1-20 of 64
Vacuum ultraviolet radiation
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Analysis of the adhesion structure between the cycloolefin polymer and the copper seed layer formed using medium-vacuum sputtering

FeaturedAvailable to Purchase
Akihiro Shimizu, Kazuhiro Fukada, Shinichi Endo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 023203 (2025)
https://doi.org/10.1116/6.0004239
Published: February 2025
View articletitled, Analysis of the adhesion structure between the cycloolefin polymer and the copper seed layer formed using medium-vacuum sputtering
Open the PDF for Analysis of the adhesion structure between the cycloolefin polymer and the copper seed layer formed using medium-vacuum sputtering in another window
Journal Articles

Study of fluoride-ion-assisted hydroxide catalyzed bonding of MgF2 to fused silica

Available to Purchase
Zhichao Hu, Dongfang Zhu, Zixuan Guo, Xudi Wang, Hailin Bi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 010601 (2025)
https://doi.org/10.1116/6.0004122
Published: January 2025
View articletitled, Study of fluoride-ion-assisted hydroxide catalyzed bonding of MgF2 to fused silica
Open the PDF for Study of fluoride-ion-assisted hydroxide catalyzed bonding of MgF2 to fused silica in another window
Journal Articles

Carbon nanotube collimator as an vacuum ultraviolet window

Available to Purchase
S. C. Olsen, D. D. Allred, R. R. Vanfleet
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 043001 (2024)
https://doi.org/10.1116/6.0003675
Published: June 2024
View articletitled, Carbon nanotube collimator as an vacuum ultraviolet window
Open the PDF for Carbon nanotube collimator as an vacuum ultraviolet window in another window
Journal Articles

Science challenges and research opportunities for plasma applications in microelectronics

FeaturedScilightFree
David B. Graves, Catherine B. Labelle, Mark J. Kushner, Eray S. Aydil, Vincent M. Donnelly, Jane P. Chang, Peter Mayer, Lawrence Overzet, Steven Shannon, Shahid Rauf, David N. Ruzic
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 042202 (2024)
https://doi.org/10.1116/6.0003531
Published: June 2024
View articletitled, Science challenges and research opportunities for plasma applications in microelectronics
Open the PDF for Science challenges and research opportunities for plasma applications in microelectronics in another window
Journal Articles

Plasma confinement by an optoelectronic system

Editor’s PickAvailable to Purchase
Ryuta Tsukazaki (塚嵜 琉太), Haruhiro Naito (内藤 陽大), Hisashi Koga (古賀 永), Akito Fukuda (福田 旺土), Naoki Kato (加藤 直樹), Takayuki Watanabe (渡辺 貴之), Susumu Takabayashi (鷹林 将)
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034201 (2024)
https://doi.org/10.1116/6.0003520
Published: April 2024
View articletitled, Plasma confinement by an optoelectronic system
Open the PDF for Plasma confinement by an optoelectronic system in another window
Includes: Supplementary data
Journal Articles

Plasma processing and annealing for defect management at SiO2/Si interface

Available to Purchase
Shota Nunomura, Takayoshi Tsutsumi, Isao Sakata, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 052202 (2023)
https://doi.org/10.1116/6.0002822
Published: August 2023
View articletitled, Plasma processing and annealing for defect management at SiO2/Si interface
Open the PDF for Plasma processing and annealing for defect management at SiO2/Si interface in another window
Journal Articles

Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film

Available to Purchase
Linfeng Du, Paul Ruchhoeft, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022206 (2022)
https://doi.org/10.1116/6.0001709
Published: February 2022
View articletitled, Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film
Open the PDF for Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film in another window
Journal Articles

In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source

Editor’s PickAvailable to Purchase
Linfeng Du, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022207 (2022)
https://doi.org/10.1116/6.0001710
Published: February 2022
View articletitled, In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source
Open the PDF for In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source in another window
Journal Articles

Optical properties of the crystalline silicon wafers described using the universal dispersion model

Available to Purchase
Daniel Franta, Jiří Vohánka, Martin Bránecký, Pavel Franta, Martin Čermák, Ivan Ohlídal, Vladimír Čech
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 062907 (2019)
https://doi.org/10.1116/1.5122284
Published: October 2019
View articletitled, Optical properties of the crystalline silicon wafers described using the universal dispersion model
Open the PDF for Optical properties of the crystalline silicon wafers described using the universal dispersion model in another window
Journal Articles

Drude and Kukharskii mobility of doped semiconductors extracted from Fourier-transform infrared ellipsometry spectra

Free
Stefan Zollner, Pablo P. Paradis, Farzin Abadizaman, Nuwanjula S. Samarasingha
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 012904 (2019)
https://doi.org/10.1116/1.5081055
Published: January 2019
View articletitled, Drude and Kukharskii mobility of doped semiconductors extracted from Fourier-transform infrared ellipsometry spectra
Open the PDF for Drude and Kukharskii mobility of doped semiconductors extracted from Fourier-transform infrared ellipsometry spectra in another window
Includes: Supplementary data
Journal Articles

Study of CO2 ashing for porous SiOCH film using 100 MHz/13.56 MHz dual frequency superimposed capacitive coupled plasma

Available to Purchase
Tsubasa Imamura, Katsumi Yamamoto, Kazuaki Kurihara, Hisataka Hayashi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 062201 (2017)
https://doi.org/10.1116/1.4987020
Published: October 2017
View articletitled, Study of CO2 ashing for porous SiOCH film using 100 MHz/13.56 MHz dual frequency superimposed capacitive coupled plasma
Open the PDF for Study of CO2 ashing for porous SiOCH film using 100 MHz/13.56 MHz dual frequency superimposed capacitive coupled plasma in another window
Journal Articles

Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening

Available to Purchase
Christian Steinberg, Nour Al-Hussainawi, Marc Papenheim, Andre Mayer, Hella-Christin Scheer, Maria Matschuk, Henrik Pranov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G306 (2017)
https://doi.org/10.1116/1.4991863
Published: October 2017
View articletitled, Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening
Open the PDF for Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening in another window
Journal Articles

Spectral response characteristics of transmission-mode alkali telluride photocathodes working from vacuum-ultraviolet to ultraviolet band

Available to Purchase
Xiang Zhang, Yijun Zhang, Yunsheng Qian, Cheng Feng, Jingzhi Zhang, Yunlong Jiang, Zhiyun Pan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 061202 (2017)
https://doi.org/10.1116/1.5006049
Published: October 2017
View articletitled, Spectral response characteristics of transmission-mode alkali telluride photocathodes working from vacuum-ultraviolet to ultraviolet band
Open the PDF for Spectral response characteristics of transmission-mode alkali telluride photocathodes working from vacuum-ultraviolet to ultraviolet band in another window
Journal Articles

Realization of a high vacuum evaporation system for wave-length shifter deposition on photo-detector windows

Available to Purchase
Maurizio Bonesini, Roberto Mazza, Tommaso Cervi, Alessandro Menegolli, Marco Cesare Prata, Gian Luca Raselli, Massimo Rossella, Maura Ninuccia Spanu, Marta Torti
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 01A101 (2018)
https://doi.org/10.1116/1.4996446
Published: October 2017
View articletitled, Realization of a high vacuum evaporation system for wave-length shifter deposition on photo-detector windows
Open the PDF for Realization of a high vacuum evaporation system for wave-length shifter deposition on photo-detector windows in another window
Journal Articles

Enhancing the electrical conductivity of vacuum-ultraviolet-reduced graphene oxide by multilayered stacking

Available to Purchase
Yudi Tu, Toru Utsunomiya, Takashi Ichii, Hiroyuki Sugimura
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 03D110 (2017)
https://doi.org/10.1116/1.4982722
Published: May 2017
View articletitled, Enhancing the electrical conductivity of vacuum-ultraviolet-reduced graphene oxide by multilayered stacking
Open the PDF for Enhancing the electrical conductivity of vacuum-ultraviolet-reduced graphene oxide by multilayered stacking in another window
Includes: Supplementary data
Journal Articles

Flat and highly flexible composite stamps for nanoimprint, their preparation and their limits

Available to Purchase
Marc Papenheim, Andre Mayer, Si Wang, Christian Steinberg, Hella-Christin Scheer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K406 (2016)
https://doi.org/10.1116/1.4965703
Published: October 2016
View articletitled, Flat and highly flexible composite stamps for nanoimprint, their preparation and their limits
Open the PDF for Flat and highly flexible composite stamps for nanoimprint, their preparation and their limits in another window
Journal Articles

Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications

Available to Purchase
Laurent Azarnouche, Stephen M. Sirard, William J. Durand, Gregory Blachut, Emir Gurer, Diane J. Hymes, Christopher J. Ellison, Carlton G. Willson, David B. Graves
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 061602 (2016)
https://doi.org/10.1116/1.4964885
Published: October 2016
View articletitled, Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications
Open the PDF for Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications in another window
Includes: Supplementary data
Journal Articles

Nanoimprint-induced orientation of localized wrinkles with SU-8

Available to Purchase
Christian Steinberg, Manuel Runkel, Marc Papenheim, Si Wang, Andre Mayer, Hella-Christin Scheer
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K402 (2016)
https://doi.org/10.1116/1.4962162
Published: September 2016
View articletitled, Nanoimprint-induced orientation of localized wrinkles with SU-8
Open the PDF for Nanoimprint-induced orientation of localized wrinkles with SU-8 in another window
Journal Articles

Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling

Available to Purchase
Kenneth C. Johnson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041608 (2016)
https://doi.org/10.1116/1.4954988
Published: July 2016
View articletitled, Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling
Open the PDF for Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling in another window
Journal Articles

He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching

Free
Dominik Metzler, Florian Weilnboeck, Sebastian Engelmann, Robert L. Bruce, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041604 (2016)
https://doi.org/10.1116/1.4949274
Published: May 2016
View articletitled, He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
Open the PDF for He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching in another window