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Journal Articles

Protection of extreme ultraviolet lithography masks. II. Showerhead flow mitigation of nanoscale particulate contamination

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Leonard E. Klebanoff, John R. Torczynski, Anthony S. Geller, Michael A. Gallis, Daniel J. Rader, Frank C. Chilese, Rudy F. Garcia, Gil Delgado
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031602 (2015)
https://doi.org/10.1116/1.4916212
Published: March 2015
View articletitled, Protection of extreme ultraviolet lithography masks. II. Showerhead flow mitigation of nanoscale particulate contamination
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Journal Articles

Protection of extreme ultraviolet lithography masks. I. Thermophoretic protection factors at low pressure for diffusing nanoscale particles

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Leonard E. Klebanoff, Anthony S. Geller, John R. Torczynski, Michael A. Gallis, Daniel J. Rader, Frank C. Chilese, Rudy F. Garcia, Gil Delgado
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031601 (2015)
https://doi.org/10.1116/1.4916210
Published: March 2015
View articletitled, Protection of extreme ultraviolet lithography masks. I. Thermophoretic protection factors at low pressure for diffusing nanoscale particles
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Journal Articles

Recent advance in protection technology for extreme ultraviolet lithography masks under low-pressure condition

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Jung Hyeun Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, L1–L6 (2008)
https://doi.org/10.1116/1.2821735
Published: January 2008
View articletitled, Recent advance in protection technology for extreme ultraviolet lithography masks under low-pressure condition
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Journal Articles

Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions

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Christof Asbach, Heinz Fissan, Jung Hyeun Kim, Se-Jin Yook, David Y. H. Pui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 47–53 (2007)
https://doi.org/10.1116/1.2404685
Published: December 2006
View articletitled, Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions
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Journal Articles

Effect of reverse flow by differential pressure on the protection of critical surfaces against particle contamination

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Jung Hyeun Kim, Heinz Fissan, Christof Asbach, Se-Jin Yook, Jing Wang, David Y. H. Pui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1844–1849 (2006)
https://doi.org/10.1116/1.2214712
Published: June 2006
View articletitled, Effect of reverse flow by differential pressure on the protection of critical surfaces against particle contamination
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Journal Articles

Investigation of thermophoretic protection with speed-controlled particles at 100, 50, and 25 mTorr

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Jung Hyeun Kim, Heinz Fissan, Christof Asbach, Se-Jin Yook, David Y. H. Pui, Kevin J. Orvek
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1178–1184 (2006)
https://doi.org/10.1116/1.2190660
Published: April 2006
View articletitled, Investigation of thermophoretic protection with speed-controlled particles at 100, 50, and 25 mTorr
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Journal Articles

Modeling of protection schemes for critical surfaces under low pressure conditions: Comparison between analytical and numerical approach

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Christof Asbach, David Y. H. Pui, Jung Hyeun Kim, Se-Jin Yook, Heinz Fissan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2419–2426 (2005)
https://doi.org/10.1116/1.2122927
Published: November 2005
View articletitled, Modeling of protection schemes for critical surfaces under low pressure conditions: Comparison between analytical and numerical approach
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Journal Articles

Verification studies of thermophoretic protection for extreme ultraviolet masks

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Daniel E. Dedrick, Eric W. Beyer, Daniel J. Rader, Leonard E. Klebanoff, Alvin H. Leung
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 307–317 (2005)
https://doi.org/10.1116/1.1856463
Published: January 2005
View articletitled, Verification studies of thermophoretic protection for extreme ultraviolet masks
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