1-12 of 12
Signal processing method
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Systematic procedure to optimize chamber seasoning conditions with optical emission spectroscopy in plasma etching

Available to Purchase
Kye Hyun Baek, Sang Wook Park, Geum Jung Seong, Gyung Jin Min, Gilhyeun Choi, Ho-Kyu Kang, Eun Seung Jung, Chonghun Han, Thomas F. Edgar
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 022203 (2014)
https://doi.org/10.1116/1.4865909
Published: February 2014
View articletitled, Systematic procedure to optimize chamber seasoning conditions with optical emission spectroscopy in plasma etching
Open the PDF for Systematic procedure to optimize chamber seasoning conditions with optical emission spectroscopy in plasma etching in another window
Journal Articles

Phase control in multiexposure spatial frequency multiplication

Available to Purchase
Yong Zhao, Chih-Hao Chang, Ralf K. Heilmann, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2439–2443 (2007)
https://doi.org/10.1116/1.2794318
Published: December 2007
View articletitled, Phase control in multiexposure spatial frequency multiplication
Open the PDF for Phase control in multiexposure spatial frequency multiplication in another window
Journal Articles

Doppler writing and linewidth control for scanning beam interference lithography

Available to Purchase
Juan C. Montoya, Chih-Hao Chang, Ralf K. Heilmann, Mark L. Schattenburg
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2640–2645 (2005)
https://doi.org/10.1116/1.2127938
Published: December 2005
View articletitled, Doppler writing and linewidth control for scanning beam interference lithography
Open the PDF for Doppler writing and linewidth control for scanning beam interference lithography in another window
Journal Articles

Reliable fabrication of sub‐40 nm period gratings using a nanolithography system with interferometric dynamic focus control

Available to Purchase
D. R. S. Cumming, S. Thomas, S. P. Beaumont, J. M. R. Weaver
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 4115–4118 (1996)
https://doi.org/10.1116/1.588602
Published: November 1996
View articletitled, Reliable fabrication of sub‐40 nm period gratings using a nanolithography system with interferometric dynamic focus control
Open the PDF for Reliable fabrication of sub‐40 nm period gratings using a nanolithography system with interferometric dynamic focus control in another window
Journal Articles

High‐frequency pattern extraction in digital integrated circuits using scanning electrostatic force microscopy

Available to Purchase
G. E. Bridges, R. A. Said, M. Mittal, D. J. Thomson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 13, 1375–1379 (1995)
https://doi.org/10.1116/1.587856
Published: May 1995
View articletitled, High‐frequency pattern extraction in digital integrated circuits using scanning electrostatic force microscopy
Open the PDF for High‐frequency pattern extraction in digital integrated circuits using scanning electrostatic force microscopy in another window
Journal Articles

Evaluation of overlay accuracy for the x‐ray stepper TOXS‐1

Available to Purchase
Ryoichi Hirano, Tatsuhiko Higashiki, Hiroshi Nomura, Osamu Kuwabara, Takeshi Nishizaka, Norio Uchida
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 3247–3250 (1994)
https://doi.org/10.1116/1.587507
Published: November 1994
View articletitled, Evaluation of overlay accuracy for the x‐ray stepper TOXS‐1
Open the PDF for Evaluation of overlay accuracy for the x‐ray stepper TOXS‐1 in another window
Journal Articles

High‐speed spectral ellipsometry for in situ diagnostics and process control

Available to Purchase
W. M. Duncan, S. A. Henck, J. W. Kuehne, L. M. Loewenstein, S. Maung
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 2779–2784 (1994)
https://doi.org/10.1116/1.587191
Published: July 1994
View articletitled, High‐speed spectral ellipsometry for in situ diagnostics and process control
Open the PDF for High‐speed spectral ellipsometry for in situ diagnostics and process control in another window
Journal Articles

Metrology of electron‐beam lithography systems using holographically produced reference samples

Available to Purchase
Erik H. Anderson, Volker Boegli, Mark L. Schattenburg, Dieter Kern, Henry I. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 3606–3611 (1991)
https://doi.org/10.1116/1.585854
Published: November 1991
View articletitled, Metrology of electron‐beam lithography systems using holographically produced reference samples
Open the PDF for Metrology of electron‐beam lithography systems using holographically produced reference samples in another window
Journal Articles

A mask‐to‐wafer alignment and gap setting method for x‐ray lithography using gratings

Available to Purchase
Norio Uchida, Yoriyuki Ishibashi, Ryoichi Hirano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 3202–3206 (1991)
https://doi.org/10.1116/1.585287
Published: November 1991
View articletitled, A mask‐to‐wafer alignment and gap setting method for x‐ray lithography using gratings
Open the PDF for A mask‐to‐wafer alignment and gap setting method for x‐ray lithography using gratings in another window
Journal Articles

An optical‐heterodyne alignment technique for quarter‐micron x‐ray lithography

Available to Purchase
Masanori Suzuki, Atsunobu Une
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1971–1976 (1989)
https://doi.org/10.1116/1.584659
Published: November 1989
View articletitled, An optical‐heterodyne alignment technique for quarter‐micron x‐ray lithography
Open the PDF for An optical‐heterodyne alignment technique for quarter‐micron x‐ray lithography in another window
Journal Articles

A vertical stepper for synchrotron x‐ray lithography

Available to Purchase
S. Ishihara, M. Kanai, A. Une, M. Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1652–1656 (1989)
https://doi.org/10.1116/1.584508
Published: November 1989
View articletitled, A vertical stepper for synchrotron x‐ray lithography
Open the PDF for A vertical stepper for synchrotron x‐ray lithography in another window
Journal Articles

The Cramer–Rao accuracy bound for optimum processing of the edge registration mark signal in electron beam lithography

Available to Purchase
J. McDonald, I. Elminyawi, D. Yemc, M. Haslam
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 4, 1243–1250 (1986)
https://doi.org/10.1116/1.583489
Published: September 1986
View articletitled, The Cramer–Rao accuracy bound for optimum processing of the edge registration mark signal in electron beam lithography
Open the PDF for The Cramer–Rao accuracy bound for optimum processing of the edge registration mark signal in electron beam lithography in another window