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Journal Articles

X-ray multi-scale microfabrication system and x-ray imaging evaluation system all in one beamline

Scilight
Kanta Yamamoto, Yuichi Utsumi, Ikuya Sakurai, Ikuo Okada, Kenji Hanada, Hidehiro Ishizawa, Masahiro Takeo, Taki Watanabe, Sho Amano, Satoru Suzuki, Koji Sumitomo, Akinobu Yamaguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062602 (2023)
https://doi.org/10.1116/6.0003021
Published: October 2023
View article titled, X-ray multi-scale microfabrication system and x-ray imaging evaluation system all in one beamline
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Journal Articles

Method of predicting resist sensitivity for 6.x nm extreme ultraviolet lithography

Tomoko Gowa Oyama, Akihiro Oshima, Masakazu Washio, Seiichi Tagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 041604 (2013)
https://doi.org/10.1116/1.4813789
Published: July 2013
View article titled, Method of predicting resist sensitivity for 6.x nm extreme ultraviolet lithography
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Journal Articles

Investigation of the radiation-induced thermal flexure of an x-ray lithography mask during a tilted exposure

V. Nazmov, E. Reznikova, J. Mohr
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 011007 (2011)
https://doi.org/10.1116/1.3524905
Published: January 2011
View article titled, Investigation of the radiation-induced thermal flexure of an x-ray lithography mask during a tilted exposure
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Journal Articles

Quantifying reaction spread and x-ray exposure sensitivity in hydrogen silsesquioxane latent resist patterns with x-ray spectromicroscopy

Allison G. Caster, Stefan Kowarik, Adam M. Schwartzberg, Stephen R. Leone, Alexei Tivanski, Mary K. Gilles
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 1304–1313 (2010)
https://doi.org/10.1116/1.3514124
Published: November 2010
View article titled, Quantifying reaction spread and x-ray exposure sensitivity in hydrogen silsesquioxane latent resist patterns with x-ray spectromicroscopy
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Includes: Supplementary data
Journal Articles

Design and fabrication of surface acoustic wave delay line for surface acoustic wave chemical-agent sensors

Yigui Zhao, Ming Liu, Jingjing Li, Jiebin Niu, Dongmei Li
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1821–1824 (2009)
https://doi.org/10.1116/1.3151857
Published: June 2009
View article titled, Design and fabrication of surface acoustic wave delay line for surface acoustic wave chemical-agent sensors
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Journal Articles

Low-cost x-ray mask based on micropattern sputtered lead film for x-ray lithography

S. Mongpraneet, A. Wisitsora-at, R. Phatthanakun, N. Chomnawang, A. Tuantranont
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1299–1303 (2009)
https://doi.org/10.1116/1.3117259
Published: May 2009
View article titled, Low-cost x-ray mask based on micropattern sputtered lead film for x-ray lithography
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Journal Articles

Fabrication of a needle array using a Si gray mask for x-ray lithography

Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Masaharu Takahashi, Ryutaro Maeda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2196–2201 (2007)
https://doi.org/10.1116/1.2794314
Published: December 2007
View article titled, Fabrication of a needle array using a Si gray mask for x-ray lithography
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Journal Articles

Progress towards tubes with regular nanopatterned inner surfaces

K. Seunarine, M. Tormen, N. Gadegaard, M. Riehle, C. D. W. Wilkinson, L. Businaro, F. Romanato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 3258–3262 (2006)
https://doi.org/10.1116/1.2357970
Published: December 2006
View article titled, Progress towards tubes with regular nanopatterned inner surfaces
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Journal Articles

Three-dimensional patterning using fine step motion in synchrotron radiation lithography

M. Fukuda, K. Deguchi, M. Suzuki, Y. Utsumi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2840–2843 (2006)
https://doi.org/10.1116/1.2366620
Published: November 2006
View article titled, Three-dimensional patterning using fine step motion in synchrotron radiation lithography
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Journal Articles

Process optimization and proximity effect correction for gray scale e-beam lithography

Raghunath Murali, Devin K. Brown, Kevin P. Martin, James D. Meindl
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2936–2939 (2006)
https://doi.org/10.1116/1.2357962
Published: November 2006
View article titled, Process optimization and proximity effect correction for gray scale e-beam lithography
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Journal Articles

Properties of zone plates used for lithography

R. Zheng, L. Jiang, M. Feldman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2844–2847 (2006)
https://doi.org/10.1116/1.2393293
Published: November 2006
View article titled, Properties of zone plates used for lithography
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Journal Articles

Proposal of a new microreactor for vertical chemical operation

Yuichi Utsumi, Toshifumi Asano, Yoshiaki Ukita, Katsuhiro Matsui, Masahiro Takeo, Seiji Negoro
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2606–2611 (2006)
https://doi.org/10.1116/1.2366609
Published: November 2006
View article titled, Proposal of a new microreactor for vertical chemical operation
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Journal Articles

Functionalized SU-8 patterned with x-ray lithography

S. Balslev, F. Romanato
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2910–2913 (2005)
https://doi.org/10.1116/1.2062651
Published: December 2005
View article titled, Functionalized SU-8 patterned with x-ray lithography
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Journal Articles

Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation

Yuichi Utsumi, Takefumi Kishimoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2903–2909 (2005)
https://doi.org/10.1116/1.2131880
Published: December 2005
View article titled, Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation
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Journal Articles

Fabrication of two- and three-dimensional photonic crystals of titania with submicrometer resolution by deep x-ray lithography

Koichi Awazu, Xiaomin Wang, Makoto Fujimaki, Taketo Kuriyama, Akihide Sai, Yoshimichi Ohki, Hiroaki Imai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 934–939 (2005)
https://doi.org/10.1116/1.1924421
Published: May 2005
View article titled, Fabrication of two- and three-dimensional photonic crystals of titania with submicrometer resolution by deep x-ray lithography
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Journal Articles

Minimal zone plates for x-ray lithography

D. Amy, L. Jiang, R. Zheng, M. Feldman, F. Cerrina, S. Dhuey, Q. Leonard, D. Thielman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3570–3574 (2004)
https://doi.org/10.1116/1.1809625
Published: December 2004
View article titled, Minimal zone plates for x-ray lithography
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Journal Articles

Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists

Hiroki Yamamoto, Takahiro Kozawa, Atsuro Nakano, Kazumasa Okamoto, Seiichi Tagawa, Tomoyuki Ando, Mitsuru Sato, Hiroji Komano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3522–3524 (2004)
https://doi.org/10.1116/1.1813452
Published: December 2004
View article titled, Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists
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Journal Articles

Temperature distributions to correct distortions in membrane masks

L. Jiang, M. Feldman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3581–3584 (2004)
https://doi.org/10.1116/1.1821500
Published: December 2004
View article titled, Temperature distributions to correct distortions in membrane masks
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Journal Articles

Structure quality of high aspect ratio sub-micron polymer structures patterned at the electron storage ring ANKA

S. Achenbach, T. Mappes, J. Mohr
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3196–3201 (2004)
https://doi.org/10.1116/1.1824910
Published: December 2004
View article titled, Structure quality of high aspect ratio sub-micron polymer structures patterned at the electron storage ring ANKA
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Journal Articles

Interferometric in situ alignment for UV-based nanoimprint

A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Georgiev, H. Kurz
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3242–3245 (2004)
https://doi.org/10.1116/1.1808735
Published: December 2004
View article titled, Interferometric <em>in situ</em> alignment for UV-based nanoimprint
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