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Journal Articles

Desorption model of volatile Ru species induced by partial chlorination on Ru(0001) under an O2/Cl2-based plasma process

Masaya Imai, Miyako Matsui, Ryoko Sugano, Yohei Ishii, Makoto Miura, Kenichi Kuwahara
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042209 (2024)
https://doi.org/10.1116/6.0003706
Published: July 2024
View article titled, Desorption model of volatile Ru species induced by partial chlorination on Ru(0001) under an O<sub>2</sub>/Cl<sub>2</sub>-based plasma process
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Journal Articles

Performance enhancement in spin transfer torque magnetic random access memory through in situ cap layer optimization

Zhenghui Ji, Yongzhao Peng, Guoxiu Qiu, Guchang Han, Qijun Guo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 043801 (2024)
https://doi.org/10.1116/6.0003661
Published: June 2024
View article titled, Performance enhancement in spin transfer torque magnetic random access memory through <em>in situ</em> cap layer optimization
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Journal Articles

Future of plasma etching for microelectronics: Challenges and opportunities

Featured
Gottlieb S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, Jane P. Chang, Jessica C. DeMott, Vincent M. Donnelly, Rémi Dussart, Andreas Fischer, Richard A. Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, Kenji Ishikawa, Steven G. Jaloviar, Keren J. Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark J. Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Poulose, Shahid Rauf, Makoto Sekine, Taylor G. Smith, Nathan Stafford, Theo Standaert, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 041501 (2024)
https://doi.org/10.1116/6.0003579
Published: June 2024
View article titled, Future of plasma etching for microelectronics: Challenges and opportunities
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Journal Articles

Use of plasma process diagnostic sensors for the monitoring of in situ dry cleaning of plasma enhanced chemical vapor deposition chamber

Young Min You, Ji Seok Lee, Min Ho Kim, Sang Jeen Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042203 (2024)
https://doi.org/10.1116/6.0003288
Published: June 2024
View article titled, Use of plasma process diagnostic sensors for the monitoring of <em>in situ</em> dry cleaning of plasma enhanced chemical vapor deposition chamber
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Journal Articles

Science challenges and research opportunities for plasma applications in microelectronics

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David B. Graves, Catherine B. Labelle, Mark J. Kushner, Eray S. Aydil, Vincent M. Donnelly, Jane P. Chang, Peter Mayer, Lawrence Overzet, Steven Shannon, Shahid Rauf, David N. Ruzic
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042202 (2024)
https://doi.org/10.1116/6.0003531
Published: June 2024
View article titled, Science challenges and research opportunities for plasma applications in microelectronics
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Journal Articles

Ordered silicon nanocone fabrication by using pseudo-Bosch process and maskless etching

Zheng Yan, Huseyin Ekinci, Aixi Pan, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 032802 (2024)
https://doi.org/10.1116/6.0003394
Published: May 2024
View article titled, Ordered silicon nanocone fabrication by using pseudo-Bosch process and maskless etching
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Journal Articles

Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch

Renqiang Kang, Aixi Pan, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 033002 (2024)
https://doi.org/10.1116/6.0003516
Published: April 2024
View article titled, Fabrication of silicon sharp nanocones using dry etch with periodic oxygen plasma shrinking and wet etch
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Journal Articles

Plasma confinement by an optoelectronic system

Editor’s Pick
Ryuta Tsukazaki (塚嵜 琉太), Haruhiro Naito (内藤 陽大), Hisashi Koga (古賀 永), Akito Fukuda (福田 旺土), Naoki Kato (加藤 直樹), Takayuki Watanabe (渡辺 貴之), Susumu Takabayashi (鷹林 将)
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034201 (2024)
https://doi.org/10.1116/6.0003520
Published: April 2024
View article titled, Plasma confinement by an optoelectronic system
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Includes: Supplementary data
Journal Articles

New approach of local critical dimension uniformity improvement for via/contact hole etch with direct current superposition

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Emilia W. Hirsch, Dominik Metzler, Peng Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 032208 (2024)
https://doi.org/10.1116/6.0003464
Published: April 2024
View article titled, New approach of local critical dimension uniformity improvement for via/contact hole etch with direct current superposition
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Journal Articles

Effects of high-temperature annealing on vacancy complexes and luminescence properties in multilayer periodic structures with elastically strained GeSiSn layers

Vyacheslav Timofeev, Ilya Skvortsov, Vladimir Mashanov, Alexandr Nikiforov, Dmitry Kolyada, Dmitry Firsov, Oleg Komkov, Samir Samadov, Alexey Sidorin, Oleg Orlov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 030601 (2024)
https://doi.org/10.1116/6.0003557
Published: April 2024
View article titled, Effects of high-temperature annealing on vacancy complexes and luminescence properties in multilayer periodic structures with elastically strained GeSiSn layers
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Journal Articles

Multi-step plasma etching of high aspect ratio silicon nanostructures for metalens fabrication

Xiaoli Zhu, Zihao Wang, Chenxu Zhu, Jiashi Shen, Babak Shokouhi, Huseyin Ekinci, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 032203 (2024)
https://doi.org/10.1116/6.0003429
Published: April 2024
View article titled, Multi-step plasma etching of high aspect ratio silicon nanostructures for metalens fabrication
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Journal Articles

Modeling and control of L-type network impedance matching for semiconductor plasma etch

Carlos Rodriguez, Jairo Viola, YangQuan Chen, Joaquin Alvarez
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 022212 (2024)
https://doi.org/10.1116/6.0003444
Published: March 2024
View article titled, Modeling and control of L-type network impedance matching for semiconductor plasma etch
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Journal Articles

Large-area fabrication of nanometer-scale features on GaN using e-beam lithography

Firat Yasar, Richard E. Muller, Arezou Khoshakhlagh, Sam A. Keo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 022801 (2024)
https://doi.org/10.1116/6.0003270
Published: February 2024
View article titled, Large-area fabrication of nanometer-scale features on GaN using e-beam lithography
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Journal Articles

High current field emission from Si nanowires on pillar structures

Philipp Buchner, Matthias Hausladen, Mathias Bartl, Michael Bachmann, Rupert Schreiner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 022208 (2024)
https://doi.org/10.1116/6.0003384
Published: February 2024
View article titled, High current field emission from Si nanowires on pillar structures
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Journal Articles

Room temperature inductively coupled plasma etching of InP with Cl2 mixtures using SiO2 and photoresist masks

Editor’s Pick
Qingyue Li, Claire Deeb, Hélène Debregeas, Jean-Luc Pelouard
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 022205 (2024)
https://doi.org/10.1116/6.0003295
Published: February 2024
View article titled, Room temperature inductively coupled plasma etching of InP with Cl<sub>2</sub> mixtures using SiO<sub>2</sub> and photoresist masks
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Journal Articles

In situ plasma pin-up clean process for backside bevel polymer removal, defect reduction, and queue time relaxation

Editor’s Pick
Benjamin B. Ye, Ganquan Song, Jeff J. Ye
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 022202 (2024)
https://doi.org/10.1116/6.0003300
Published: February 2024
View article titled, <em>In situ</em> plasma pin-up clean process for backside bevel polymer removal, defect reduction, and queue time relaxation
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Journal Articles

Plasma-assisted annealing of Pt-doped rutile TiO2 nanoparticles for enhanced decomposition and bacterial inactivation under general lighting

Retsuo Kawakami, Yuta Makino, Shin-ichiro Yanagiya, Akihiro Shirai, Masahito Niibe, Yoshitaka Nakano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 012203 (2024)
https://doi.org/10.1116/6.0003101
Published: January 2024
View article titled, Plasma-assisted annealing of Pt-doped rutile TiO<sub>2</sub> nanoparticles for enhanced decomposition and bacterial inactivation under general lighting
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Journal Articles

Shape tuning of large area silicon nanotip arrays through reactive ion etching

Giridhar Tulasi Ram Sankabathula, Srujana Valluri, Nick Norden, Stephen Binderup, Anirudha Sumant, Ralu Divan, Osama Mohsen, Philippe Piot, Venumadhav Korampally
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062605 (2023)
https://doi.org/10.1116/6.0003130
Published: December 2023
View article titled, Shape tuning of large area silicon nanotip arrays through reactive ion etching
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Includes: Supplementary data
Journal Articles

Direct writing immersion laser lithography on graphene monolayers using two-photon absorption

Jianran Zhang, Carsten Strobel, Kathrin Estel, Thomas Mikolajick, Robert Kirchner