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Journal Articles

Photoresist ashing at room temperature using a large-area, atmospheric-pressure plasma

Branden J. Bodner, Paul J. Froeter, Kuldeep Kalonia, R. Mohan Sankaran

J. Vac. Sci. Technol. B 43, 012204 (2025)

https://doi.org/10.1116/6.0004147

Published: January 2025

View article titled, Photoresist ashing at room temperature using a large-area, atmospheric-pressure plasma

Journal Articles

Mid-infrared emission of germanium-tin films produced by sputtering

William W. Hernández-Montero, Carlos Zúñiga-Islas

J. Vac. Sci. Technol. B 42, 022210 (2024)

https://doi.org/10.1116/6.0003237

Published: March 2024

View article titled, Mid-infrared emission of germanium-tin films produced by sputtering

Journal Articles

Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO₂ thin films on H-/OH-terminated Si (100) surfaces

Jihye Park, Minji Jeong, Young Joon Cho, Kyung Joong Kim, Truong Ba Tai, Hyeyoung Shin, Jong Chul Lim, Hyo Sik Chang

J. Vac. Sci. Technol. B 41, 062801 (2023)

https://doi.org/10.1116/6.0002920

Published: September 2023

View article titled, Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO2 thin films on H-/OH-terminated Si (100) surfaces

Includes: Supplementary data

Journal Articles

Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication

Chen Zhu, Edward C. Kinzel

J. Vac. Sci. Technol. B 41, 033601 (2023)

https://doi.org/10.1116/6.0002557

Published: May 2023

View article titled, Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication

Journal Articles

Deposition and morphology of direct current plasma-polymerized aniline

Sidney M. Palardonio, Magdaleno R. Vasquez, Jr.

J. Vac. Sci. Technol. B 41, 034201 (2023)

https://doi.org/10.1116/6.0002497

Published: March 2023

View article titled, Deposition and morphology of direct current plasma-polymerized aniline

Journal Articles

Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)

Deepak Kumar, Krishnaroop Chaudhuri, Joseph W. Brill, Jonathan T. Pham, J. Todd Hastings

J. Vac. Sci. Technol. B 41, 012604 (2023)

https://doi.org/10.1116/6.0002118

Published: January 2023

View article titled, Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)

Journal Articles

New SIMS method to characterize hydrogen in polysilicon films

Xue-feng Lin, Agi Fucsko, Kari Noehring, Elaine Gabriel, Adam Regner, Scott York, David Palsulich

J. Vac. Sci. Technol. B 40, 014003 (2022)

https://doi.org/10.1116/6.0001472

Published: January 2022

View article titled, New SIMS method to characterize hydrogen in polysilicon films

Journal Articles

Strain engineering in III-V photonic components through structuration of SiN_x films

Brahim Ahammou, Aysegul Abdelal, Jean-Pierre Landesman, Christophe Levallois, Peter Mascher

J. Vac. Sci. Technol. B 40, 012202 (2022)

https://doi.org/10.1116/6.0001352

Published: December 2021

View article titled, Strain engineering in III-V photonic components through structuration of SiNx films

Journal Articles

Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings

William W. Hernández-Montero, Adrián Itzmoyotl-Toxqui, Carlos Zúñiga-Islas

J. Vac. Sci. Technol. B 39, 042203 (2021)

https://doi.org/10.1116/6.0001052

Published: July 2021

View article titled, Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings

Includes: Supplementary data

Journal Articles

Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures

Andrew J. Knoll, Adam Pranda, Hoki Lee, Gottlieb S. Oehrlein

J. Vac. Sci. Technol. B 37, 031802 (2019)

https://doi.org/10.1116/1.5092969

Published: April 2019

View article titled, Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures

Journal Articles

Liquid-phase exfoliation of fluorinated graphite to produce high-quality graphene sheets

Li Chen, Yawen Meng

J. Vac. Sci. Technol. B 37, 031801 (2019)

https://doi.org/10.1116/1.5081961

Published: April 2019

View article titled, Liquid-phase exfoliation of fluorinated graphite to produce high-quality graphene sheets

Journal Articles

Effect of BO₃³⁻ ions on photoluminescence of CaMoO₄:Eu³⁺ phosphor

Machaba L. A. Letswalo, Leelakrishna Reddy, Avula Balakrishna, Hendrik C. Swart, Odireleng M. Ntwaeaborwa

J. Vac. Sci. Technol. B 37, 012907 (2019)

https://doi.org/10.1116/1.5083817

Published: January 2019

View article titled, Effect of BO33− ions on photoluminescence of CaMoO4:Eu3+ phosphor

Journal Articles

Influence of tetramethylammonium hydroxide on niobium nitride thin films

Emily Toomey, Marco Colangelo, Navid Abedzadeh, Karl K. Berggren

J. Vac. Sci. Technol. B 36, 06JC01 (2018)

https://doi.org/10.1116/1.5047427

Published: October 2018

View article titled, Influence of tetramethylammonium hydroxide on niobium nitride thin films

Journal Articles

Cryogenic etching of porous low-k dielectrics in CF₃Br and CF₄ plasmas

Askar Rezvanov, Andrey V. Miakonkikh, Alexey S. Vishnevskiy, Konstantin V. Rudenko, Mikhail R. Baklanov

J. Vac. Sci. Technol. B 35, 021204 (2017)

https://doi.org/10.1116/1.4975646

Published: February 2017

View article titled, Cryogenic etching of porous low-k dielectrics in CF3Br and CF4 plasmas

Journal Articles

Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects

Deepika Priyadarshini, Son V. Nguyen, Hosadurga Shobha, Eric Liniger, James H.-C. Chen, Huai Huang, Stephan A. Cohen, Alfred Grill

J. Vac. Sci. Technol. B 35, 021201 (2017)

https://doi.org/10.1116/1.4974317

Published: January 2017

View article titled, Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects

Journal Articles

Engineering carrier lifetimes in type-II In(Ga)Sb/InAs mid-IR emitters

Lan Yu, Yujun Zhong, Sukrith Dev, Daniel Wasserman

J. Vac. Sci. Technol. B 35, 02B101 (2017)

https://doi.org/10.1116/1.4972978

Published: December 2016

View article titled, Engineering carrier lifetimes in type-II In(Ga)Sb/InAs mid-IR emitters

Journal Articles

Analysis and in situ observation of humidity dependent atomic layer deposited-Al₂O₃ degradation

Andreas Rückerl, Sophia Huppmann, Martin Mandl, Simeon Katz, Roland Zeisel

J. Vac. Sci. Technol. B 35, 01A104 (2017)

https://doi.org/10.1116/1.4971199

Published: December 2016

View article titled, Analysis and in situ observation of humidity dependent atomic layer deposited-Al2O3 degradation

Journal Articles

Study of alternate hardmasks for extreme ultraviolet patterning

Anuja De Silva, Indira Seshadri, Abraham Arceo, Karen Petrillo, Luciana Meli, Brock Mendoza, Yiping Yao, Michael Belyansky, Scott Halle, Nelson M. Felix

J. Vac. Sci. Technol. B 34, 06KG03 (2016)

https://doi.org/10.1116/1.4966960

Published: November 2016

View article titled, Study of alternate hardmasks for extreme ultraviolet patterning

Journal Articles

Versatile multicharacterization platform involving tailored superhydrophobic SU-8 micropillars for the investigation of breast cancer estrogen receptor isoforms

Angelo Accardo, Emmanuelle Trevisiol, Aline Cerf, Christophe Thibault, Henrik Laurell, Melissa Buscato, Françoise Lenfant, Jean-François Arnal, Coralie Fontaine, Christophe Vieu

J. Vac. Sci. Technol. B 34, 06K201 (2016)

https://doi.org/10.1116/1.4962382

Published: September 2016

View article titled, Versatile multicharacterization platform involving tailored superhydrophobic SU-8 micropillars for the investigation of breast cancer estrogen receptor isoforms

Includes: Supplementary data

Journal Articles

He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching

Dominik Metzler, Florian Weilnboeck, Sebastian Engelmann, Robert L. Bruce, Gottlieb S. Oehrlein

J. Vac. Sci. Technol. B 34, 041604 (2016)

https://doi.org/10.1116/1.4949274

Published: May 2016

View article titled, He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching

NARROW

Topics

Photoresist ashing at room temperature using a large-area, atmospheric-pressure plasma

Mid-infrared emission of germanium-tin films produced by sputtering

Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO₂ thin films on H-/OH-terminated Si (100) surfaces

Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication

Deposition and morphology of direct current plasma-polymerized aniline

Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)

New SIMS method to characterize hydrogen in polysilicon films

Strain engineering in III-V photonic components through structuration of SiN_x films

Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings

Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures

Liquid-phase exfoliation of fluorinated graphite to produce high-quality graphene sheets

Effect of BO₃³⁻ ions on photoluminescence of CaMoO₄:Eu³⁺ phosphor

Influence of tetramethylammonium hydroxide on niobium nitride thin films

Cryogenic etching of porous low-k dielectrics in CF₃Br and CF₄ plasmas

Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects

Engineering carrier lifetimes in type-II In(Ga)Sb/InAs mid-IR emitters

Analysis and in situ observation of humidity dependent atomic layer deposited-Al₂O₃ degradation

Study of alternate hardmasks for extreme ultraviolet patterning

Versatile multicharacterization platform involving tailored superhydrophobic SU-8 micropillars for the investigation of breast cancer estrogen receptor isoforms

He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching

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