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Journal Articles

Fabrication process for 200 nm-pitch polished freestanding ultrahigh aspect ratio gratings

Alexander R. Bruccoleri, Ralf K. Heilmann, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KD02 (2016)
https://doi.org/10.1116/1.4966595
Published: November 2016
View article titled, Fabrication process for 200 nm-pitch polished freestanding ultrahigh aspect ratio gratings
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Journal Articles

Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch

Pran Mukherjee, Alexander Bruccoleri, Ralf K. Heilmann, Mark L. Schattenburg, Alex F. Kaplan, L. Jay Guo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6P70–C6P75 (2010)
https://doi.org/10.1116/1.3507427
Published: December 2010
View article titled, Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch
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Journal Articles

Microcomb design and fabrication for high accuracy optical assembly

Carl G. Chen, Ralf K. Heilmann, Paul T. Konkola, Olivier Mongrard, Glen P. Monnelly, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 3272–3276 (2000)
https://doi.org/10.1116/1.1313585
Published: November 2000
View article titled, Microcomb design and fabrication for high accuracy optical assembly
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