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Journal Articles

Computational analysis of vertical comb-drive microactuator with extended mirror for manipulation of light

Varun P. Sharma, Tapas Ganguli, Rahul Shukla
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 063001 (2022)
https://doi.org/10.1116/6.0002190
Published: November 2022
View article titled, Computational analysis of vertical comb-drive microactuator with extended mirror for manipulation of light
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Journal Articles

Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography

Nassir Mojarad, Dimitrios Kazazis, Yasin Ekinci
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 042601 (2021)
https://doi.org/10.1116/6.0001089
Published: July 2021
View article titled, Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography
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Journal Articles

Correlation between electromigration-related void volumes and time-to-failure, the high-resolution x-ray tomography’s vital support

Stéphane Moreau, Alexandra Fraczkiewicz
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 044004 (2020)
https://doi.org/10.1116/6.0000252
Published: June 2020
View article titled, Correlation between electromigration-related void volumes and time-to-failure, the high-resolution x-ray tomography’s vital support
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Journal Articles

Synchrotron radiation study of metallic titanium deposited on dielectric substrates

Justin Bogan, Venkateswaran Selvaraju, Anita Brady-Boyd, Greg Hughes, Robert O'Connor
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 040602 (2018)
https://doi.org/10.1116/1.5036943
Published: June 2018
View article titled, Synchrotron radiation study of metallic titanium deposited on dielectric substrates
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Journal Articles

Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses

Frederik Stöhr, Jonas Michael-Lindhard, Jörg Hübner, Flemming Jensen, Hugh Simons, Anders Clemen Jakobsen, Henning Friis Poulsen, Ole Hansen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 062001 (2015)
https://doi.org/10.1116/1.4931622
Published: September 2015
View article titled, Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses
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Includes: Supplementary data
Journal Articles

Characterization of NbAlO dielectric film deposited on InP

Dawei He, Xinhong Cheng, Dawei Xu, Zhongjian Wang, Yuehui Yu, Qingqing Sun, David Wei Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 01A803 (2011)
https://doi.org/10.1116/1.3532387
Published: January 2011
View article titled, Characterization of NbAlO dielectric film deposited on InP
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Journal Articles

Ultralow energy boron implants in silicon characterization by nonoxidizing secondary ion mass spectrometry analysis and soft x-ray grazing incidence x-ray fluorescence techniques

Damiano Giubertoni, Erica Iacob, P. Hoenicke, B. Beckhoff, Giancarlo Pepponi, Salvatore Gennaro, Massimo Bersani
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C1C84–C1C89 (2010)
https://doi.org/10.1116/1.3292638
Published: March 2010
View article titled, Ultralow energy boron implants in silicon characterization by nonoxidizing secondary ion mass spectrometry analysis and soft x-ray grazing incidence x-ray fluorescence techniques
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Journal Articles

Grazing incidence x-ray fluorescence and secondary ion mass spectrometry combined approach for the characterization of ultrashallow arsenic distribution in silicon

G. Pepponi, D. Giubertoni, M. Bersani, F. Meirer, D. Ingerle, G. Steinhauser, C. Streli, P. Hoenicke, B. Beckhoff
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C1C59–C1C64 (2010)
https://doi.org/10.1116/1.3292647
Published: March 2010
View article titled, Grazing incidence x-ray fluorescence and secondary ion mass spectrometry combined approach for the characterization of ultrashallow arsenic distribution in silicon
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Journal Articles

System-level line-edge roughness limits in extreme ultraviolet lithography

Patrick P. Naulleau, Dimitra Niakoula, Guojing Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1289–1293 (2008)
https://doi.org/10.1116/1.2932100
Published: August 2008
View article titled, System-level line-edge roughness limits in extreme ultraviolet lithography
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Journal Articles

Cs Br ∕ Ga N heterojunction photoelectron source

Juan R. Maldonado, Zhi Liu, Yun Sun, Scott Schuetter, Piero Pianetta, R. F. W. Pease
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2266–2270 (2007)
https://doi.org/10.1116/1.2779042
Published: December 2007
View article titled, Cs Br ∕ Ga N heterojunction photoelectron source
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Journal Articles

Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Ted Liang, Erdem Ultanir, Guojing Zhang, Seh-Jin Park, Erik Anderson, Eric Gullikson, Patrick Naulleau, Farhad Salmassi, Paul Mirkarimi, Eberhard Spiller, Sherry Baker
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2098–2103 (2007)
https://doi.org/10.1116/1.2779044
Published: December 2007
View article titled, Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks
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Journal Articles

Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching

O. Kurapova, B. Lengeler, C. G. Schroer, M. Küchler, T. Gessner, A. van der Hart
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1626–1629 (2007)
https://doi.org/10.1116/1.2769361
Published: September 2007
View article titled, Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching
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Journal Articles

Actinic extreme ultraviolet lithography mask blank defect inspection by photoemission electron microscopy

Jingquan Lin, Ulrich Neuhaeusler, Jawad Slieh, Armin Brechling, Ulf Kleineberg, Ulrich Heinzmann, Andreas Oelsner, Dima Valdaitsev, Gerd Schoenhense, Nils Weber, Matthias Escher, Michael Merkel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2631–2635 (2006)
https://doi.org/10.1116/1.2366607
Published: November 2006
View article titled, Actinic extreme ultraviolet lithography mask blank defect inspection by photoemission electron microscopy
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Journal Articles

Depth profiling the electronic structures at HfO 2 ∕ Si interface grown by molecular beam epitaxy

T. S. Lay, S. C. Chang, G. J. Din, C. C. Yeh, W. H. Hung, W. G. Lee, J. Kwo, M. Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 1291–1293 (2005)
https://doi.org/10.1116/1.1881633
Published: June 2005
View article titled, Depth profiling the electronic structures at HfO 2 ∕ Si interface grown by molecular beam epitaxy
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Journal Articles

Ferromagnetic properties of (Ga,Mn)N nanowires grown by a chemical vapor deposition method

Jeong Min Baik, Jong-Lam Lee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 530–533 (2005)
https://doi.org/10.1116/1.1880212
Published: March 2005
View article titled, Ferromagnetic properties of (Ga,Mn)N nanowires grown by a chemical vapor deposition method
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Journal Articles

Comparison of a new photoresist (DiaPlate 133) with SU-8 using both x-ray and ion beam lithographies

Yvan Gonin, Frans Munnik, Frédéric Benninger, Francisco Dias, Sergueı̈ Mikhaı̈lov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 1982–1986 (2004)
https://doi.org/10.1116/1.1763896
Published: August 2004
View article titled, Comparison of a new photoresist (<em>DiaPlate 133</em>) with <em>SU-8</em> using both x-ray and ion beam lithographies
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Journal Articles

Zone-plate-array lithography using synchrotron radiation

A. Pépin, D. Decanini, Y. Chen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 2981–2985 (2000)
https://doi.org/10.1116/1.1321275
Published: November 2000
View article titled, Zone-plate-array lithography using synchrotron radiation
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Journal Articles

Overlay compatibility between two synchroton radiation steppers

Makoto Fukuda, Masanori Suzuki, Tsuneyuki Haga, Hirofumi Morita, Hajime Aoyama, Souichirou Mitsui, Takao Taguchi, Yasuji Matsui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 2995–2998 (2000)
https://doi.org/10.1116/1.1319831
Published: November 2000
View article titled, Overlay compatibility between two synchroton radiation steppers
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Journal Articles

Fabrication of three-dimensional microstructures by high resolution x-ray lithography

C. Cuisin, Y. Chen, D. Decanini, A. Chelnokov, F. Carcenac, A. Madouri, J. M. Lourtioz, H. Launois
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 3444–3448 (1999)
https://doi.org/10.1116/1.591027
Published: November 1999
View article titled, Fabrication of three-dimensional microstructures by high resolution x-ray lithography
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Journal Articles

Surface photochemistry induced by x-ray irradiation

Richard A. Rosenberg, Qing Ma, Barry Lai, Derrick C. Mancini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 3535–3538 (1998)
https://doi.org/10.1116/1.590491
Published: November 1998
View article titled, Surface photochemistry induced by x-ray irradiation
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