1-20 of 29
Profilometry
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers

Nadine Gerges, Camille Petit-Etienne, Marie Panabière, Jumana Boussey, Yann Ferrec, Cécile Gourgon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 062602 (2021)
https://doi.org/10.1116/6.0001273
Published: October 2021
View article titled, Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers
Open the PDF for Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers in another window
Journal Articles

Characterization and optimization of bonding and interconnect technology for 3D stacking thin dies

Pavani Vamsi Krishna Nittala, Karthika Haridas, Shivam Nigam, Saba Tasneem, Prosenjit Sen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 052207 (2021)
https://doi.org/10.1116/6.0001160
Published: August 2021
View article titled, Characterization and optimization of bonding and interconnect technology for 3D stacking thin dies
Open the PDF for Characterization and optimization of bonding and interconnect technology for 3D stacking thin dies in another window
Journal Articles

Cryogenic cleaning of tin-drop contamination on surfaces relevant for extreme ultraviolet light collection

Norbert Böwering, Christian Meier
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 062602 (2020)
https://doi.org/10.1116/6.0000501
Published: October 2020
View article titled, Cryogenic cleaning of tin-drop contamination on surfaces relevant for extreme ultraviolet light collection
Open the PDF for Cryogenic cleaning of tin-drop contamination on surfaces relevant for extreme ultraviolet light collection in another window
Journal Articles

Phase errors reduction in multi-angle illumination digital holographic microscopy

Junsheng Lu, Yanan Zeng, Xinyu Chang, Yujian Hong, Xiaodong Hu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 064003 (2020)
https://doi.org/10.1116/6.0000478
Published: October 2020
View article titled, Phase errors reduction in multi-angle illumination digital holographic microscopy
Open the PDF for Phase errors reduction in multi-angle illumination digital holographic microscopy in another window
Journal Articles

Modeling the topography of uneven substrates post spin-coating

Stefan Decoster, Xiaoyu Piao, Werner Gillijns, Frédéric Lazzarino
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 03E102 (2018)
https://doi.org/10.1116/1.5022166
Published: March 2018
View article titled, Modeling the topography of uneven substrates post spin-coating
Open the PDF for Modeling the topography of uneven substrates post spin-coating in another window
Journal Articles

Polymer-matrix nanocomposites bombarded by large Ar clusters and low energy Cs ions: Sputtering and topography development

Ryan Edwards, Henok Mebratie Mesfin, Eva Pospisilova, Claude Poleunis, Christian Bailly, Arnaud Delcorte
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 03F118 (2018)
https://doi.org/10.1116/1.5015989
Published: February 2018
View article titled, Polymer-matrix nanocomposites bombarded by large Ar clusters and low energy Cs ions: Sputtering and topography development
Open the PDF for Polymer-matrix nanocomposites bombarded by large Ar clusters and low energy Cs ions: Sputtering and topography development in another window
Journal Articles

CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature

Arsenty Kaganskiy, Tobias Heuser, Ronny Schmidt, Sven Rodt, Stephan Reitzenstein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 061603 (2016)
https://doi.org/10.1116/1.4965883
Published: October 2016
View article titled, CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature
Open the PDF for CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature in another window
Journal Articles

Cross-linking control during imprint for hybrid lithography

Khalid Dhima, Christian Steinberg, Saskia Möllenbeck, Andre Mayer, Si Wang, Hella-Christin Scheer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FB08 (2012)
https://doi.org/10.1116/1.4763357
Published: October 2012
View article titled, Cross-linking control during imprint for hybrid lithography
Open the PDF for Cross-linking control during imprint for hybrid lithography in another window
Journal Articles

Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures

Arne Schleunitz, Christian Spreu, Marko Vogler, Hakan Atasoy, Helmut Schift
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06FC01 (2011)
https://doi.org/10.1116/1.3643761
Published: September 2011
View article titled, Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures
Open the PDF for Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures in another window
Journal Articles

Large area microcorrals and cavity formation on cantilevers using a focused ion beam

Laxmikant V. Saraf, David W. Britt
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 051603 (2011)
https://doi.org/10.1116/1.3626833
Published: September 2011
View article titled, Large area microcorrals and cavity formation on cantilevers using a focused ion beam
Open the PDF for Large area microcorrals and cavity formation on cantilevers using a focused ion beam in another window
Journal Articles

Analysis of a dip-solder process for self-assembly

M. Rao, J. C. Lusth, S. L. Burkett
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 042003 (2011)
https://doi.org/10.1116/1.3610977
Published: August 2011
View article titled, Analysis of a dip-solder process for self-assembly
Open the PDF for Analysis of a dip-solder process for self-assembly in another window
Journal Articles

Spectroscopic ellipsometry on thin titanium oxide layers grown on titanium by plasma oxidation

G. Droulers, A. Beaumont, J. Beauvais, D. Drouin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 021010 (2011)
https://doi.org/10.1116/1.3553209
Published: February 2011
View article titled, Spectroscopic ellipsometry on thin titanium oxide layers grown on titanium by plasma oxidation
Open the PDF for Spectroscopic ellipsometry on thin titanium oxide layers grown on titanium by plasma oxidation in another window
Journal Articles

Sputtering with an etch-free lift-off in thermal nanoimprint lithography

Andre Mayer, Nicolas Bogdanski, Saskia Möllenbeck, Khalid Dhima, Marc Papenheim, Hella-Christin Scheer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6M136–C6M139 (2010)
https://doi.org/10.1116/1.3507879
Published: December 2010
View article titled, Sputtering with an etch-free lift-off in thermal nanoimprint lithography
Open the PDF for Sputtering with an etch-free lift-off in thermal nanoimprint lithography in another window
Journal Articles

Framework for adaptive three-dimensional acquisition using structured light vision system

Peng Wang, Zimiao Zhang, Changku Sun
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1418–1421 (2009)
https://doi.org/10.1116/1.3049530
Published: May 2009
View article titled, Framework for adaptive three-dimensional acquisition using structured light vision system
Open the PDF for Framework for adaptive three-dimensional acquisition using structured light vision system in another window
Journal Articles

Direct patterning of plasma enhanced chemical vapor deposition silicon dioxide by electron beam lithography

Devin K. Brown
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2451–2454 (2008)
https://doi.org/10.1116/1.2998704
Published: December 2008
View article titled, Direct patterning of plasma enhanced chemical vapor deposition silicon dioxide by electron beam lithography
Open the PDF for Direct patterning of plasma enhanced chemical vapor deposition silicon dioxide by electron beam lithography in another window
Journal Articles

Deep-UV exposure of poly(methyl methacrylate) at 254 nm using low-pressure mercury vapor lamps

Robert W. Johnstone, Ian G. Foulds, M. Parameswaran
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 682–685 (2008)
https://doi.org/10.1116/1.2890688
Published: April 2008
View article titled, Deep-UV exposure of poly(methyl methacrylate) at 254 nm using low-pressure mercury vapor lamps
Open the PDF for Deep-UV exposure of poly(methyl methacrylate) at 254 nm using low-pressure mercury vapor lamps in another window
Journal Articles

Fabrication of periodic microstructures on flexible polyimide membranes

D. J. Shelton, J. S. Tharp, G. Zummo, W. R. Folks, G. D. Boreman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1827–1831 (2007)
https://doi.org/10.1116/1.2794054
Published: October 2007
View article titled, Fabrication of periodic microstructures on flexible polyimide membranes
Open the PDF for Fabrication of periodic microstructures on flexible polyimide membranes in another window
Journal Articles

Deposition of zinc oxide layers by high-power impulse magnetron sputtering

S. Konstantinidis, A. Hemberg, J. P. Dauchot, M. Hecq
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, L19–L21 (2007)
https://doi.org/10.1116/1.2735968
Published: May 2007
View article titled, Deposition of zinc oxide layers by high-power impulse magnetron sputtering
Open the PDF for Deposition of zinc oxide layers by high-power impulse magnetron sputtering in another window
Journal Articles

Real-time reflectometry-controlled focused-electron-beam-induced deposition of transparent materials

A. Perentes, T. Bret, I. Utke, P. Hoffmann, M. Vaupel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 587–591 (2006)
https://doi.org/10.1116/1.2170096
Published: February 2006
View article titled, Real-time reflectometry-controlled focused-electron-beam-induced deposition of transparent materials
Open the PDF for Real-time reflectometry-controlled focused-electron-beam-induced deposition of transparent materials in another window
Journal Articles

B diffusion in Si with pre-amorphization of different species

Hong-Jyh Li, Peter Zeitzoff, Larry Larson, Sanjay Banerjee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2380–2383 (2004)
https://doi.org/10.1116/1.1795250
Published: October 2004
View article titled, B diffusion in Si with pre-amorphization of different species
Open the PDF for B diffusion in Si with pre-amorphization of different species in another window