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Journal Articles

Influence of electron beam irradiation on nanoscale adhesion during colloidal probe experiments inside the scanning electron microscope

Waldemar Klauser, Turgut Nasrullayev, Sergej Fatikow
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052802 (2023)
https://doi.org/10.1116/6.0002764
Published: July 2023
View article titled, Influence of electron beam irradiation on nanoscale adhesion during colloidal probe experiments inside the scanning electron microscope
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Includes: Supplementary data
Journal Articles

Nanofabrication of silicon surfaces for reduced virus adhesion

Ao Guo, Y. Carol Shieh, Ralu Divan, Rong R. Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 012801 (2021)
https://doi.org/10.1116/6.0000548
Published: January 2021
View article titled, Nanofabrication of silicon surfaces for reduced virus adhesion
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Includes: Supplementary data
Journal Articles

Effects of cavity shapes and rounded corners of mold on polymer filling process in nanoimprint lithography

Lijun Ma, Mingya Zhang, Xiaolei Zhang, Xu Zheng, Shifeng Xue, Qing Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 062802 (2020)
https://doi.org/10.1116/6.0000498
Published: October 2020
View article titled, Effects of cavity shapes and rounded corners of mold on polymer filling process in nanoimprint lithography
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Journal Articles

Effects of mask material conductivity on lateral undercut etching in silicon nano-pillar fabrication

Ripon Kumar Dey, Huseyin Ekinci, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 012207 (2020)
https://doi.org/10.1116/1.5123601
Published: January 2020
View article titled, Effects of mask material conductivity on lateral undercut etching in silicon nano-pillar fabrication
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Journal Articles

CuAl2 thin films as a low-resistivity interconnect material for advanced semiconductor devices

Linghan Chen, Daisuke Ando, Yuji Sutou, Junichi Koike
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031215 (2019)
https://doi.org/10.1116/1.5094404
Published: May 2019
View article titled, CuAl<sub>2</sub> thin films as a low-resistivity interconnect material for advanced semiconductor devices
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Journal Articles

Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures

Andrew J. Knoll, Adam Pranda, Hoki Lee, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031802 (2019)
https://doi.org/10.1116/1.5092969
Published: April 2019
View article titled, Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures
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Journal Articles

Bottom profile degradation mechanism in high aspect ratio feature etching based on pattern transfer observation

Nobuyuki Negishi, Masatoshi Miyake, Ken'etsu Yokogawa, Masatoshi Oyama, Tadamitsu Kanekiyo, Masaru Izawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 051205 (2017)
https://doi.org/10.1116/1.4998943
Published: August 2017
View article titled, Bottom profile degradation mechanism in high aspect ratio feature etching based on pattern transfer observation
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Journal Articles

Volume-expansion polymerization for UV-curable nanoimprinting

Bingqing Luo, Zengju Fan, Ziping Li, Yulong Chen, Yanqing Tian, Xing Cheng
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 011604 (2017)
https://doi.org/10.1116/1.4973301
Published: January 2017
View article titled, Volume-expansion polymerization for UV-curable nanoimprinting
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Journal Articles

Effects of contact states on polymer pattern deformation during demolding process in nanoimprint lithography

Lijun Ma, Qing Wang, Rui Zhang, Xu Zheng, Tong Zheng
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K409 (2016)
https://doi.org/10.1116/1.4968531
Published: November 2016
View article titled, Effects of contact states on polymer pattern deformation during demolding process in nanoimprint lithography
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Journal Articles

Impact of template stiffness during peeling release in nanoimprint lithography

Florian Chalvin, Naoto Nakamura, Takamitsu Tochino, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K403 (2016)
https://doi.org/10.1116/1.4962742
Published: September 2016
View article titled, Impact of template stiffness during peeling release in nanoimprint lithography
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Journal Articles

Toward synthesis of oxide films on graphene with sputtering based processes

Patrik Ahlberg, Tomas Nyberg, Shi-Li Zhang, Zhi-Bin Zhang, Ulf Jansson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 040605 (2016)
https://doi.org/10.1116/1.4949565
Published: May 2016
View article titled, Toward synthesis of oxide films on graphene with sputtering based processes
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Journal Articles

Deep germanium etching using time multiplexed plasma etching

Maxime Darnon, Mathieu de Lafontaine, Maïté Volatier, Simon Fafard, Richard Arès, Abdelatif Jaouad, Vincent Aimez
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 060605 (2015)
https://doi.org/10.1116/1.4936112
Published: November 2015
View article titled, Deep germanium etching using time multiplexed plasma etching
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Journal Articles

Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers

Makoto Satake, Masaki Yamada, Hu Li, Kazuhiro Karahashi, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 051810 (2015)
https://doi.org/10.1116/1.4930242
Published: September 2015
View article titled, Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers
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Journal Articles

Molecular beam epitaxy using bismuth as a constituent in InAs and a surfactant in InAs/InAsSb superlattices

Preston T. Webster, Nathaniel A. Riordan, Chaturvedi Gogineni, Shi Liu, Jing Lu, Xin-Hao Zhao, David J. Smith, Yong-Hang Zhang, Shane R. Johnson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 02C120 (2014)
https://doi.org/10.1116/1.4868111
Published: March 2014
View article titled, Molecular beam epitaxy using bismuth as a constituent in InAs and a surfactant in InAs/InAsSb superlattices
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Journal Articles

Closed-cycle cooling of cryopanels in molecular beam epitaxy

Ryan B. Lewis, Vahid Bahrami-Yekta, Medhaj J. Patel, Thomas Tiedje, Mostafa Masnadi-Shirazi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 02C102 (2014)
https://doi.org/10.1116/1.4862088
Published: January 2014
View article titled, Closed-cycle cooling of cryopanels in molecular beam epitaxy
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Journal Articles

Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition

Cheng-che Hsu, Nathan Marchack, Ryan M. Martin, Calvin Pham, John Hoang, Jane P. Chang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 042201 (2013)
https://doi.org/10.1116/1.4810908
Published: July 2013
View article titled, Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition
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Journal Articles

Mercury cadmium selenide for infrared detection

Kevin Doyle, Craig H. Swartz, John H. Dinan, Thomas H. Myers, Gregory Brill, Yuanping Chen, Brenda L. VanMil, Priyalal Wijewarnasuriya
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 03C124 (2013)
https://doi.org/10.1116/1.4798651
Published: April 2013
View article titled, Mercury cadmium selenide for infrared detection
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Journal Articles

Strain- and kinetically induced suppression of phase separation in MBE-grown metastable and unstable GaInAsSb quaternary alloys for mid-infrared optoelectronics

Asli Yildirim, John P. Prineas
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 03C125 (2013)
https://doi.org/10.1116/1.4799352
Published: April 2013
View article titled, Strain- and kinetically induced suppression of phase separation in MBE-grown metastable and unstable GaInAsSb quaternary alloys for mid-infrared optoelectronics
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Journal Articles

Kinetics of the deposition step in time multiplexed deep silicon etches

Iqbal R. Saraf, Matthew J. Goeckner, Brian E. Goodlin, Karen H. R. Kirmse, Caleb T. Nelson, Lawrence J. Overzet
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 011208 (2013)
https://doi.org/10.1116/1.4769873
Published: December 2012
View article titled, Kinetics of the deposition step in time multiplexed deep silicon etches
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Journal Articles

Fabrication of an adhesion-free transparent roll stamp for large area patterning using ultraviolet-type roller nanoimprint lithography

Hyun-Ha Park, HyungJun Lim, SungHwi Lee, JaeJong Lee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FB11 (2012)
https://doi.org/10.1116/1.4766894
Published: November 2012
View article titled, Fabrication of an adhesion-free transparent roll stamp for large area patterning using ultraviolet-type roller nanoimprint lithography
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