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Journal Articles

Thermal analysis of implanter source head in radio-frequency inductively coupled plasma

Chang-Won Jeong, Choong-Mo Ryu, Hee-Lak Lee, Jong Jin Hwang, Seung Jae Moon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 024001 (2024)
https://doi.org/10.1116/6.0003060
Published: January 2024
View article titled, Thermal analysis of implanter source head in radio-frequency inductively coupled plasma
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Includes: Supplementary data
Journal Articles

Bilayer metal etch mask strategy for deep diamond etching

Yixiong Zheng, Matthias Muehle, Junyu Lai, John D. Albrecht, Jung-Hun Seo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022210 (2022)
https://doi.org/10.1116/6.0001424
Published: March 2022
View article titled, Bilayer metal etch mask strategy for deep diamond etching
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Journal Articles

Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film

Linfeng Du, Paul Ruchhoeft, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022206 (2022)
https://doi.org/10.1116/6.0001709
Published: February 2022
View article titled, Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film
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Journal Articles

In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source

Editor’s Pick
Linfeng Du, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022207 (2022)
https://doi.org/10.1116/6.0001710
Published: February 2022
View article titled, In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source
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Journal Articles

Fabrication of black GaAs by maskless inductively coupled plasma etching in Cl2/BCl3/O2/Ar chemistry

Editor’s Pick
Yidi Bao, Wen Liu, Yongqiang Zhao, Lei Wei, Xiaoling Chen, Fuhua Yang, Xiaodong Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022205 (2022)
https://doi.org/10.1116/6.0001570
Published: February 2022
View article titled, Fabrication of black GaAs by maskless inductively coupled plasma etching in Cl<sub>2</sub>/BCl<sub>3</sub>/O<sub>2</sub>/Ar chemistry
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Journal Articles

Investigation and optimization of reactive ion etching of Si3N4 and polyphthalaldehyde for two-step gray scale fabrication of diffractive optics

Alaleh Aminzadeh, Manjith Bose, Dan Smith, Md Hemayet Uddin, Andrew G. Peele, Grant van Riessen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061608 (2019)
https://doi.org/10.1116/1.5121760
Published: November 2019
View article titled, Investigation and optimization of reactive ion etching of Si<sub>3</sub>N<sub>4</sub> and polyphthalaldehyde for two-step gray scale fabrication of diffractive optics
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Journal Articles

Chemical mechanical polishing of Ge2Sb2Te5 in alkaline slurry

Hai-bo Wang, Shi-bin Lu, Jin Yang, Xian-wei Jiang, Zhi-tang Song, Wei-li Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 041204 (2017)
https://doi.org/10.1116/1.4986473
Published: June 2017
View article titled, Chemical mechanical polishing of Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> in alkaline slurry
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Journal Articles

Selective dry etching of TiN nanostructures over SiO2 nanotrenches using a Cl2/Ar/N2 inductively coupled plasma

Bruno Lee Sang, Marie-Josée Gour, Maxime Darnon, Serge Ecoffey, Abdelatif Jaouad, Benattou Sadani, Dominique Drouin, Abdelkader Souifi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 02M102 (2016)
https://doi.org/10.1116/1.4936885
Published: December 2015
View article titled, Selective dry etching of TiN nanostructures over SiO<sub>2</sub> nanotrenches using a Cl<sub>2</sub>/Ar/N<sub>2</sub> inductively coupled plasma
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Journal Articles

Fabrication of low grass, smooth sidewall InGaAsP by methane–hydrogen inductively coupled plasma RIE through a metal lift-off mask patterned by e-beam lithography

Viswas Sadasivan, Shikha Dagar, Utpal Das
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 051210 (2015)
https://doi.org/10.1116/1.4929437
Published: August 2015
View article titled, Fabrication of low grass, smooth sidewall InGaAsP by methane–hydrogen inductively coupled plasma RIE through a metal lift-off mask patterned by e-beam lithography
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Journal Articles

Study of the effects of GaN buffer layer quality on the dc characteristics of AlGaN/GaN high electron mobility transistors

Shihyun Ahn, Weidi Zhu, Chen Dong, Lingcong Le, Ya-Hsi Hwang, Byung-Jae Kim, Fan Ren, Stephen J. Pearton, Aaron G. Lind, Kevin S. Jones, I. I. Kravchenko, Ming-Lan Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031210 (2015)
https://doi.org/10.1116/1.4918715
Published: April 2015
View article titled, Study of the effects of GaN buffer layer quality on the dc characteristics of AlGaN/GaN high electron mobility transistors
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Journal Articles

X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl2-based inductively coupled plasma

Romain Chanson, Sophie Bouchoule, Christophe Cardinaud, Camille Petit-Etienne, Edmond Cambril, Ahmed Rhallabi, Stephane Guilet, Elisabeth Blanquet
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 011219 (2014)
https://doi.org/10.1116/1.4862256
Published: January 2014
View article titled, X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl<sub>2</sub>-based inductively coupled plasma
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Journal Articles

Fabrication of 3D charged particle trap using through-silicon vias etched by deep reactive ion etching

Ankita Verma, Joshah Jennings, Ryan D. Johnson, Marc H. Weber, Kelvin G. Lynn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 032001 (2013)
https://doi.org/10.1116/1.4799662
Published: April 2013
View article titled, Fabrication of 3D charged particle trap using through-silicon vias etched by deep reactive ion etching
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Journal Articles

Optimization of a self-closing effect to produce nanochannels with top slits in fused silica

Mariusz Graczyk, Martina Balaz, Anders Kvennefors, Heiner Linke, Ivan Maximov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06FF09 (2012)
https://doi.org/10.1116/1.4766317
Published: November 2012
View article titled, Optimization of a self-closing effect to produce nanochannels with top slits in fused silica
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Journal Articles

Inductively coupled plasma deep etching of InP/InGaAsP in Cl2/CH4/H2 based chemistries with the electrode at 20 °C

Andreas Wieczorek, Vladimir Djara, Frank H. Peters, James O’Callaghan, Kevin Thomas, Brian Corbett
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 051208 (2012)
https://doi.org/10.1116/1.4748807
Published: August 2012
View article titled, Inductively coupled plasma deep etching of InP/InGaAsP in Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub> based chemistries with the electrode at 20 °C
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Journal Articles

Formation of large-area GaN nanostructures with controlled geometry and morphology using top-down fabrication scheme

Dipak Paramanik, Abhishek Motayed, Geetha S. Aluri, Jong-Yoon Ha, Sergiy Krylyuk, Albert V. Davydov, Matthew King, Sean McLaughlin, Shalini Gupta, Harlan Cramer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 052202 (2012)
https://doi.org/10.1116/1.4739424
Published: July 2012
View article titled, Formation of large-area GaN nanostructures with controlled geometry and morphology using top-down fabrication scheme
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Journal Articles

Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics

Hualiang Shi, Huai Huang, Junjing Bao, Junjun Liu, Paul S. Ho, Yifeng Zhou, Jeremy T. Pender, Michael D. Armacost, David Kyser
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 011206 (2012)
https://doi.org/10.1116/1.3671008
Published: December 2011
View article titled, Role of ions, photons, and radicals in inducing plasma damage to ultra low-<em>k</em> dielectrics
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Journal Articles

Emission enhancement from nonpolar a -plane III-nitride nanopillar

Byung-Jae Kim, Younghun Jung, Michael A. Mastro, Jennifer Hite, Neeraj Nepal, Charles R. Eddy, Jr., Jihyun Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 021004 (2011)
https://doi.org/10.1116/1.3545696
Published: January 2011
View article titled, Emission enhancement from nonpolar a -plane III-nitride nanopillar
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Journal Articles

Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting

Arne Schleunitz, Christian Spreu, JaeJong Lee, Helmut Schift
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6M41–C6M44 (2010)
https://doi.org/10.1116/1.3498762
Published: November 2010
View article titled, Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting
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Journal Articles

InAlN/GaN heterostructure field-effect transistors on Fe-doped semi-insulating GaN substrates

M. Wu, J. H. Leach, X. Ni, X. Li, J. Xie, S. Doğan, Ü. Özgür, H. Morkoç, T. Paskova, E. Preble, K. R. Evans, Chang-Zhi Lu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 908–911 (2010)
https://doi.org/10.1116/1.3481138
Published: August 2010
View article titled, InAlN/GaN heterostructure field-effect transistors on Fe-doped semi-insulating GaN substrates
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Journal Articles

Residue growth on metallic-hard mask after dielectric etching in fluorocarbon-based plasmas. I. Mechanisms

N. Posseme, T. Chevolleau, R. Bouyssou, T. David, V. Arnal, J. P. Barnes, C. Verove, O. Joubert
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 809–816 (2010)
https://doi.org/10.1116/1.3456182
Published: July 2010
View article titled, Residue growth on metallic-hard mask after dielectric etching in fluorocarbon-based plasmas. I. Mechanisms
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