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Journal Articles

Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling

Rajiv Sejpal, Bruce Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062604 (2021)
https://doi.org/10.1116/6.0001298
Published: November 2021
View article titled, Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling
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Journal Articles

Fast and accurate solution of inverse problem in optical scatterometry using heuristic search and robust correction

Jinlong Zhu, Hao Jiang, Yating Shi, Chuanwei Zhang, Xiuguo Chen, Shiyuan Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031807 (2015)
https://doi.org/10.1116/1.4919713
Published: May 2015
View article titled, Fast and accurate solution of inverse problem in optical scatterometry using heuristic search and robust correction
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Journal Articles

Off-axis modeling and measurement of emission parameters for the Schottky emitter

Sean M. Kellogg, Kun Liu, Gregory A. Schwind, Lynwood W. Swanson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F701 (2013)
https://doi.org/10.1116/1.4820021
Published: September 2013
View article titled, Off-axis modeling and measurement of emission parameters for the Schottky emitter
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Journal Articles

Computer modeling of the Schottky electron source

Lynwood W. Swanson, Gregory A. Schwind, Sean M. Kellogg, Kun Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06F603 (2012)
https://doi.org/10.1116/1.4756935
Published: October 2012
View article titled, Computer modeling of the Schottky electron source
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Journal Articles

Quantification of cesium surface contamination on silicon resulting from SIMS analysis

C. Penley, F. A. Stevie, D. P. Griffis
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 031203 (2012)
https://doi.org/10.1116/1.3698400
Published: March 2012
View article titled, Quantification of cesium surface contamination on silicon resulting from SIMS analysis
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Journal Articles

Theory of space charge limited regime of thermionic energy converter with negative electron affinity emitter

Joshua Ryan Smith, Griff L. Bilbro, Robert J. Nemanich
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1132–1141 (2009)
https://doi.org/10.1116/1.3125282
Published: May 2009
View article titled, Theory of space charge limited regime of thermionic energy converter with negative electron affinity emitter
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Journal Articles

Effect of resist surface characteristics on film-pulling velocity in immersion lithography

S. Schuetter, T. Shedd, G. Nellis, A. Romano, R. Dammel, M. Padmanaban, F. Houlihan, A. Krawicz, G. Lin, D. Rahman, S. Chakrapani, M. Neisser, C. Van Peski
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2798–2802 (2006)
https://doi.org/10.1116/1.2387160
Published: November 2006
View article titled, Effect of resist surface characteristics on film-pulling velocity in immersion lithography
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Journal Articles

Electrostatic chuck fringe field simulation and its impact on electron beam extreme ultraviolet mask patterning

Junru Ruan, John Hartley
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2861–2865 (2006)
https://doi.org/10.1116/1.2393291
Published: November 2006
View article titled, Electrostatic chuck fringe field simulation and its impact on electron beam extreme ultraviolet mask patterning
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Journal Articles

Direct spherical and chromatic aberration correction for charged particle optical systems

William Turnbull
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3560–3564 (2004)
https://doi.org/10.1116/1.1813449
Published: December 2004
View article titled, Direct spherical and chromatic aberration correction for charged particle optical systems
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Journal Articles

Simulation of planar deflection systems for field emission devices

Zheng Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 1077–1081 (2001)
https://doi.org/10.1116/1.1361041
Published: May 2001
View article titled, Simulation of planar deflection systems for field emission devices
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Journal Articles

Novel nanoscale field emission structures: Fabrication technology, experimental, and calculated characteristics

N. I. Tatarenko, V. A. Solntsev, A. N. Rodionov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 647–654 (1999)
https://doi.org/10.1116/1.590611
Published: March 1999
View article titled, Novel nanoscale field emission structures: Fabrication technology, experimental, and calculated characteristics
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Journal Articles

Combined calculation of lens aberrations, space charge aberrations, and statistical Coulomb effects in charged particle optical columns

X. R. Jiang, J. E. Barth, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 3747–3752 (1996)
https://doi.org/10.1116/1.588661
Published: November 1996
View article titled, Combined calculation of lens aberrations, space charge aberrations, and statistical Coulomb effects in charged particle optical columns
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Journal Articles

Fabrication of diffractive optical components for an extreme ultraviolet shearing interferometer

S. J. Spector, D. M. Tennant, Z. Tan, J. E. Bjorkholm
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 3846–3850 (1994)
https://doi.org/10.1116/1.587452
Published: November 1994
View article titled, Fabrication of diffractive optical components for an extreme ultraviolet shearing interferometer
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Journal Articles

Monolayer growth oscillations and surface structure of GaAs(001) during metalorganic vapor phase epitaxy growth

F. Reinhardt, J. Jönsson, M. Zorn, W. Richter, K. Ploska, J. Rumberg, P. Kurpas
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 2541–2546 (1994)
https://doi.org/10.1116/1.587798
Published: July 1994
View article titled, Monolayer growth oscillations and surface structure of GaAs(001) during metalorganic vapor phase epitaxy growth
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Journal Articles

Investigation of chemically assisted ion beam etching for the fabrication of vertical, ultrahigh quality facets in GaAs

Mats Hagberg, Björn Jonsson, Anders G. Larsson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 555–566 (1994)
https://doi.org/10.1116/1.587390
Published: March 1994
View article titled, Investigation of chemically assisted ion beam etching for the fabrication of vertical, ultrahigh quality facets in GaAs
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Journal Articles

Asymmetry aberrations and tolerancing of complete systems of electron lenses and deflectors*

Haoning Liu, Xieqing Zhu, Eric Munro
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 8, 1676–1681 (1990)
https://doi.org/10.1116/1.585138
Published: November 1990
View article titled, Asymmetry aberrations and tolerancing of complete systems of electron lenses and deflectors*
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Journal Articles

Thermodynamic analysis of the W–F–Si–H and W–F–Si–H–Cl systems

Edward J. Rode, William R. Harshbarger
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 8, 91–94 (1990)
https://doi.org/10.1116/1.584834
Published: January 1990
View article titled, Thermodynamic analysis of the W–F–Si–H and W–F–Si–H–Cl systems
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Journal Articles

A computer program for electron gun design using second‐order finite elements

Xieqing Zhu, Eric Munro
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1862–1869 (1989)
https://doi.org/10.1116/1.584681
Published: November 1989
View article titled, A computer program for electron gun design using second‐order finite elements
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Journal Articles

Practical optimization of multielectrode lenses

H. W. G. van der Steen, J. E. Barth
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1886–1890 (1989)
https://doi.org/10.1116/1.584686
Published: November 1989
View article titled, Practical optimization of multielectrode lenses
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Journal Articles

High accuracy electron trajectory plotting through finite‐element fields

A. Khursheed, A. R. Dinnis
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1882–1885 (1989)
https://doi.org/10.1116/1.584685
Published: November 1989
View article titled, High accuracy electron trajectory plotting through finite‐element fields
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