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Journal Articles

Direct writing immersion laser lithography on graphene monolayers using two-photon absorption

Jianran Zhang, Carsten Strobel, Kathrin Estel, Thomas Mikolajick, Robert Kirchner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062604 (2023)
https://doi.org/10.1116/6.0003017
Published: November 2023
View article titled, Direct writing immersion laser lithography on graphene monolayers using two-photon absorption
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Journal Articles

Understanding 3D anisotropic reactive ion etching of oxide-metal stacks

Prafful Golani, Roshan J. Tirukkonda, Aaron N. Fancher, Stephen R. Ross, Mark D. Kraman, Rahul Sharangpani, Joyeeta Nag, Kartik Sondhi, Alexei L. Bogdanov, Senaka K. Kanakamedala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062206 (2023)
https://doi.org/10.1116/6.0003105
Published: November 2023
View article titled, Understanding 3D anisotropic reactive ion etching of oxide-metal stacks
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Includes: Supplementary data
Journal Articles

Modification of discharge sequences to control the random dispersion of flake particles during wafer etching

Ching Ming Ku, Wen Yea Jang, Stone Cheng
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 064203 (2023)
https://doi.org/10.1116/6.0002974
Published: November 2023
View article titled, Modification of discharge sequences to control the random dispersion of flake particles during wafer etching
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Journal Articles

Improved impedance matching speed with gradient descent for advanced RF plasma system

Dongwon Shin, Sang Jeen Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 064002 (2023)
https://doi.org/10.1116/6.0003034
Published: October 2023
View article titled, Improved impedance matching speed with gradient descent for advanced RF plasma system
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Journal Articles

Review of microarc oxidation of titanium implant

Guang Yang, Yulu Meng, Chenghui Qian, Xiaohong Chen, Ping Liu, Honglei Zhou, Binbin Kang, Xiangpeng Tang, Lanjuan Diao, Fanfan Zhou
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 060801 (2023)
https://doi.org/10.1116/6.0002941
Published: October 2023
View article titled, Review of microarc oxidation of titanium implant
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Journal Articles

Method for improving dry etching end point detection based on change in time accumulation correlation of plasma emitting wavelengths

Se-Jin Oh, Chang-Gil Son, Min-kyu Sohn, Doug-Yong Sung, Min-Sung Kim, Ji-Soo Im, Sang Ki Nam
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052204 (2023)
https://doi.org/10.1116/6.0002890
Published: September 2023
View article titled, Method for improving dry etching end point detection based on change in time accumulation correlation of plasma emitting wavelengths
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Journal Articles

Plasma-induced energy band evolution for two-dimensional heterogeneous anti-ambipolar transistors

Simran Shahi, Asma Ahmed, Ruizhe Yang, Anthony Cabanillas, Anindita Chakravarty, Maomao Liu, Hemendra Nath Jaiswal, Yu Fu, Yutong Guo, Satyajeetsinh Shaileshsin Jadeja, Hariharan Murugesan, Anthony Butler, Chu Te Chen, Joel Muhigirwa, Mohamed Enaitalla, Jun Liu, Fei Yao, Huamin Li
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 053202 (2023)
https://doi.org/10.1116/6.0002888
Published: August 2023
View article titled, Plasma-induced energy band evolution for two-dimensional heterogeneous anti-ambipolar transistors
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Includes: Supplementary data
Journal Articles

Plasma processing and annealing for defect management at SiO2/Si interface

Shota Nunomura, Takayoshi Tsutsumi, Isao Sakata, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052202 (2023)
https://doi.org/10.1116/6.0002822
Published: August 2023
View article titled, Plasma processing and annealing for defect management at SiO<sub>2</sub>/Si interface
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Journal Articles

Synergy of cold development and electron-beam exposure for Si nanotip patterning in quantum-electronic devices

I-Hsiang Wang, Pei-Wen Li
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052601 (2023)
https://doi.org/10.1116/6.0002845
Published: August 2023
View article titled, Synergy of cold development and electron-beam exposure for Si nanotip patterning in quantum-electronic devices
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Journal Articles

Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling

Roshan J. Tirukkonda, Mark D. Kraman, Rahul Sharangpani, Kartik Sondhi, Aaron N. Fancher, Stephen R. Ross, Joyeeta Nag, Alexei L. Bogdanov, Raghuveer S. Makala, Senaka K. Kanakamedala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043202 (2023)
https://doi.org/10.1116/6.0002709
Published: June 2023
View article titled, Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling
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Includes: Supplementary data
Journal Articles

Phosphorus deactivation by hydrogen on hot carrier stressed high-voltage N-channel field effect transistor CMOS device demonstrated by scanning capacitance microscopy imaging

Jochonia Nxumalo, Wang Yun-Yu (王允愈), Mike Smith, You Lin (尤林), David Fillmore, Matthew Gerber, Jin Qiang (金强)
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 042203 (2023)
https://doi.org/10.1116/5.0147443
Published: June 2023
View article titled, Phosphorus deactivation by hydrogen on hot carrier stressed high-voltage N-channel field effect transistor CMOS device demonstrated by scanning capacitance microscopy imaging
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Journal Articles

On the origin and evolution of hotspots in multipatterning processes

Prem Panneerchelvam, Chad M. Huard, Trey Graves, Alessandro Vaglio Pret, Roel Gronheid, Ankur Agarwal, Mark D. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043201 (2023)
https://doi.org/10.1116/6.0002601
Published: June 2023
View article titled, On the origin and evolution of hotspots in multipatterning processes
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Journal Articles

Deposition and morphology of direct current plasma-polymerized aniline

Sidney M. Palardonio, Magdaleno R. Vasquez, Jr.
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034201 (2023)
https://doi.org/10.1116/6.0002497
Published: March 2023
View article titled, Deposition and morphology of direct current plasma-polymerized aniline
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Journal Articles

Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization

Ziam Ghaznavi, Nicholas Butcher, Dragan Djurdjanovic, S. V. Sreenivasan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022802 (2023)
https://doi.org/10.1116/6.0002261
Published: February 2023
View article titled, Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization
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Includes: Supplementary data
Journal Articles

Systematic study of InP/InGaAsP heated plasma etching and roughness improvement for integrated optical devices

Kaustubh Vyas, Kashif M. Awan, Ksenia Dolgaleva
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012804 (2023)
https://doi.org/10.1116/6.0002167
Published: January 2023
View article titled, Systematic study of InP/InGaAsP heated plasma etching and roughness improvement for integrated optical devices
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Journal Articles

Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography

S. Ghotbi, S. Mohammadi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 013202 (2023)
https://doi.org/10.1116/6.0002295
Published: December 2022
View article titled, Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography
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Journal Articles

Predicting the effects of plasma-induced damage on p–n junction leakage and its application in the characterization of defect distribution

Yoshihiro Sato, Satoshi Shibata, Kazuko Nishimura, Masayuki Yamasaki, Masashi Murakami, Keiichiro Urabe, Koji Eriguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062209 (2022)
https://doi.org/10.1116/6.0002181
Published: November 2022
View article titled, Predicting the effects of plasma-induced damage on p–n junction leakage and its application in the characterization of defect distribution
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Journal Articles

Influence of the Cl2 etching on the Al2O3/GaN metal–oxide–semiconductor interface

T. Meyer, S. Boubenia, C. Petit-Etienne, B. Salem, E. Pargon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062208 (2022)
https://doi.org/10.1116/6.0002133
Published: November 2022
View article titled, Influence of the Cl<sub>2</sub> etching on the Al<sub>2</sub>O<sub>3</sub>/GaN metal–oxide–semiconductor interface
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Journal Articles

Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step

R. Dawant, S. Ecoffey, D. Drouin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062603 (2022)
https://doi.org/10.1116/6.0002116
Published: November 2022
View article titled, Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step
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Journal Articles

Effect of charge-up of surfaces of sintered Y2O3 and yttrium oxyfluoride on their erosion rates due to ion bombardment

Tetsuya Goto, Yoshinobu Shiba, Akinobu Teramoto, Yukio Kishi, Shigetoshi Sugawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062205 (2022)
https://doi.org/10.1116/6.0002162
Published: November 2022
View article titled, Effect of charge-up of surfaces of sintered Y<sub>2</sub>O<sub>3</sub> and yttrium oxyfluoride on their erosion rates due to ion bombardment
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