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Journal Articles

Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications

FeaturedScilight
A. S. Stodolna, T. W. Mechielsen, P. van der Walle, C. Meekes, H. Lensen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 052601 (2024)
https://doi.org/10.1116/6.0003701
Published: August 2024
View article titled, Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
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Journal Articles

Calibrated in-vacuum quantum efficiency system for metallic and III-V thin-film photocathodes

Editor’s Pick
Atif Rasheed, Christopher Benjamin, Ibrahim Elhoussieny, Yorck A. Ramachers, Gavin R. Bell
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 064006 (2023)
https://doi.org/10.1116/6.0002904
Published: December 2023
View article titled, Calibrated in-vacuum quantum efficiency system for metallic and III-V thin-film photocathodes
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Journal Articles

Surface modification of s235 steel, molybdenum, and tungsten using electron beam scanning and electric discharge machining

Piotr Konarski, Joachim Ażgin, Aleksander Zawada, Sung-Hui Feng, Ching-Hsiang Chien, Dong-Yea Sheu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044205 (2023)
https://doi.org/10.1116/6.0002605
Published: June 2023
View article titled, Surface modification of s235 steel, molybdenum, and tungsten using electron beam scanning and electric discharge machining
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Includes: Supplementary data
Journal Articles

Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs(110) facets

D. S. Rosenzweig, M. Schnedler, R. E. Dunin-Borkowski, Ph. Ebert, H. Eisele
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044202 (2023)
https://doi.org/10.1116/6.0002733
Published: May 2023
View article titled, Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs(110) facets
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Journal Articles

Electronic structure of InSb (001), (110), and (111)B surfaces

Editor’s Pick
Jason T. Dong, Hadass S. Inbar, Mihir Pendharkar, Teun A. J. van Schijndel, Elliot C. Young, Connor P. Dempsey, Christopher J. Palmstrøm
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 032808 (2023)
https://doi.org/10.1116/6.0002606
Published: May 2023
View article titled, Electronic structure of InSb (001), (110), and (111)B surfaces
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Includes: Supplementary data
Journal Articles

Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?

Charles W. Magee, Temel H. Buyuklimanli
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 030803 (2023)
https://doi.org/10.1116/6.0002466
Published: April 2023
View article titled, Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?
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Journal Articles

Characterization of pulsed laser deposited La2O2S:Eu3+ thin films and effect of coating with graphene oxide layers

Boitumelo C. Tladi, Hendrik C. Swart, Robin E. Kroon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022204 (2023)
https://doi.org/10.1116/6.0002266
Published: February 2023
View article titled, Characterization of pulsed laser deposited La<sub>2</sub>O<sub>2</sub>S:Eu<sup>3+</sup> thin films and effect of coating with graphene oxide layers
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Journal Articles

Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step

R. Dawant, S. Ecoffey, D. Drouin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062603 (2022)
https://doi.org/10.1116/6.0002116
Published: November 2022
View article titled, Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step
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Journal Articles

Low trap density of oxygen-rich HfO2/GaN interface for GaN MIS-HEMT applications

Wei-Chih Cheng, Jiaqi He, Minghao He, Zepeng Qiao, Yang Jiang, Fangzhou Du, Xiang Wang, Haimin Hong, Qing Wang, Hongyu Yu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022212 (2022)
https://doi.org/10.1116/6.0001654
Published: March 2022
View article titled, Low trap density of oxygen-rich HfO<sub>2</sub>/GaN interface for GaN MIS-HEMT applications
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Journal Articles

Hydrogen etching of the SiC(0001) surface at moderate temperature

Toshiya Hamasaki, Kazuma Yagyu, Hisashi Mitani, Takashi Nishida, Hiroshi Tochihara, Takayuki Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052801 (2021)
https://doi.org/10.1116/6.0001147
Published: July 2021
View article titled, Hydrogen etching of the SiC(0001) surface at moderate temperature
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Journal Articles

Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications

Sae Tanaka, Hayate Endo, Akira Shirakura, Shinya Kudo, Tetsuya Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 040602 (2021)
https://doi.org/10.1116/6.0001040
Published: June 2021
View article titled, Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications
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Journal Articles

Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment

Chen Li, Thorsten Hofmann, Klaus Edinger, Valery Godyak, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 032208 (2020)
https://doi.org/10.1116/1.5143538
Published: April 2020
View article titled, Etching of Si<sub>3</sub>N<sub>4</sub> induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment
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Journal Articles

Ultrathin initiated chemical vapor deposition polymer interfacial energy control for directed self-assembly hole-shrink applications

Editor’s Pick
Moshe Dolejsi, Priya Moni, Cody T. Bezik, Chun Zhou, Juan J. de Pablo, Karen K. Gleason, Paul F. Nealey
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061804 (2019)
https://doi.org/10.1116/1.5121541
Published: October 2019
View article titled, Ultrathin initiated chemical vapor deposition polymer interfacial energy control for directed self-assembly hole-shrink applications
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Journal Articles

Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process

Jonathan England, Jaap Van den Berg, Andrew Rossall
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031206 (2019)
https://doi.org/10.1116/1.5088958
Published: April 2019
View article titled, Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process
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Journal Articles

Characterization of arsenic plasma doping and postimplant processing of silicon using medium energy ion scattering

Jaap van den Berg, Andrew Rossall, Jonathan England
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 032901 (2019)
https://doi.org/10.1116/1.5088954
Published: April 2019
View article titled, Characterization of arsenic plasma doping and postimplant processing of silicon using medium energy ion scattering
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Journal Articles

Two-stage reactive ion etching of AlGaN/GaN high electron mobility transistor type heterostructures

Sławomir Owczarzak, Andrzej Stafiniak, Regina Paszkiewicz
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 011204 (2019)
https://doi.org/10.1116/1.5064778
Published: January 2019
View article titled, Two-stage reactive ion etching of AlGaN/GaN high electron mobility transistor type heterostructures
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Journal Articles

Modeling the topography of uneven substrates post spin-coating

Stefan Decoster, Xiaoyu Piao, Werner Gillijns, Frédéric Lazzarino
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 03E102 (2018)
https://doi.org/10.1116/1.5022166
Published: March 2018
View article titled, Modeling the topography of uneven substrates post spin-coating
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Journal Articles

Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications

Nathan Marchack, Hiroyuki Miyazoe, Robert L. Bruce, Hsinyu Tsai, Masahiro Nakamura, Takefumi Suzuki, Azumi Ito, Hirokazu Matsumoto, Sebastian U. Engelmann, Eric A. Joseph
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 031801 (2018)
https://doi.org/10.1116/1.5020069
Published: March 2018
View article titled, Nitride etching with hydrofluorocarbons. II. Evaluation of C<sub>4</sub>H<sub>9</sub>F for tight pitch Si<sub>3</sub>N<sub>4</sub> patterning applications
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Journal Articles

Innovative metallic solutions for alpine ski bases

Francesco Ripamonti, Valentina Furlan, Ali G. Demir, Barbara Previtali, Michele Derai, Federico Cheli, Paolo M. Ossi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 01A108 (2018)
https://doi.org/10.1116/1.5002542
Published: January 2018
View article titled, Innovative metallic solutions for alpine ski bases
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Journal Articles

Assessing the manufacturing tolerances and uniformity of CMOS compatible metamaterial fabrication

Katherine M. Musick, Joel R. Wendt, Paul J. Resnick, Michael B. Sinclair, D. Bruce Burckel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 011208 (2018)
https://doi.org/10.1116/1.5009918
Published: January 2018
View article titled, Assessing the manufacturing tolerances and uniformity of CMOS compatible metamaterial fabrication
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