1-20 of 65
Measurement theory
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Sensitivity of thermal conductivity vacuum gauges for constant current and constant temperature operation

Christoph Langer, Dominik Berndt, Rupert Schreiner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 054203 (2022)
https://doi.org/10.1116/6.0001964
Published: August 2022
View articletitled, Sensitivity of thermal conductivity vacuum gauges for constant current and constant temperature operation
Open the PDF for Sensitivity of thermal conductivity vacuum gauges for constant current and constant temperature operation in another window
Journal Articles

In situ nanoindentation measurements of arc-evaporated Cr0.49Al0.51N, Al0.66Ti0.34N, and Al0.65Ti0.33Y0.02N films up to 800 °C

Zhengtao Wu, Qimin Wang, Kwang Ho Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 020601 (2020)
https://doi.org/10.1116/1.5138723
Published: January 2020
View articletitled, In situ nanoindentation measurements of arc-evaporated Cr0.49Al0.51N, Al0.66Ti0.34N, and Al0.65Ti0.33Y0.02N films up to 800 °C
Open the PDF for In situ nanoindentation measurements of arc-evaporated Cr0.49Al0.51N, Al0.66Ti0.34N, and Al0.65Ti0.33Y0.02N films up to 800 °C in another window
Journal Articles

Retroreflex ellipsometry for isotropic substrates with nonplanar surfaces

Chia-Wei Chen, Matthias Hartrumpf, Thomas Längle, Jürgen Beyerer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 014005 (2020)
https://doi.org/10.1116/1.5121854
Published: December 2019
View articletitled, Retroreflex ellipsometry for isotropic substrates with nonplanar surfaces
Open the PDF for Retroreflex ellipsometry for isotropic substrates with nonplanar surfaces in another window
Journal Articles

Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods

Eri Kikuchi, Yota Ishito, Shinya Matsubara, Takahiro Nakamura, Masayuki Abe, Masaru Nakagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G303 (2017)
https://doi.org/10.1116/1.4990844
Published: September 2017
View articletitled, Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods
Open the PDF for Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods in another window
Journal Articles

In situ resistance measurements during physical vapor deposition of ultrathin metal films on Si(111) at room temperature

Bernhard Lutzer, Ole Bethge, Christina Zimmermann, Jürgen Smoliner, Emmerich Bertagnolli
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 051802 (2017)
https://doi.org/10.1116/1.5001669
Published: September 2017
View articletitled, In situ resistance measurements during physical vapor deposition of ultrathin metal films on Si(111) at room temperature
Open the PDF for In situ resistance measurements during physical vapor deposition of ultrathin metal films on Si(111) at room temperature in another window
Journal Articles

In situ monitoring of hydrogen desorption from silicon nanoparticles dispersed in a nonthermal plasma

Thomas Lopez, Lorenzo Mangolini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041206 (2016)
https://doi.org/10.1116/1.4946839
Published: April 2016
View articletitled, In situ monitoring of hydrogen desorption from silicon nanoparticles dispersed in a nonthermal plasma
Open the PDF for In situ monitoring of hydrogen desorption from silicon nanoparticles dispersed in a nonthermal plasma in another window
Journal Articles

Micromachined multiple focused-ion-beam devices

Ryo Yoshida, Motoaki Hara, Hiroyuki Oguchi, Hiroki Kuwano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 022001 (2016)
https://doi.org/10.1116/1.4943561
Published: March 2016
View articletitled, Micromachined multiple focused-ion-beam devices
Open the PDF for Micromachined multiple focused-ion-beam devices in another window
Journal Articles

In-situ monitoring of etch uniformity using plasma emission interferometry

Vladimir Samara, Jean-Francois de Marneffe, Ziad el Otell, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031206 (2015)
https://doi.org/10.1116/1.4917168
Published: April 2015
View articletitled, In-situ monitoring of etch uniformity using plasma emission interferometry
Open the PDF for In-situ monitoring of etch uniformity using plasma emission interferometry in another window
Journal Articles

Thermal roll-to-roll imprinted nanogratings on plastic film

Noriyuki Unno, Tapio Mäkelä, Jun Taniguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FG03 (2014)
https://doi.org/10.1116/1.4897132
Published: October 2014
View articletitled, Thermal roll-to-roll imprinted nanogratings on plastic film
Open the PDF for Thermal roll-to-roll imprinted nanogratings on plastic film in another window
Journal Articles

Influence of carrier gas on the nucleation and growth of Nb nanoclusters formed through plasma gas condensation

Kevin R. Bray, Charles Q. Jiao, Jennifer N. DeCerbo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 031805 (2014)
https://doi.org/10.1116/1.4871366
Published: April 2014
View articletitled, Influence of carrier gas on the nucleation and growth of Nb nanoclusters formed through plasma gas condensation
Open the PDF for Influence of carrier gas on the nucleation and growth of Nb nanoclusters formed through plasma gas condensation in another window
Journal Articles

Real-time full-area monitoring of the filling process in molds for UV nanoimprint lithography using dark field illumination

Qing Wang, Hiroshi Hiroshima, Kenta Suzuki, Sung-Won Youn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FB13 (2012)
https://doi.org/10.1116/1.4767122
Published: November 2012
View articletitled, Real-time full-area monitoring of the filling process in molds for UV nanoimprint lithography using dark field illumination
Open the PDF for Real-time full-area monitoring of the filling process in molds for UV nanoimprint lithography using dark field illumination in another window
Journal Articles

In situ thickness and temperature measurements of CdTe grown by molecular beam epitaxy on GaAs substrate

Renjie Gu, Chuan Shen, Yuying Guo, Weiqiang Wang, Xiangliang Fu, Lu Chen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 041203 (2012)
https://doi.org/10.1116/1.4718777
Published: May 2012
View articletitled, In situ thickness and temperature measurements of CdTe grown by molecular beam epitaxy on GaAs substrate
Open the PDF for In situ thickness and temperature measurements of CdTe grown by molecular beam epitaxy on GaAs substrate in another window
Journal Articles

Impact of exposure doses on demolding process in UV nanoimprint lithography

Toshiaki Tanabe, Noriyoshi Fujii, Masato Matsue, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 1239–1241 (2010)
https://doi.org/10.1116/1.3501126
Published: November 2010
View articletitled, Impact of exposure doses on demolding process in UV nanoimprint lithography
Open the PDF for Impact of exposure doses on demolding process in UV nanoimprint lithography in another window
Journal Articles

In situ monitoring and control of material growth for high resolution electron beam induced deposition

W. F. van Dorp, C. W. Hagen, P. A. Crozier, P. Kruit
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2210–2214 (2007)
https://doi.org/10.1116/1.2804603
Published: December 2007
View articletitled, In situ monitoring and control of material growth for high resolution electron beam induced deposition
Open the PDF for In situ monitoring and control of material growth for high resolution electron beam induced deposition in another window
Journal Articles

Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor

Yuhong Cai, Laurent Henn-Lecordier, Gary W. Rubloff, Ramaswamy Sreenivasan, Jae-Ouk Choo, Raymond A. Adomaitis
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1288–1297 (2007)
https://doi.org/10.1116/1.2753851
Published: July 2007
View articletitled, Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor
Open the PDF for Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor in another window
Journal Articles

Kinetics of gallium adlayer adsorption/desorption on polar and nonpolar GaN surfaces

Soojeong Choi, Tong-Ho Kim, Henry O. Everitt, April Brown, Maria Losurdo, Giovanni Bruno, Akihiro Moto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 969–973 (2007)
https://doi.org/10.1116/1.2720856
Published: May 2007
View articletitled, Kinetics of gallium adlayer adsorption/desorption on polar and nonpolar GaN surfaces
Open the PDF for Kinetics of gallium adlayer adsorption/desorption on polar and nonpolar GaN surfaces in another window
Journal Articles

Plasma doping implant depth profile calculation based on ion energy distribution measurements

L. Godet, Z. Fang, S. Radovanov, S. Walther, E. Arevalo, F. Lallement, J. T. Scheuer, T. Miller, D. Lenoble, G. Cartry, C. Cardinaud
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2391–2397 (2006)
https://doi.org/10.1116/1.2353841
Published: September 2006
View articletitled, Plasma doping implant depth profile calculation based on ion energy distribution measurements
Open the PDF for Plasma doping implant depth profile calculation based on ion energy distribution measurements in another window
Journal Articles

In situ growth regime characterization of AlN using reflection high energy electron diffraction

Shawn D. Burnham, W. Alan Doolittle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2100–2104 (2006)
https://doi.org/10.1116/1.2219757
Published: July 2006
View articletitled, In situ growth regime characterization of AlN using reflection high energy electron diffraction
Open the PDF for In situ growth regime characterization of AlN using reflection high energy electron diffraction in another window
Journal Articles

GaNAs(001) surface phases under growing condition

Takahiro Mori, Toshiharu Morimura, Takashi Hanada, Takafumi Yao
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 1341–1344 (2005)
https://doi.org/10.1116/1.1894416
Published: June 2005
View articletitled, GaNAs(001) surface phases under growing condition
Open the PDF for GaNAs(001) surface phases under growing condition in another window
Journal Articles

In situ monitoring of formation of InAs quantum dots and overgrowth by GaAs or AlAs

Michael Yakimov, Vadim Tokranov, Gabriel Agnello, Jobert van Eisden, Serge Oktyabrsky
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 1221–1225 (2005)
https://doi.org/10.1116/1.1881634
Published: June 2005
View articletitled, In situ monitoring of formation of InAs quantum dots and overgrowth by GaAs or AlAs
Open the PDF for In situ monitoring of formation of InAs quantum dots and overgrowth by GaAs or AlAs in another window