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Journal Articles

Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling

Roshan J. Tirukkonda, Mark D. Kraman, Rahul Sharangpani, Kartik Sondhi, Aaron N. Fancher, Stephen R. Ross, Joyeeta Nag, Alexei L. Bogdanov, Raghuveer S. Makala, Senaka K. Kanakamedala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043202 (2023)
https://doi.org/10.1116/6.0002709
Published: June 2023
View article titled, Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling
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Includes: Supplementary data
Journal Articles

Ultrahigh vacuum-compatible sockets for pin grid arrays used in nanoscale and atomic physics

Jyoti Katoch, Cameron Glasscock, Masa Ishigami
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 023201 (2013)
https://doi.org/10.1116/1.4793278
Published: February 2013
View article titled, Ultrahigh vacuum-compatible sockets for pin grid arrays used in nanoscale and atomic physics
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Journal Articles

Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap

Falk Ullmann, Frank Grossmann, Vladimir P. Ovsyannikov, Jacques Gierak, Eric Bourhis, Jacques Ferré, Jean Pierre Jamet, Alexandra Mougin, Günter Zschornack
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2162–2167 (2007)
https://doi.org/10.1116/1.2799971
Published: December 2007
View article titled, Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap
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Journal Articles

Modeling of field-assisted emission from a negative electron affinity cathode

A. Mayer, M. S. Chung, N. Kumar, B. L. Weiss, N. M. Miskovsky, P. H. Cutler
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 109–114 (2007)
https://doi.org/10.1116/1.2404683
Published: January 2007
View article titled, Modeling of field-assisted emission from a negative electron affinity cathode
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Journal Articles

Micromachined piezoresistive proximal probe with integrated bimorph actuator for aligned single ion implantation

A. Persaud, K. Ivanova, Y. Sarov, Tzv. Ivanov, B. E. Volland, I. W. Rangelow, N. Nikolov, T. Schenkel, V. Djakov, D. W. K. Jenkins, J. Meijer, T. Vogel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 3148–3151 (2006)
https://doi.org/10.1116/1.2375079
Published: December 2006
View article titled, Micromachined piezoresistive proximal probe with integrated bimorph actuator for aligned single ion implantation
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Journal Articles

Soft mold and gasbag pressure mechanism for patterning submicron patterns onto a large concave substrate

Fang-Sung Cheng, Sen-Yeu Yang, Shih-Chih Nian, Lon A. Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1724–1727 (2006)
https://doi.org/10.1116/1.2209991
Published: June 2006
View article titled, Soft mold and gasbag pressure mechanism for patterning submicron patterns onto a large concave substrate
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Journal Articles

Ion implantation with scanning probe alignment

A. Persaud, J. A. Liddle, T. Schenkel, J. Bokor, Tzv. Ivanov, I. W. Rangelow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2798–2800 (2005)
https://doi.org/10.1116/1.2062628
Published: December 2005
View article titled, Ion implantation with scanning probe alignment
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Journal Articles

Field emitters for space application

S. E. Huq, B. J. Kent, R. Stevens, R. A. Lawes, N. S. Xu, J. C. She
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 988–991 (2001)
https://doi.org/10.1116/1.1366705
Published: May 2001
View article titled, Field emitters for space application
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Journal Articles

Atom technology project: Recent activities

Kazunobu Tanaka
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 3127–3131 (1998)
https://doi.org/10.1116/1.590450
Published: November 1998
View article titled, Atom technology project: Recent activities
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Journal Articles

Ion trap for mass-selective production of nanoclusters

Toshihiko Kanayama, Hirohiko Murakami
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 15, 2882–2886 (1997)
https://doi.org/10.1116/1.589749
Published: November 1997
View article titled, Ion trap for mass-selective production of nanoclusters
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