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    Journal of Vacuum Science & Technology B
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    Journal Articles

    Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma

    Available to Purchase
    Russell R. A. Callahan, Gregory B. Raupp, Stephen P. Beaudoin
    Journal: Journal of Vacuum Science & Technology B
    J. Vac. Sci. Technol. B 19, 725–731 (2001)
    https://doi.org/10.1116/1.1366707
    Published: May 2001
    Abstract
    View articletitled, Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma
    Open the PDF for Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma in another window
    • Online ISSN 2166-2754
    • Print ISSN 2166-2746

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