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Journal Articles

Experimental investigation of the feasibility of in situ plasma cleaning in normal-conducting copper cavities

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Qianxu Xia, Lianmin Zheng, Yingchao Du
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 023602 (2025)
https://doi.org/10.1116/6.0004012
Published: February 2025
View articletitled, Experimental investigation of the feasibility of in situ plasma cleaning in normal-conducting copper cavities
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Journal Articles

Photoresist ashing at room temperature using a large-area, atmospheric-pressure plasma

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Branden J. Bodner, Paul J. Froeter, Kuldeep Kalonia, R. Mohan Sankaran
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 012204 (2025)
https://doi.org/10.1116/6.0004147
Published: January 2025
View articletitled, Photoresist ashing at room temperature using a large-area, atmospheric-pressure plasma
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Journal Articles

Future of plasma etching for microelectronics: Challenges and opportunities

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Gottlieb S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, Jane P. Chang, Jessica C. DeMott, Vincent M. Donnelly, Rémi Dussart, Andreas Fischer, Richard A. Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, Kenji Ishikawa, Steven G. Jaloviar, Keren J. Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark J. Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Poulose, Shahid Rauf, Makoto Sekine, Taylor G. Smith, Nathan Stafford, Theo Standaert, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 041501 (2024)
https://doi.org/10.1116/6.0003579
Published: June 2024
View articletitled, Future of plasma etching for microelectronics: Challenges and opportunities
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Journal Articles

Solar-thermal cold-wall chemical vapor deposition reactor design and characterization for graphene synthesis

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Abdalla Alghfeli, Mostafa Abuseada, Timothy S. Fisher
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 064205 (2022)
https://doi.org/10.1116/6.0002091
Published: November 2022
View articletitled, Solar-thermal cold-wall chemical vapor deposition reactor design and characterization for graphene synthesis
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Journal Articles

Preparation of clean MgO surface by oxygen plasma: Comparison with standard substrate cleaning procedures

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Jacqueline Geler-Kremer, Agham B. Posadas, Alexander A. Demkov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 062201 (2020)
https://doi.org/10.1116/6.0000371
Published: September 2020
View articletitled, Preparation of clean MgO surface by oxygen plasma: Comparison with standard substrate cleaning procedures
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Journal Articles

Handling, transfer, storage, and shipping of commercial thin film hydride disk target samples

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James L. Provo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 033202 (2017)
https://doi.org/10.1116/1.4983291
Published: May 2017
View articletitled, Handling, transfer, storage, and shipping of commercial thin film hydride disk target samples
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Journal Articles

Oxidation and oxidative vapor-phase etching of few-layer MoS2

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Timothy N. Walter, Frances Kwok, Hamed Simchi, Haila M. Aldosari, Suzanne E. Mohney
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 021203 (2017)
https://doi.org/10.1116/1.4975144
Published: January 2017
View articletitled, Oxidation and oxidative vapor-phase etching of few-layer MoS2
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Includes: Supplementary data
Journal Articles

Nondestructive cleaning of the LaAlO3/SrTiO3 surface with ultraviolet light and ozone

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Eric Andersson, Pier Paolo Aurino, Dag Winkler, Alexei Kalabukhov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041201 (2016)
https://doi.org/10.1116/1.4944660
Published: March 2016
View articletitled, Nondestructive cleaning of the LaAlO3/SrTiO3 surface with ultraviolet light and ozone
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Journal Articles

Resistive switching in nonplanar HfO2-based structures with variable series resistance

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Karol Čičo, Peter Jančovič, Jan Dérer, Vasilij Šmatko, Alica Rosová, Michal Blaho, Boris Hudec, Dagmar Gregušová, Karol Fröhlich
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 01A108 (2015)
https://doi.org/10.1116/1.4905727
Published: January 2015
View articletitled, Resistive switching in nonplanar HfO2-based structures with variable series resistance
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Journal Articles

Correlation of band gap position with composition in high-k films

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Li Ding, Marion Friedrich, Michael Fronk, Ovidiu D. Gordan, Dietrich R. T. Zahn, Lin Chen, David Wei Zhang, Christoph Cobet, Norbert Esser
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 03D115 (2014)
https://doi.org/10.1116/1.4866399
Published: February 2014
View articletitled, Correlation of band gap position with composition in high-k films
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Journal Articles

Void-free direct bonding of InP to Si: Advantages of low H-content and ozone activation

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A. Itawi, K. Pantzas, I. Sagnes, G. Patriarche, A. Talneau
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 021201 (2014)
https://doi.org/10.1116/1.4863317
Published: January 2014
View articletitled, Void-free direct bonding of InP to Si: Advantages of low H-content and ozone activation
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Journal Articles

Field emission study of change in work function of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) film

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Ying Jie Xing, Min Fang Qian, Jing Fang Qin, Geng Min Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 02B101 (2014)
https://doi.org/10.1116/1.4827635
Published: November 2013
View articletitled, Field emission study of change in work function of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) film
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Journal Articles

Charge trapping analysis of Al2O3 films deposited by atomic layer deposition using H2O or O3 as oxidant

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Mireia Bargalló González, Joan Marc Rafí, Oihane Beldarrain, Miguel Zabala, Francesca Campabadal
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 01A101 (2013)
https://doi.org/10.1116/1.4766182
Published: November 2012
View articletitled, Charge trapping analysis of Al2O3 films deposited by atomic layer deposition using H2O or O3 as oxidant
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Journal Articles

Optimization of surface pretreatment for single GaN nanowire devices

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Andrew M. Herrero, Kris A. Bertness
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 062201 (2012)
https://doi.org/10.1116/1.4754701
Published: September 2012
View articletitled, Optimization of surface pretreatment for single GaN nanowire devices
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Journal Articles

UV ozone treatment for improving contact resistance on graphene

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Chung Wei Chen, Fan Ren, Gou-Chung Chi, Sheng-Chun Hung, Y. P. Huang, Jihyun Kim, Ivan I. Kravchenko, Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 060604 (2012)
https://doi.org/10.1116/1.4754566
Published: September 2012
View articletitled, UV ozone treatment for improving contact resistance on graphene
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Journal Articles

Thermally reflowed ZEP 520A for gate length reduction and profile rounding in T-gate fabrication

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Brian P. Downey, David J. Meyer, Robert Bass, D. Scott Katzer, Steven C. Binari
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 051603 (2012)
https://doi.org/10.1116/1.4740502
Published: August 2012
View articletitled, Thermally reflowed ZEP 520A for gate length reduction and profile rounding in T-gate fabrication
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Journal Articles

Factors controlling the resistance of Ohmic contacts to n-InGaAs

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Robert Dormaier, Suzanne E. Mohney
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 031209 (2012)
https://doi.org/10.1116/1.4705730
Published: April 2012
View articletitled, Factors controlling the resistance of Ohmic contacts to n-InGaAs
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Journal Articles

Graphene functionalization and seeding for dielectric deposition and device integration

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Nelson Y. Garces, Virginia D. Wheeler, D. Kurt Gaskill
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 030801 (2012)
https://doi.org/10.1116/1.3693416
Published: March 2012
View articletitled, Graphene functionalization and seeding for dielectric deposition and device integration
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Journal Articles

Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting

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Irene Fernandez-Cuesta, Anna Laura Palmarelli, Xiaogan Liang, Jingyu Zhang, Scott Dhuey, Deirdre Olynick, Stefano Cabrini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06F801 (2011)
https://doi.org/10.1116/1.3662886
Published: November 2011
View articletitled, Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting
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Journal Articles

Suitability of thin poly(dimethylsiloxane) as an antisticking layer for UV nanoimprinting

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Makoto Okada, Yuichi Haruyama, Kazuhiro Kanda, Shinji Matsui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06FC09 (2011)
https://doi.org/10.1116/1.3653226
Published: November 2011
View articletitled, Suitability of thin poly(dimethylsiloxane) as an antisticking layer for UV nanoimprinting
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