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Journal Articles

Understanding 3D anisotropic reactive ion etching of oxide-metal stacks

Prafful Golani, Roshan J. Tirukkonda, Aaron N. Fancher, Stephen R. Ross, Mark D. Kraman, Rahul Sharangpani, Joyeeta Nag, Kartik Sondhi, Alexei L. Bogdanov, Senaka K. Kanakamedala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062206 (2023)
https://doi.org/10.1116/6.0003105
Published: November 2023
View article titled, Understanding 3D anisotropic reactive ion etching of oxide-metal stacks
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Includes: Supplementary data
Journal Articles

Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO2 thin films on H-/OH-terminated Si (100) surfaces

Jihye Park, Minji Jeong, Young Joon Cho, Kyung Joong Kim, Truong Ba Tai, Hyeyoung Shin, Jong Chul Lim, Hyo Sik Chang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062801 (2023)
https://doi.org/10.1116/6.0002920
Published: September 2023
View article titled, Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO<sub>2</sub> thin films on H-/OH-terminated Si (100) surfaces
Open the PDF for Investigation of tetrakis(ethylmethylamido)hafnium adsorption mechanism in initial growth of atomic layer deposited-HfO<sub>2</sub> thin films on H-/OH-terminated Si (100) surfaces in another window
Includes: Supplementary data
Journal Articles

Investigation of the deposition of α-tantalum (110) films on a-plane sapphire substrate by molecular beam epitaxy for superconducting circuit

Haolin Jia, Boyi zhou, Tao Wang, Yanfu Wu, Lina Yang, Zengqian Ding, Shuming Li, Xiao Cai, Kanglin Xiong, Jiagui Feng
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052210 (2023)
https://doi.org/10.1116/6.0002886
Published: September 2023
View article titled, Investigation of the deposition of α-tantalum (110) films on a-plane sapphire substrate by molecular beam epitaxy for superconducting circuit
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Includes: Supplementary data
Journal Articles

Interpolation and difference optimized machine learning model for accurate prediction of silicon etching depth with small sample dataset

Ye Yang, Yang Xu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052602 (2023)
https://doi.org/10.1116/6.0002823
Published: August 2023
View article titled, Interpolation and difference optimized machine learning model for accurate prediction of silicon etching depth with small sample dataset
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Includes: Supplementary data
Journal Articles

Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies

Sumit Choudhary, Midathala Yogesh, Daniel Schwarz, Hannes S. Funk, Subrata Ghosh, Satinder K. Sharma, Jörg Schulze, Kenneth E. Gonsalves
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052203 (2023)
https://doi.org/10.1116/6.0002767
Published: August 2023
View article titled, Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies
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Includes: Supplementary data
Journal Articles

Plasma processing and annealing for defect management at SiO2/Si interface

Shota Nunomura, Takayoshi Tsutsumi, Isao Sakata, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052202 (2023)
https://doi.org/10.1116/6.0002822
Published: August 2023
View article titled, Plasma processing and annealing for defect management at SiO<sub>2</sub>/Si interface
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Journal Articles

Heat-transfer modeling of the gas gap under a wafer

E. Gonzalez-Juez
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044206 (2023)
https://doi.org/10.1116/6.0002851
Published: July 2023
View article titled, Heat-transfer modeling of the gas gap under a wafer
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Journal Articles

Practical guide for in-house solid-state nanopore fabrication and characterization

Anumol Dominic, Muhammad Sajeer Parambath, Simran Nasa, Manoj Varma
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043204 (2023)
https://doi.org/10.1116/6.0002682
Published: July 2023
View article titled, Practical guide for in-house solid-state nanopore fabrication and characterization
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Journal Articles

Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)

A. Merkulov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044009 (2023)
https://doi.org/10.1116/6.0002578
Published: June 2023
View article titled, Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)
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Journal Articles

Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling

Roshan J. Tirukkonda, Mark D. Kraman, Rahul Sharangpani, Kartik Sondhi, Aaron N. Fancher, Stephen R. Ross, Joyeeta Nag, Alexei L. Bogdanov, Raghuveer S. Makala, Senaka K. Kanakamedala
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043202 (2023)
https://doi.org/10.1116/6.0002709
Published: June 2023
View article titled, Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling
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Includes: Supplementary data
Journal Articles

On the origin and evolution of hotspots in multipatterning processes

Prem Panneerchelvam, Chad M. Huard, Trey Graves, Alessandro Vaglio Pret, Roel Gronheid, Ankur Agarwal, Mark D. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 043201 (2023)
https://doi.org/10.1116/6.0002601
Published: June 2023
View article titled, On the origin and evolution of hotspots in multipatterning processes
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Journal Articles

Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity

Tae Woong Yoon, Sung Il Cho, Minsuk Choi, Sang Jeen Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044002 (2023)
https://doi.org/10.1116/6.0002737
Published: May 2023
View article titled, Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity
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Journal Articles

Self-alignment of whole wafers using patterning for capillary forces

Ernest M. Walker, III, Ako Emanuel, Hans D. Hallen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 032203 (2023)
https://doi.org/10.1116/6.0002518
Published: April 2023
View article titled, Self-alignment of whole wafers using patterning for capillary forces
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Includes: Supplementary data
Journal Articles

Chemical mechanical planarization for Ta-based superconducting quantum devices

Ekta Bhatia, Soumen Kar, Jakub Nalaskowski, Tuan Vo, Stephen Olson, Hunter Frost, John Mucci, Brian Martinick, Pui Yee Hung, Ilyssa Wells, Sandra Schujman, Satyavolu S. Papa Rao
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 033202 (2023)
https://doi.org/10.1116/6.0002586
Published: April 2023