10.1116/6.0004024
Published: November 2024
View article titled, Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning
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Journal Articles

Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness

Naoki Takano, Hiromasa Niinomi, Tomoya Oshikiri, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042603 (2024)
https://doi.org/10.1116/6.0003779
Published: July 2024
View article titled, Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness
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Journal Articles

Lithography mask thermal and stress effect for the machine overlay compensation

Dinghai Rui, Libin Zhang, Hao Shen, Huwen Ding, Shuang Liu, Yayi Wei, Yajuan Su
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042601 (2024)
https://doi.org/10.1116/6.0003693
Published: July 2024
View article titled, Lithography mask thermal and stress effect for the machine overlay compensation
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Journal Articles

Nanoimprint lithography guiding templates for advanced magnetic media fabrication

Editor’s Pick
Daniel Staaks, Yautzong Hsu, Kim Y. Lee, Philip L. Steiner, Zhaoning Yu, Jason J. Wu, ShuaiGang Xiao, XiaoMin Yang, Thomas Y. Chang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 013801 (2024)
https://doi.org/10.1116/6.0003210
Published: January 2024
View article titled, Nanoimprint lithography guiding templates for advanced magnetic media fabrication
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Includes: Supplementary data
Journal Articles

Focused ion beams from GaBiLi liquid metal alloy ion sources for nanofabrication and ion imaging

Achim Nadzeyka, Torsten Richter, Paul Mazarov, Fabian Meyer, Alexander Ost, Lars Bruchhaus
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062802 (2023)
https://doi.org/10.1116/6.0002918
Published: October 2023
View article titled, Focused ion beams from GaBiLi liquid metal alloy ion sources for nanofabrication and ion imaging
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Journal Articles

Evaluation of quality of thick photoresist film by acoustic resonant imaging technique

Hyelin Kim, Hironori Tohmyoh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022601 (2023)
https://doi.org/10.1116/6.0002459
Published: February 2023
View article titled, Evaluation of quality of thick photoresist film by acoustic resonant imaging technique
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Journal Articles

Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization

Ziam Ghaznavi, Nicholas Butcher, Dragan Djurdjanovic, S. V. Sreenivasan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022802 (2023)
https://doi.org/10.1116/6.0002261
Published: February 2023
View article titled, Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization
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Includes: Supplementary data
Journal Articles

Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests

Editor’s Pick
J. van Veldhoven, C.-C. Wu, A. J. Storm, M. van Putten, J. R. Meijlink, A. G. Ushakov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012603 (2023)
https://doi.org/10.1116/6.0002132
Published: January 2023
View article titled, Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests
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Journal Articles

Zernike model for overlay control and tool monitor for lithography and etch process

Libin Zhang, Yaobin Feng, Zhen Song, Shang Yang, Yayi Wei
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062604 (2022)
https://doi.org/10.1116/6.0002239
Published: November 2022
View article titled, Zernike model for overlay control and tool monitor for lithography and etch process
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Journal Articles

Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography

Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062602 (2022)
https://doi.org/10.1116/6.0002099
Published: November 2022
View article titled, Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography
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Includes: Supplementary data
Journal Articles

Stochastic defect removal coating for high-performance extreme ultraviolet lithography

Young Joo Choi, Ran Namgung, Jun Soo Kim, Dae Seok Song, Hyeon Park, Shin-hyo Bae, Min-Ki Chon, Min Soo Kim, Hyun-Ji Song, Hyun-Woo Kim, Suk Koo Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 042602 (2022)
https://doi.org/10.1116/6.0001723
Published: May 2022
View article titled, Stochastic defect removal coating for high-performance extreme ultraviolet lithography
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Journal Articles

Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum

Kohei Chiba, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 032601 (2022)
https://doi.org/10.1116/6.0001747
Published: April 2022
View article titled, Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum
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Includes: Supplementary data
Journal Articles

Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser

Editor’s Pick
Vineeth Sasidharan, Alexander Neumann, S. R. J. Brueck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062603 (2021)
https://doi.org/10.1116/6.0001377
Published: November 2021
View article titled, Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser
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Journal Articles

Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research

Mario Baum, Christoph Meinecke, Thomas Blaudeck, Christian Helke, Danny Reuter, Karla Hiller, Sascha Hermann, Stefan E. Schulz, Harald Kuhn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062805 (2021)
https://doi.org/10.1116/6.0001299
Published: November 2021
View article titled, Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research
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Journal Articles

Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution

Elizabeth M. Ashley, Peter J. Duda, III, Paul F. Nealey
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 064005 (2021)
https://doi.org/10.1116/6.0001287
Published: October 2021
View article titled, Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution
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Includes: Supplementary data
Journal Articles

PHIDL: Python-based layout and geometry creation for nanolithography

Adam N. McCaughan, Alexander N. Tait, Sonia M. Buckley, Dylan M. Oh, Jeffrey T. Chiles, Jeffrey M. Shainline, Sae Woo Nam
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062601 (2021)
https://doi.org/10.1116/6.0001203
Published: September 2021
View article titled, PHIDL: <sc>Python</sc>-based layout and geometry creation for nanolithography
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Journal Articles

Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint

Editor’s Pick
Sijia Xie, Jan Erjawetz, Christine Schuster, Helmut Schift
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052603 (2021)
https://doi.org/10.1116/6.0001206
Published: September 2021
View article titled, Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint
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Journal Articles

Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide

Chiaki Miyajima, Shunya Ito, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052804 (2021)
https://doi.org/10.1116/6.0001250
Published: September 2021
View article titled, Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide
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Journal Articles

Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum

Editor’s Pick
Chiaki Miyajima, Shunya Ito, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 032603 (2021)
https://doi.org/10.1116/6.0001014
Published: May 2021
View article titled, Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum
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