1-20 of 880
Light sensitive materials
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Direct writing immersion laser lithography on graphene monolayers using two-photon absorption

Jianran Zhang, Carsten Strobel, Kathrin Estel, Thomas Mikolajick, Robert Kirchner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062604 (2023)
https://doi.org/10.1116/6.0003017
Published: November 2023
View article titled, Direct writing immersion laser lithography on graphene monolayers using two-photon absorption
Open the PDF for Direct writing immersion laser lithography on graphene monolayers using two-photon absorption in another window
Journal Articles

Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication

Chen Zhu, Edward C. Kinzel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 033601 (2023)
https://doi.org/10.1116/6.0002557
Published: May 2023
View article titled, Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication
Open the PDF for Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication in another window
Journal Articles

Evaluation of quality of thick photoresist film by acoustic resonant imaging technique

Hyelin Kim, Hironori Tohmyoh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022601 (2023)
https://doi.org/10.1116/6.0002459
Published: February 2023
View article titled, Evaluation of quality of thick photoresist film by acoustic resonant imaging technique
Open the PDF for Evaluation of quality of thick photoresist film by acoustic resonant imaging technique in another window
Journal Articles

Surface property control for 193 nm immersion resist by addition of Si compound

Chen Tang, Atsushi Sekiguchi, Yosuke Ohta, Yoshihiko Hirai, Masaaki Yasuda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012602 (2023)
https://doi.org/10.1116/6.0002128
Published: January 2023
View article titled, Surface property control for 193 nm immersion resist by addition of Si compound
Open the PDF for Surface property control for 193 nm immersion resist by addition of Si compound in another window
Journal Articles

Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement

Katie Lutker-Lee, Jennifer Church, Eric Miller, Angelique Raley, Luciana Meli
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 032204 (2022)
https://doi.org/10.1116/6.0001665
Published: May 2022
View article titled, Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
Open the PDF for Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement in another window
Journal Articles

Patterning characteristic control of sol-gel-derived random-structure oligomeric silsesquioxanes having a diazonaphthoquinone derivative

Mitsuhito Suwa, Masao Kamogawa, Manami Fujii, Takuya Nishiyama, Hiromitsu Kozuka
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022602 (2022)
https://doi.org/10.1116/6.0001717
Published: March 2022
View article titled, Patterning characteristic control of sol-gel-derived random-structure oligomeric silsesquioxanes having a diazonaphthoquinone derivative
Open the PDF for Patterning characteristic control of sol-gel-derived random-structure oligomeric silsesquioxanes having a diazonaphthoquinone derivative in another window
Journal Articles

Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser

Vineeth Sasidharan, Alexander Neumann, S. R. J. Brueck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062603 (2021)
https://doi.org/10.1116/6.0001377
Published: November 2021
View article titled, Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser
Open the PDF for Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser in another window
Journal Articles

Multiplexing implementation of rubbing-induced site-selective growth of MoS2 feature arrays

Mingze Chen, Seung Ki, Xiaogan Liang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062203 (2021)
https://doi.org/10.1116/6.0001268
Published: October 2021
View article titled, Multiplexing implementation of rubbing-induced site-selective growth of MoS<sub>2</sub> feature arrays
Open the PDF for Multiplexing implementation of rubbing-induced site-selective growth of MoS<sub>2</sub> feature arrays in another window
Journal Articles

Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint

Sijia Xie, Jan Erjawetz, Christine Schuster, Helmut Schift
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052603 (2021)
https://doi.org/10.1116/6.0001206
Published: September 2021
View article titled, Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint
Open the PDF for Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint in another window
Journal Articles

Self-detached membranes with well-defined pore size, shape and distribution fabricated by underexposure photolithography

Tingjie Li, Peipei Jia, Kar Man Leung, Qiuquan Guo, Jun Yang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 042601 (2020)
https://doi.org/10.1116/6.0000203
Published: June 2020
View article titled, Self-detached membranes with well-defined pore size, shape and distribution fabricated by underexposure photolithography
Open the PDF for Self-detached membranes with well-defined pore size, shape and distribution fabricated by underexposure photolithography in another window
Journal Articles

Neural network-based model of photoresist reflow

Charmaine Chia, Joel Martis, Stefanie S. Jeffrey, Roger T. Howe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061604 (2019)
https://doi.org/10.1116/1.5116857
Published: October 2019
View article titled, Neural network-based model of photoresist reflow
Open the PDF for Neural network-based model of photoresist reflow in another window
Journal Articles

Investigation of ma-N 2400 series photoresist as an electron-beam resist for superconducting nanoscale devices

Emily Toomey, Marco Colangelo, Karl K. Berggren
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 051207 (2019)
https://doi.org/10.1116/1.5119516
Published: September 2019
View article titled, Investigation of ma-N 2400 series photoresist as an electron-beam resist for superconducting nanoscale devices
Open the PDF for Investigation of ma-N 2400 series photoresist as an electron-beam resist for superconducting nanoscale devices in another window
Journal Articles

Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication

Juan J. Faria-Briceno, Ruichao Zhu, Vineeth Sasidharan, Alexander Neumann, Shrawan Singhal, S. V. Sreenivasan, S. R. J. Brueck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 052904 (2019)
https://doi.org/10.1116/1.5119707
Published: September 2019
View article titled, Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication
Open the PDF for Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication in another window
Journal Articles

High-yield fabrication method for high-frequency graphene devices using titanium sacrificial layers

Panagiotis C. Theofanopoulos, Scott Ageno, Yuqi Guo, Suneet Kale, Qing Hua Wang, Georgios C. Trichopoulos
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 041801 (2019)
https://doi.org/10.1116/1.5098324
Published: June 2019
View article titled, High-yield fabrication method for high-frequency graphene devices using titanium sacrificial layers
Open the PDF for High-yield fabrication method for high-frequency graphene devices using titanium sacrificial layers in another window
Journal Articles

Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications

Jing Jiang, Byungki Jung, Michael O. Thompson, Christopher K. Ober
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 041601 (2019)
https://doi.org/10.1116/1.5086871
Published: June 2019
View article titled, Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications
Open the PDF for Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications in another window
Includes: Supplementary data
Journal Articles

On evaporation via an inclined rotating circular lift-off shadow or stencil mask

Steve Arscott
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 011602 (2019)
https://doi.org/10.1116/1.5057404
Published: December 2018
View article titled, On evaporation via an inclined rotating circular <em>lift-off</em> shadow or stencil mask
Open the PDF for On evaporation via an inclined rotating circular <em>lift-off</em> shadow or stencil mask in another window
Journal Articles

Progress in metal organic cluster EUV photoresists

Kazunori Sakai, Hong Xu, Vasiliki Kosma, Emmanuel P. Giannelis, Christopher K. Ober
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06J504 (2018)
https://doi.org/10.1116/1.5050942
Published: November 2018
View article titled, Progress in metal organic cluster EUV photoresists
Open the PDF for Progress in metal organic cluster EUV photoresists in another window
Journal Articles

Unbiased roughness measurements: Subtracting out SEM effects, part 2

Gian F. Lorusso, Vito Rutigliani, Frieda Van Roey, Chris A. Mack
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06J503 (2018)
https://doi.org/10.1116/1.5046477
Published: November 2018
View article titled, Unbiased roughness measurements: Subtracting out SEM effects, part 2
Open the PDF for Unbiased roughness measurements: Subtracting out SEM effects, part 2 in another window
Journal Articles

Fabrication and replication of re-entrant structures by nanoimprint lithography methods

Nikolaos Kehagias, Achille Francone, Markus Guttmann, Frank Winkler, Ariadna Fernández, Clivia M. Sotomayor Torres
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JF01 (2018)
https://doi.org/10.1116/1.5048241
Published: November 2018