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Journal Articles

Focused helium ion beam nanofabrication by near-surface swelling

Editor’s Pick
Sherry Mo, Dana O. Byrne, Frances I. Allen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 022803 (2025)
https://doi.org/10.1116/6.0004100
Published: January 2025
View article titled, Focused helium ion beam nanofabrication by near-surface swelling
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Journal Articles

Epitaxial SiGeSn grown on Si by ion implantation

Chinenye U. Ekeruche, Mikayla Davila, Peter J. Simpson, Karen L. Kavanagh, Lyudmila V. Goncharova
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062206 (2024)
https://doi.org/10.1116/6.0003933
Published: November 2024
View article titled, Epitaxial SiGeSn grown on Si by ion implantation
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Journal Articles

Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods

X. Huang, S. Q. Lim, T. Ratcliff, L. A. Smillie, G. J. Grzybowski, B. B. Claflin, J. M. Warrender, J. S. Williams
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 044001 (2024)
https://doi.org/10.1116/6.0003668
Published: June 2024
View article titled, Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods
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Journal Articles

Monitoring of rapid thermal anneal with secondary ion mass spectrometry

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Z. X. Jiang, A. Ravi, T. Breeden, K. Khmelnitskiy, A. Duncan, D. Huynh, S. Butler, B. Granados, D. Acker, J. Luebbe, D. Sieloff, S. Bolton, G. Prieto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034007 (2024)
https://doi.org/10.1116/6.0003599
Published: May 2024
View article titled, Monitoring of rapid thermal anneal with secondary ion mass spectrometry
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Journal Articles

Effects of ion implantation with arsenic and boron in germanium-tin layers

Editor’s Pick
Sylvester Amoah, Hryhorii Stanchu, Grey Abernathy, Serhii Kryvyi, Fernando M. De Oliveira, Yuriy I. Mazur, Shangda Li, Shang Liu, Jifeng Liu, Wei Du, Baohua Li, Gregory Salamo, Shui-Qing Yu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034002 (2024)
https://doi.org/10.1116/6.0003565
Published: April 2024
View article titled, Effects of ion implantation with arsenic and boron in germanium-tin layers
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Includes: Supplementary data
Journal Articles

Optical properties of copper oxide thin films implanted with chromium ions

Katarzyna Ungeheuer, Konstanty W. Marszalek
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062208 (2023)
https://doi.org/10.1116/6.0003135
Published: December 2023
View article titled, Optical properties of copper oxide thin films implanted with chromium ions
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Journal Articles

Predicting the effects of plasma-induced damage on p–n junction leakage and its application in the characterization of defect distribution

Editor’s Pick
Yoshihiro Sato, Satoshi Shibata, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami, Keiichiro Urabe, Koji Eriguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062209 (2022)
https://doi.org/10.1116/6.0002181
Published: November 2022
View article titled, Predicting the effects of plasma-induced damage on p–n junction leakage and its application in the characterization of defect distribution
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Journal Articles

Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing

Kirill Misiiuk, Sam Lowrey, Richard Blaikie, Josselin Juras, Andrew Sommers, Jérôme Leveneur
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062206 (2021)
https://doi.org/10.1116/6.0001282
Published: October 2021
View article titled, Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing
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Journal Articles

Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution

Elizabeth M. Ashley, Peter J. Duda, III, Paul F. Nealey
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 064005 (2021)
https://doi.org/10.1116/6.0001287
Published: October 2021
View article titled, Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution
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Includes: Supplementary data
Journal Articles

Advances in secondary ion mass spectrometry for N-doped niobium

Jonathan W. Angle, Ari D. Palczewski, Charles E. Reece, Fred A. Stevie, Michael J. Kelley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 024004 (2021)
https://doi.org/10.1116/6.0000848
Published: March 2021
View article titled, Advances in secondary ion mass spectrometry for N-doped niobium
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Journal Articles

Effects of arsenic implantation and rapid thermal annealing on ZnO nanorods for p-type doping

Jinseok Choi, Sung Jin An
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 052202 (2020)
https://doi.org/10.1116/6.0000041
Published: July 2020
View article titled, Effects of arsenic implantation and rapid thermal annealing on ZnO nanorods for <em>p</em>-type doping
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Journal Articles

Calibration of matrix-dependent biases in isotope and trace element analyses of carbonate minerals

Kaitlyn A. McCain, Ming-Chang Liu, Kevin D. McKeegan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 044005 (2020)
https://doi.org/10.1116/6.0000111
Published: June 2020
View article titled, Calibration of matrix-dependent biases in isotope and trace element analyses of carbonate minerals
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Includes: Supplementary data
Journal Articles

Analysis of permethrin treated fabric using ToF-SIMS

Chuanzhen Zhou, Fred Stevie, Roberto Garcia
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 034006 (2020)
https://doi.org/10.1116/1.5141467
Published: April 2020
View article titled, Analysis of permethrin treated fabric using ToF-SIMS
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Journal Articles

Study of damage generation induced by focused helium ion beam in silicon

Editor’s Pick
Rongrong Li, Rui Zhu, Shulin Chen, Chao He, Mingqiang Li, Jingmin Zhang, Peng Gao, Zhimin Liao, Jun Xu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031804 (2019)
https://doi.org/10.1116/1.5096908
Published: May 2019
View article titled, Study of damage generation induced by focused helium ion beam in silicon
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Includes: Supplementary data
Journal Articles

Electrical and material characterization of sulfur-implanted GaSb

Daniel J. Herrera, Luke F. Lester
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031214 (2019)
https://doi.org/10.1116/1.5093329
Published: May 2019
View article titled, Electrical and material characterization of sulfur-implanted GaSb
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Journal Articles

Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process

Jonathan England, Jaap Van den Berg, Andrew Rossall
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031206 (2019)
https://doi.org/10.1116/1.5088958
Published: April 2019
View article titled, Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process
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Journal Articles

Effects of oxygen-inserted layers and oxide capping layer on dopant activation for the formation of ultrashallow p-n junctions in silicon

Xi Zhang, Daniel Connelly, Hideki Takeuchi, Marek Hytha, Robert J. Mears, Leonard M. Rubin, Tsu-Jae King Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 061211 (2018)
https://doi.org/10.1116/1.5062366
Published: December 2018
View article titled, Effects of oxygen-inserted layers and oxide capping layer on dopant activation for the formation of ultrashallow p-n junctions in silicon
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Journal Articles

Enhanced cracking in Si/B-doped Si0.70Ge0.30/Si heterostructures via hydrogen trapping effect

Xing Wei, Zhongying Xue, Yongwei Chang, Jiurong Li, Gang Wang, Da Chen, Qinglei Guo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 061202 (2018)
https://doi.org/10.1116/1.5044215
Published: October 2018
View article titled, Enhanced cracking in Si/B-doped Si<sub>0.70</sub>Ge<sub>0.30</sub>/Si heterostructures via hydrogen trapping effect
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Journal Articles

Field emission from diamond nanotips for scanning probe lithography

Martin Hofmann, Claudia Lenk, Tzvetan Ivanov, Ivo W. Rangelow, Alexander Reum, Ahmad Ahmad, Mathias Holz, Eberhard Manske
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JL02 (2018)
https://doi.org/10.1116/1.5048193
Published: October 2018
View article titled, Field emission from diamond nanotips for scanning probe lithography
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Journal Articles

Thin layer etching of low-k SiCO spacer using hydrogen ion implantation followed by hydrofluoric acid

Nicolas Posseme, Maxime Garcia-Barros, François Leverd, Daniel Benoit, Olivier Pollet, Guillaume Audoit, Cyril Guedj, Audrey Jannaud, S. Barnola
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 052201 (2018)
https://doi.org/10.1116/1.5038617
Published: August 2018
View article titled, Thin layer etching of low-k SiCO spacer using hydrogen ion implantation followed by hydrofluoric acid
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