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Journal Articles

Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization

Ziam Ghaznavi, Nicholas Butcher, Dragan Djurdjanovic, S. V. Sreenivasan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 022802 (2023)
https://doi.org/10.1116/6.0002261
Published: February 2023
View article titled, Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization
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Includes: Supplementary data
Journal Articles

Optimization of a continuous hot embossing process for fabrication of micropyramid structures in thermoplastic sheets

Luke Haponow, Jeff Kettle, John Allsop
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 012203 (2021)
https://doi.org/10.1116/6.0000551
Published: December 2020
View article titled, Optimization of a continuous hot embossing process for fabrication of micropyramid structures in thermoplastic sheets
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Journal Articles

Time multiplexed deep reactive ion etching of germanium and silicon—A comparison of mechanisms and application to x-ray optics

Vincent J. Genova, David N. Agyeman-Budu, Arthur R. Woll
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 011205 (2018)
https://doi.org/10.1116/1.4991875
Published: January 2018
View article titled, Time multiplexed deep reactive ion etching of germanium and silicon—A comparison of mechanisms and application to x-ray optics
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Journal Articles

High-etch rate processes for performing deep, highly anisotropic etches in silicon carbide using inductively coupled plasma etching

Mehmet Ozgur, Michael Huff
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 042003 (2017)
https://doi.org/10.1116/1.4994785
Published: July 2017
View article titled, High-etch rate processes for performing deep, highly anisotropic etches in silicon carbide using inductively coupled plasma etching
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Journal Articles

Study on bubble defects in roll-to-roll UV imprinting process for micropyramid arrays. I. Experiments

Hao Wu, Peiyun Yi, Linfa Peng, Xinmin Lai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 021201 (2016)
https://doi.org/10.1116/1.4941445
Published: February 2016
View article titled, Study on bubble defects in roll-to-roll UV imprinting process for micropyramid arrays. I. Experiments
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Journal Articles

Flux dependent Sb-incorporation during molecular beam epitaxy of InAsSb

Wendy L. Sarney, Stefan P. Svensson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 060604 (2015)
https://doi.org/10.1116/1.4935892
Published: November 2015
View article titled, Flux dependent Sb-incorporation during molecular beam epitaxy of InAsSb
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Journal Articles

Patterning of defect arrays with e-beam lithography used to develop a high throughput e-beam defect inspection tool

Kevin D. Cummings, Ben Bunday, Matt Malloy, John Hartley, Laila Banu, M. Mellish, Weilun Chao, A. R. Bleier, A. Banerjee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FD03 (2015)
https://doi.org/10.1116/1.4934052
Published: November 2015
View article titled, Patterning of defect arrays with e-beam lithography used to develop a high throughput e-beam defect inspection tool
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Journal Articles

Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV

Florian Delachat, Christophe Constancias, Jérôme Reche, Bernard Dal'Zotto, Laurent Pain, Boris Le Drogoff, Mohamed Chaker, Joëlle Margot
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06FJ02 (2014)
https://doi.org/10.1116/1.4900730
Published: November 2014
View article titled, Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV
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Journal Articles

Systematic procedure to optimize chamber seasoning conditions with optical emission spectroscopy in plasma etching

Kye Hyun Baek, Sang Wook Park, Geum Jung Seong, Gyung Jin Min, Gilhyeun Choi, Ho-Kyu Kang, Eun Seung Jung, Chonghun Han, Thomas F. Edgar
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 022203 (2014)
https://doi.org/10.1116/1.4865909
Published: February 2014
View article titled, Systematic procedure to optimize chamber seasoning conditions with optical emission spectroscopy in plasma etching
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Journal Articles

Multiple input multiple output controller design to match chamber performance in plasma etching for semiconductor manufacturing

Kye Hyun Baek, Kyounghoon P. Han, Gilheyun Choi, Ho-Kyu Kang, Eun Seung Jung, Kiwook Song, Chonghun Han, Thomas F. Edgar
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 062201 (2013)
https://doi.org/10.1116/1.4822034
Published: October 2013
View article titled, Multiple input multiple output controller design to match chamber performance in plasma etching for semiconductor manufacturing
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Journal Articles

Formation of silicon grass: Nanomasking by carbon clusters in cyclic deep reactive ion etching

Steffen Leopold, Christoph Kremin, Angela Ulbrich, Stefan Krischok, Martin Hoffmann
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 011002 (2011)
https://doi.org/10.1116/1.3521490
Published: January 2011
View article titled, Formation of silicon grass: Nanomasking by carbon clusters in cyclic deep reactive ion etching
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Journal Articles

Beam induced deposition of platinum using a helium ion microscope

Colin A. Sanford, Lewis Stern, Louise Barriss, Lou Farkas, Mark DiManna, Russ Mello, Diederik J. Maas, Paul F. A. Alkemade
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2660–2667 (2009)
https://doi.org/10.1116/1.3237095
Published: December 2009
View article titled, Beam induced deposition of platinum using a helium ion microscope
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Journal Articles

Contact etch stop a - Si x N y : H layer: A key factor for single polysilicon flash memory data retention

G. Beylier, D. Benoit, P. Mora, S. Bruyère, G. Ghibaudo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 486–489 (2009)
https://doi.org/10.1116/1.3071846
Published: February 2009
View article titled, Contact etch stop a - Si x N y : H layer: A key factor for single polysilicon flash memory data retention
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Journal Articles

Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models

Cheng-Che Hsu, John Hoang, Vu Le, Jane P. Chang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1919–1925 (2008)
https://doi.org/10.1116/1.2998759
Published: November 2008
View article titled, Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models
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Journal Articles

Etching of TiN-based gates for advanced complementary metal-oxide-semiconductor devices

V. Bliznetsov, N. Singh, R. Kumar, N. Balasubramanian, P. Guo, S. J. Lee, Y. Cai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 1440–1444 (2008)
https://doi.org/10.1116/1.2953732
Published: August 2008
View article titled, Etching of TiN-based gates for advanced complementary metal-oxide-semiconductor devices
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Journal Articles

Quantum effect in the field emission of carbon nanotubes

Shi-Dong Liang, N. Y. Huang, S. Z. Deng, N. S. Xu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 983–987 (2006)
https://doi.org/10.1116/1.2167089
Published: March 2006
View article titled, Quantum effect in the field emission of carbon nanotubes
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Journal Articles

Improvement on superhydrophobic behavior of carbon nanofibers via the design of experiment and analysis of variance

Ta-Sen Lin, Chu-Fu Wu, Chien-Te Hsieh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 855–859 (2006)
https://doi.org/10.1116/1.2184326
Published: March 2006
View article titled, Improvement on superhydrophobic behavior of carbon nanofibers via the design of experiment and analysis of variance
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Journal Articles

Reactive ion etching induced damage evaluation for optoelectronic device fabrication

G. Morello, M. Quaglio, G. Meneghini, C. Papuzza, C. Kompocholis
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 756–761 (2006)
https://doi.org/10.1116/1.2181576
Published: March 2006
View article titled, Reactive ion etching induced damage evaluation for optoelectronic device fabrication
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Journal Articles

Photomask plasma etching: A review

Banqiu Wu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1–15 (2006)
https://doi.org/10.1116/1.2162580
Published: January 2006
View article titled, Photomask plasma etching: A review
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Journal Articles

Optimization of the active region of InGaN ∕ GaN 405 nm light emitting diodes using statistical design of experiments for determination of interaction effects

J. R. Grandusky, M. Jamil, F. Shahedipour-Sandvik, J. A. DeLuca, S. F. LeBoeuf, X. A. Cao, S. D. Arthur
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 1576–1581 (2005)
https://doi.org/10.1116/1.1947804
Published: July 2005
View article titled, Optimization of the active region of InGaN ∕ GaN 405 nm light emitting diodes using statistical design of experiments for determination of interaction effects
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