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Journal Articles

Focused ion beams from GaBiLi liquid metal alloy ion sources for nanofabrication and ion imaging

Achim Nadzeyka, Torsten Richter, Paul Mazarov, Fabian Meyer, Alexander Ost, Lars Bruchhaus
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062802 (2023)
https://doi.org/10.1116/6.0002918
Published: October 2023
View article titled, Focused ion beams from GaBiLi liquid metal alloy ion sources for nanofabrication and ion imaging
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Journal Articles

Evaluation of quality of thick photoresist film by acoustic resonant imaging technique

Hyelin Kim, Hironori Tohmyoh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022601 (2023)
https://doi.org/10.1116/6.0002459
Published: February 2023
View article titled, Evaluation of quality of thick photoresist film by acoustic resonant imaging technique
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Journal Articles

Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization

Ziam Ghaznavi, Nicholas Butcher, Dragan Djurdjanovic, S. V. Sreenivasan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022802 (2023)
https://doi.org/10.1116/6.0002261
Published: February 2023
View article titled, Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization
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Includes: Supplementary data
Journal Articles

Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests

J. van Veldhoven, C.-C. Wu, A. J. Storm, M. van Putten, J. R. Meijlink, A. G. Ushakov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012603 (2023)
https://doi.org/10.1116/6.0002132
Published: January 2023
View article titled, Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests
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Journal Articles

Zernike model for overlay control and tool monitor for lithography and etch process

Libin Zhang, Yaobin Feng, Zhen Song, Shang Yang, Yayi Wei
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062604 (2022)
https://doi.org/10.1116/6.0002239
Published: November 2022
View article titled, Zernike model for overlay control and tool monitor for lithography and etch process
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Journal Articles

Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography

Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062602 (2022)
https://doi.org/10.1116/6.0002099
Published: November 2022
View article titled, Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography
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Includes: Supplementary data
Journal Articles

Stochastic defect removal coating for high-performance extreme ultraviolet lithography

Young Joo Choi, Ran Namgung, Jun Soo Kim, Dae Seok Song, Hyeon Park, Shin-hyo Bae, Min-Ki Chon, Min Soo Kim, Hyun-Ji Song, Hyun-Woo Kim, Suk Koo Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 042602 (2022)
https://doi.org/10.1116/6.0001723
Published: May 2022
View article titled, Stochastic defect removal coating for high-performance extreme ultraviolet lithography
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Journal Articles

Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum

Kohei Chiba, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 032601 (2022)
https://doi.org/10.1116/6.0001747
Published: April 2022
View article titled, Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum
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Includes: Supplementary data
Journal Articles

Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser

Vineeth Sasidharan, Alexander Neumann, S. R. J. Brueck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062603 (2021)
https://doi.org/10.1116/6.0001377
Published: November 2021
View article titled, Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser
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Journal Articles

Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research

Mario Baum, Christoph Meinecke, Thomas Blaudeck, Christian Helke, Danny Reuter, Karla Hiller, Sascha Hermann, Stefan E. Schulz, Harald Kuhn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062805 (2021)
https://doi.org/10.1116/6.0001299
Published: November 2021
View article titled, Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research
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Journal Articles

Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution

Elizabeth M. Ashley, Peter J. Duda, III, Paul F. Nealey
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 064005 (2021)
https://doi.org/10.1116/6.0001287
Published: October 2021
View article titled, Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution
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Includes: Supplementary data
Journal Articles

PHIDL: Python-based layout and geometry creation for nanolithography

Adam N. McCaughan, Alexander N. Tait, Sonia M. Buckley, Dylan M. Oh, Jeffrey T. Chiles, Jeffrey M. Shainline, Sae Woo Nam
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062601 (2021)
https://doi.org/10.1116/6.0001203
Published: September 2021
View article titled, PHIDL: <sc>Python</sc>-based layout and geometry creation for nanolithography
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Journal Articles

Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint

Sijia Xie, Jan Erjawetz, Christine Schuster, Helmut Schift
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052603 (2021)
https://doi.org/10.1116/6.0001206
Published: September 2021
View article titled, Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint
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Journal Articles

Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide

Chiaki Miyajima, Shunya Ito, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052804 (2021)
https://doi.org/10.1116/6.0001250
Published: September 2021
View article titled, Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide
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Journal Articles

Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum

Chiaki Miyajima, Shunya Ito, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 032603 (2021)
https://doi.org/10.1116/6.0001014
Published: May 2021
View article titled, Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum
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Journal Articles

Nanometer-scale capillary-driven flow and molecular weight govern polymer nanostructure deposition from a heated tip

Sihan Chen, William P. King
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 032601 (2021)
https://doi.org/10.1116/6.0000958
Published: April 2021
View article titled, Nanometer-scale capillary-driven flow and molecular weight govern polymer nanostructure deposition from a heated tip
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Journal Articles

Formation of ideally ordered porous anodic zirconia by anodization of vacuum deposited Zr on molds

Toshiaki Kondo, Touko Tamura, Takashi Yanagishita, Hideki Masuda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 020601 (2021)
https://doi.org/10.1116/6.0000864
Published: February 2021
View article titled, Formation of ideally ordered porous anodic zirconia by anodization of vacuum deposited Zr on molds
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Journal Articles

Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures

Yang H. Ban, Roger T. Bonnecaze
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 012601 (2021)
https://doi.org/10.1116/6.0000648
Published: December 2020
View article titled, Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures
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Journal Articles

nanolithography toolbox—Simplifying the design complexity of microfluidic chips

Haoqing Zhang, Jan Pekárek, Jianguo Feng, Xiaocheng Liu, Huanan Li, Hanliang Zhu, Vojtěch Svatoš, Imrich Gablech, Pavel Podešva, Sheng Ni, Levent Yobas, Pavel Neužil
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 063002 (2020)
https://doi.org/10.1116/6.0000562
Published: November 2020
View article titled, <sc>nanolithography toolbox</sc>—Simplifying the design complexity of microfluidic chips
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Includes: Supplementary data
Journal Articles

Direct imprinting of TiO2 patterns on highly curved substrates

Ming Luo, Xin Hu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 062604 (2020)
https://doi.org/10.1116/6.0000554
Published: October 2020
View article titled, Direct imprinting of TiO<sub>2</sub> patterns on highly curved substrates
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Includes: Supplementary data